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US-2024425484-A1 · Dec 26, 2024 · US
Process for producing pyrrole compound
US10844011B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10844011-B2 |
| Application number | US-201916691912-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 22, 2019 |
| Priority date | Feb 25, 2009 |
| Publication date | Nov 24, 2020 |
| Grant date | Nov 24, 2020 |
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- Title
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- Abstract
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Abstract
Official abstract text for this publication.
The present invention provides a production method of a sulfonylpyrrole compound useful as a pharmaceutical product, a production method of an intermediate used for the method, and a novel intermediate. The present invention relates to a method of producing sulfonylpyrrole compound (VIII), which includes reducing compound (III) and hydrolyzing the reduced product to give compound (IV), subjecting compound (IV) to a sulfonylation reaction to give compound (VI), and subjecting compound (VI) to an amination reaction.
First claim
Opening claim text (preview).
The invention claimed is: 1. A method of producing a compound represented by the formula wherein R 1 is (1) a C 1-6 alkyl group or (2) a C 6-14 aryl group optionally substituted by one halogen atom or 1 to 3 substituents selected from the group consisting of (i) C 1-6 alkyl optionally substituted by 1 to 5 halogens and (ii) C 1-6 alkoxy optionally substituted by 1 to 5 halogens, R 7 is a cyano group or a C 1-4 alkoxy-carbonyl group, and R 8 is a hydrogen atom, a C 1-6 alkyl group or a phenyl group, or a salt thereof, comprising cyclizing a compound represented by the formula Wherein each symbol is as defined above, or a salt thereof in the presence of an acid selected from the group consisting of formic acid, acetic acid, propionic acid, trifluoroacetic acid, citric acid, methanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, trifluoromethanesulfonic acid, hydrochloric acid, sulfuric acid and nitric acid. 2. The method according to claim 1 , wherein R 1 is a phenyl group optionally substituted by one halogen atom or 1 to 3 C 1-6 alkyls optionally substituted by 1 to 5 halogens. 3. The method according to claim 1 , wherein R 7 is a cyano group. 4. The method according to claim 1 , wherein R 8 is a hydrogen atom or a C 1-6 alkyl group. 5. The method according to claim 1 , wherein R 1 is a phenyl group optionally substituted by one halogen atom or 1 to 3 C 1-6 alkyls optionally substituted by 1 to 5 halogens, R 7 is a cyano group, and R 8 is a hydrogen atom.
Assignees
Inventors
Classifications
Oxygen or sulfur atoms · CPC title
- C07D401/12Primary
linked by a chain containing hetero atoms as chain links · CPC title
- C07D207/337Primary
Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals · CPC title
with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms · CPC title
Radicals substituted by oxygen or sulfur atoms · CPC title
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Frequently asked questions
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- What does patent US10844011B2 cover?
- The present invention provides a production method of a sulfonylpyrrole compound useful as a pharmaceutical product, a production method of an intermediate used for the method, and a novel intermediate. The present invention relates to a method of producing sulfonylpyrrole compound (VIII), which includes reducing compound (III) and hydrolyzing the reduced product to give compound (IV), subjecti…
- Who is the assignee on this patent?
- Takeda Pharmaceuticals Co
- What technology area does this patent fall under?
- Primary CPC classification C07D401/12. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Nov 24 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).