Apparatus for splitting flow of process gas and method of operating same

Patent metadata

Field	Value
Publication number	US-10838437-B2
Application number	US-201916282737-A
Country	US
Kind code	B2
Filing date	Feb 22, 2019
Priority date	Feb 22, 2018
Publication date	Nov 17, 2020
Grant date	Nov 17, 2020

Abstract

Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. In one embodiment, an apparatus for controlling gas flow is disclosed, the apparatus delivering two gas flows at a known ratio. Specifically, the apparatus has first and second on/off valves and first and second flow restrictors. The first and second on/off valves may be altered between an open state and a closed state. When both the first and second on/off valves are in an open state, first and second gas flows are delivered to first and second outlets. The first and second gas flows are provided at a known ratio to one another, this ratio determined by the ratio of the resistance to flow of the first and second flow restrictors.

First claim

What is claimed is:

1. A gas flow control system for delivering a plurality of gas flows, the gas flow control system comprising:
a gas flow path extending from a gas inlet to a first gas outlet and a second gas outlet;
a first on/off valve operably coupled to the gas flow path and located between the gas inlet and the first gas outlet;
a second on/off valve operably coupled to the gas flow path and located between the gas inlet and the second gas outlet;
a first flow restrictor having a first flow impedance operably coupled to the gas flow path and located between the gas inlet and the first gas outlet;
a second flow restrictor having a second flow impedance operably coupled to the gas flow path and located between the gas inlet and the second gas outlet;
wherein, when both the first and second on/off valves are in a fully open state, a ratio between a first gas flow from the first gas outlet and a second gas flow from the second gas outlet is determined by a ratio of the first flow impedance and the second flow impedance.

2. The system of claim 1 further comprising a proportional valve operably coupled to the gas flow path upstream of the first and second on/off valves and downstream of the gas inlet.

3. The system of claim 1 further comprising a controller having a memory, the memory storing a value representing the first flow impedance or the second flow impedance.

4. The system of claim 1 further comprising a pressure transducer operably coupled to the gas flow path between the gas inlet and the first and second flow restrictors.

5. The system of claim 1 further comprising a base, the first on/off valve, the second on/off valve, the first flow restrictor, and the second flow restrictor all mounted to the base.

6. The system of claim 1 wherein the gas flow path comprises a third gas outlet and the gas flow control system further comprises a third valve operably coupled to the gas flow path and located between the gas inlet and the third gas outlet.

7. The system of claim 6 wherein the third valve is a proportional valve.

8. The system of claim 6 wherein the third valve is an on/off valve.

9. A gas flow control system for delivering a plurality of gas flows, the gas flow control system comprising:
a gas flow path extending from a gas inlet to a first gas outlet and a second gas outlet;
a first valve operably coupled to the gas flow path and located between the gas inlet and the first gas outlet;
a second valve operably coupled to the gas flow path and located between the gas inlet and the second gas outlet;
a first flow restrictor having a first flow impedance operably coupled to the gas flow path and located between the gas inlet and the first gas outlet;
a second flow restrictor having a second flow impedance operably coupled to the gas flow path and located between the gas inlet and the second gas outlet.

10. The system of claim 9 wherein the first valve is a proportional valve and the second valve is an on/off valve.

11. The system of claim 9 wherein the first and second valves are on/off valves.

12. The system of claim 9 wherein the first and second valves are proportional valves.

13. The gas flow control system of claim 9 further comprising a proportional valve operably coupled to the gas flow path, the proportional valve located upstream of the first and second valves.

14. The gas flow control system of claim 9 wherein, when the first and second valves are in a fully open state, a ratio between a first gas flow from the first gas outlet and a second gas flow from the second gas outlet is determined by a ratio of the first flow impedance and the second flow impedance.

15. The gas flow control system of claim 9 further comprising a base, the first valve, the second valve, the first flow restrictor, and the second flow restrictor all mounted to the base.

16. The gas flow control system of claim 9 further comprising a pressure transducer operably coupled to the gas flow path upstream of the first and second valves and the first and second flow restrictors.

17. A method of delivering a process gas, the method comprising:
(a) providing a gas flow apparatus having a gas flow path extending from a gas inlet to a first gas outlet and a second gas outlet, a first valve operably coupled to the gas flow path and located between the gas inlet and the first gas outlet, a second valve operably coupled to the gas flow path and located between the gas inlet and the second gas outlet, a first flow restrictor having a first flow impedance operably coupled to the gas flow path and located between the gas inlet and the first gas outlet, and a second flow restrictor having a second flow impedance operably coupled to the gas flow path and located between the gas inlet and the second gas outlet;
(b) transitioning the first valve to a fully open state and the second valve to a fully closed state and delivering a first controlled flow of process gas to the first gas outlet;
(c) subsequent to step (b), transitioning the second valve to a fully open state and the first valve to a fully closed state and delivering a second controlled flow of process gas to the second gas outlet; and
(d) subsequent to step (c), transitioning the first valve to a fully open state and delivering the first controlled flow of process gas to the first gas outlet simultaneously with delivering the second controlled flow of process gas to the second gas outlet.

18. The method of claim 17 wherein the first and second controlled flows of process gas are delivered at a ratio determined by the ratio of the first flow impedance to the second flow impedance.

19. The method of claim 17 wherein the gas flow apparatus further comprises a proportional valve operably coupled to the gas flow path, the proportional valve located upstream of the first and second valves.

20. The method of claim 17 wherein one of the first or second valves are a proportional valve.

Assignees

• Reno Tech Inc
• Ichor Systems Inc

Inventors

• Penley Sean
• Grill Marshall B

Classifications

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• F16K1/00

  Lift valves {or globe valves}, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces ({in combination with sliding valves F16K3/246, F16K3/267} ; diaphragm valves F16K7/00) · CPC title

• H04W4/023 Primary

  using mutual or relative location information between multiple location based services [LBS] targets or of distance thresholds · CPC title

• H04W64/00

  Locating users or terminals {or network equipment} for network management purposes, e.g. mobility management · CPC title

• G05D7/0664

  the plurality of throttling means being arranged for the control of a plurality of diverging flows from a single flow (G05D7/0652 takes precedence; ratio control G05D11/13) · CPC title