Complement method and system of the identification number used in the engraving machine

Patent metadata

Field	Value
Publication number	US-10838397-B2
Application number	US-201715576901-A
Country	US
Kind code	B2
Filing date	Oct 9, 2017
Priority date	Jul 20, 2017
Publication date	Nov 17, 2020
Grant date	Nov 17, 2020

Abstract

The present disclosure provides an ID number complement method for a engraving machine, including the steps of: sequentially acquiring a first distance a and a second distance g of a character located in a first digit of an identification number to an edge of an identification area in each identification area; respectively subtracting the first distance a and the second distance g from a first preset value a′ and a second preset value g′, and acquiring an offset information in X-axis direction and Y-axis direction of the identification number in each identification area. The disclosure also provides an ID number complement system for an engraving machine, including: a measuring device, a statistical process control system and an engraving machine. Compared with the prior art, the automatic filling of the engraving machine is realized, and the working efficiency is improved by the above method.

First claim

What is claimed is:

1. A complement method of an identification (ID) number for an engraving machine, comprising the steps of:
sequentially acquiring a first distance a and a second distance g of a character located in a first digit of the identification number marked in an identification area provided on a workpiece to an edge of the identification area on the workpiece in each identification area;
respectively subtracting the first distance a and the second distance g from a first preset value a′ and a second preset value g′, acquiring an offset information in X-axis direction and Y-axis direction of the identification number in each identification area;
outputting the offset information and an identification area number corresponding to the offset information;
setting an upper limit and a lower limit of the offset information; and
suspending operation of the engraving machine when the offset information exceeds the upper limit or the lower limit.

2. The complement method of the ID number for the engraving machine according to claim 1 , wherein the method further comprises writing the offset information to a position corresponding to the identification area number in a first supplementary data table according to the identification area number.

3. The complement method of the ID number for the engraving machine according to claim 2 , wherein before writing the offset information to a position corresponding to the identification area number in the first supplementary data table, the method further comprises counting each offset information and the identification area number corresponding to the offset information, and establishing a second supplementary data table, and writing the offset information corresponding to the identification area number in the second supplementary data table to the position corresponding to the identification area number in the first supplementary data table.

4. The complement method of the ID number for the engraving machine according to claim 3 , wherein the first preset value a′ and the second preset value g′ are in the range of 100 to 300 μm.

5. The complement method of the ID number for the engraving machine according to claim 2 , wherein before writing the offset information to the position corresponding to the identification area number in the first supplementary data table, the method further comprises counting each offset information and the identification area number corresponding to the offset information, establishing a second supplementary data table, and replacing the second supplementary data table with the first supplementary data table.

6. The complement method of the ID number for the engraving machine according to claim 5 , wherein the first preset value a′ and the second preset value g′ are in the range of 100 to 300 μm.

7. The complement method of the ID number for the engraving machine according to claim 1 , wherein the first preset value a′ and the second preset value g′ are in the range of 100 to 300 μm.

8. The complement method of the ID number for the engraving machine according to claim 2 , wherein the first preset value a′ and the second preset value g′ are in the range of 100 to 300 μm.

9. An identification (ID) number complement system for the engraving machine, comprising:
a measuring device for sequentially acquiring a first distance a and a second distance g of a character located in a first digit of an identification number marked in an identification area provided on a workpiece to an edge of the identification area on the workpiece in each identification area;
the first distance a and the second distance g are respectively subtracted from a first preset value a′ and a second preset value g′, and an offset information in X-axis direction and Y-axis direction of the identification number in each identification area is acquired;
the offset information and an identification area number corresponding to the offset information are outputted to a statistical process control system; and
a statistical process control system for setting an upper limit and a lower limit according to the offset information, outputting the offset information and the identification area number corresponding to the offset information to the engraving machine and suspending operation of the engraving machine when the offset information exceeds the upper limit or the lower limit.

10. The ID number complement system for the engraving machine according to claim 9 , wherein the engraving machine also writes the offset information to a position corresponding to the identification area number stored in a first supplementary data table of the engraving machine based on the identification area number.

11. The ID number complement system for the engraving machine according to claim 10 , wherein before the engraving machine writes the offset information to a position corresponding to the identification area number stored in the first supplementary data table of the engraving machine based on the identification area number, the measuring device also counts each offset information and the identification area number corresponding to the offset information, and outputs it to the statistical process control system after establishes a second supplementary data table, the statistical process control system sends the second supplementary data table to the engraving machine, and the engraving machine writes the offset information corresponding to the identification area number in the second supplementary data table to the position corresponding to the identification area number in the first supplementary data table.

12. The ID number complement system for the engraving machine according to claim 11 , wherein the first preset value a′ and the second preset value g′ are in the range of 100 to 300 μm.

13. The ID number complement system for the engraving machine according to claim 10 , wherein before the engraving machine writes the offset information to a position corresponding to the identification area number stored in the first supplementary data table of the engraving machine based on the identification area number, the measuring device calculates each offset information and the identification area number corresponding to the offset information, establishes a second supplementary data table and outputs it to the statistical process control system, the statistical process control system sends the second supplementary data table to the engraving machine, which replaces the second supplementary data table with the first supplementary data table.

14. The ID number complement system for the engraving machine according to claim 13 , wherein the first preset value a′ and the second preset value g′ are in the range of 100 to 300 μm.

15. The ID number complement system for the engraving machine according to claim 9 , wherein the first preset value a′ and the second preset value g′ are in the range of 100 to 300 μm.

16. The ID number complement system for the engraving machine according to claim 10 , wherein the first preset value a′ and the second preset value g′ are in the range of 100 to 300 μm.

Assignees

• Wuhan China Star Optoelectronics Semiconductor Display Tech Co Ltd

Inventors

• Gong Chengbo

Classifications

• H10W46/607

  Located on parts of packages, e.g. on encapsulations or on package substrates · CPC title

• H10W46/601

  for use after dicing · CPC title

• H10W46/401

  for identification or tracking · CPC title

• H10W46/103

  alphanumeric information, e.g. words, letters or serial numbers · CPC title

• H10W46/00

  Marks applied to devices, e.g. for alignment or identification · CPC title