Method of producing a PVD layer and a coated cutting tool

US10837100B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10837100-B2
Application numberUS-201616063875-A
CountryUS
Kind codeB2
Filing dateDec 20, 2016
Priority dateDec 22, 2015
Publication dateNov 17, 2020
Grant dateNov 17, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A method for producing a coating on a substrate, wherein the coating includes a PVD layer (A), deposited by cathodic arc evaporation, being a compound of the formula Me x Si y Al z C a N b O c , wherein Me is one or more metals of groups 4, 5 and 6 in the IUPAC periodic table of elements. The PVD layer (A) is deposited by applying a pulsed bias voltage of from about −40 to about −450 V to the substrate and using a duty cycle of less than about 12% and a pulsed bias frequency of less than about 10 kHz. A coated cutting tool having a substrate and a coating is also disclosed, wherein the coating includes the PVD layer (A) with the compound of the formula Me x Si y Al z C a N b O c . The PVD layer (A) is crystalline having a FWHM (Full Width at Half Maximum) value for the cubic (111) peak in X-ray diffraction of ≤0.3 degrees (2theta).

First claim

Opening claim text (preview).

The invention claimed is: 1. A coated cutting tool comprising: a substrate; and a coating, wherein the coating comprises a PVD layer being a compound of the formula Me x Si y Al z C a N b O c , wherein, x+y+z=1, 0≤a≤1, 0≤b≤1, 0≤c≤0.2, a+b+c=1, and, 0≤x≤1, 0≤y≤0.4, 0≤z≤0.1, or, 0≤x≤1, 0≤y≤0.1, 0≤z≤0.75, wherein Me is one or more metals of groups 4, 5 and 6 in the IUPAC periodic table of elements, the PVD layer is crystalline having a FWHM (Full Width at Half Maximum) value for the cubic (111) peak in X-ray diffraction being ≤0.3 degrees (2theta). 2. The coated cutting tool according to claim 1 , wherein the PVD layer has a FWHM value for the cubic (111) peak in X-ray diffraction being ≤0.25 degrees (2theta). 3. The coated cutting tool according to claim 1 , wherein the PVD layer has a ratio of peak height intensity I(111)/I(200) in X-ray diffraction being ≥0.6. 4. The coated cutting tool according to claim 1 , wherein the PVD layer has a residual stress being >−3 GPa. 5. The coated cutting tool according to claim 1 , wherein the PVD layer includes faceted crystal grains on its surface. 6. The coated cutting tool according to claim 1 , wherein the thickness of the PVD layer is from about 0.5 to about 20 μm. 7. The coated cutting tool according to claim 1 , wherein the PVD layer is a compound of the formula: Ti p Zr q Cr r Si s Al t C a N b O c , 0≤p≤1,0≤q≤1,0≤r≤1,0≤s≤0.4, 0≤t≤0.1,p+q+r+s+t=1, 0≤a≤1, 0≤b≤1, 0≤c≤0.2, a+b+c=1 or, Ti p Zr q Cr r Si s Al t C a N b O c , 0≤p≤1, 0≤q≤1, 0≤r≤1, 0≤s≤0.1, 0≤t≤0.75, p+q+r+s+t=1, 0≤a≤1, 0≤b≤1, 0≤c≤0.2, a+b+c=1. 8. The coated cutting tool according to claim 7 , wherein in the formula for the PVD layer 0.9≤p≤1, 0≤q≤0.1, 0≤r≤0.1, 0≤s≤0.1, 0≤t≤0.1. 9. The coated cutting tool according to claim 7 , wherein in the formula for the PVD layer 0.25≤p≤0.9, 0≤q≤0.1, 0≤r≤0.1, 0≤s≤0.1, 0.1≤t≤0.75. 10. The coated cutting tool according to claim 7 , wherein in the formula for the PVD layer 0≤p≤0.1, 0≤q≤0.1, 0.2≤r≤1, 0≤s≤0.1, 0.1≤t≤0.8. 11. The coated cutting tool according to claim 7 , wherein in the formula for the PVD layer 0.1≤p≤0.5, 0.1≤q≤0.5, 0≤r≤0.1, 0≤s≤0.1, 0.25≤t≤0.6. 12. The coated cutting tool according to claim 7 , wherein in the formula for the PVD layer) 0≤p≤0.1, 0.4≤q≤1, 0≤r≤0.1, 0≤s≤0.1, 0≤t≤0.5. 13. The coated cutting tool according to claim 7 , wherein in the formula for the PVD layer 0.2≤p≤0.6, 0≤q≤0.1, 0≤r≤0.1, 0≤s≤0.1, 0.35≤t≤0.75. 14. The coated cutting tool according to claim 7 , wherein in the formula for the PVD layer 0.7≤p≤0.95, 0≤q≤0.1, 0≤r≤0.1, 0.01≤s≤0.3, 0≤t≤0.1. 15. The coated cutting tool according to claim 1 , wherein in the formula for the PVD layer 0≤a≤0.25, 0.75≤b≤1, 0≤c≤0.05, a+b+c=1.

Assignees

Inventors

Classifications

  • on hard metal substrates · CPC title

  • C23C14/325Primary

    Electric arc evaporation · CPC title

  • Cutting tools of which the bits or tips {or cutting inserts} are of special material · CPC title

  • Glass or silica · CPC title

  • C23C14/06Primary

    characterised by the coating material ({C23C14/0021} , C23C14/04 take precedence) · CPC title

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What does patent US10837100B2 cover?
A method for producing a coating on a substrate, wherein the coating includes a PVD layer (A), deposited by cathodic arc evaporation, being a compound of the formula Me x Si y Al z C a N b O c , wherein Me is one or more metals of groups 4, 5 and 6 in the IUPAC periodic table of elements. The PVD layer (A) is deposited by applying a pulsed bias voltage of from about −40 to about −450 V to the s…
Who is the assignee on this patent?
Sandvik Intellectual Property
What technology area does this patent fall under?
Primary CPC classification C23C14/325. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Nov 17 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).