Method for producing a glass ceramic with a predefined transmittance
US-2015111717-A1 · Apr 23, 2015 · US
US10836673B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10836673-B2 |
| Application number | US-201815885572-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 31, 2018 |
| Priority date | Feb 2, 2017 |
| Publication date | Nov 17, 2020 |
| Grant date | Nov 17, 2020 |
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A glass composition formed of a glass frit including P 2 O 5 , SiO 2 , B 2 O 3 , Al 2 O 3 , ZrO 2 and group I-based oxide, wherein P 2 O 5 is contained in an amount of 20 wt % to 40 wt % based on a total weight of the glass frit, SiO 2 is contained in an amount of to wt % to 30 wt % based on the total weight of the glass frit, B 2 O 3 is contained in an amount of 3 wt % to 20 wt % based on the total weight of the glass frit, Al 2 O 3 is contained in an amount of 7 to 24 wt % based on the total weight of the glass frit, ZrO 2 is contained in an amount of 1 wt % to 7 wt % based on the total weight of the glass frit, and the group I-based oxide is contained in an amount of 7 wt % to 28 wt % based on the total weight of the glass frit.
Opening claim text (preview).
What is claimed is: 1. A glass composition comprising: a glass frit comprising P2O5, SiO2, B2O3, Al2O3, ZrO2 group I-based oxide, a fluorinated compound including at least one of NaF, CaF 2 and AlF 3 , and an adhesion-enhancing component including at least one of Co 3 O 4 , NiO, Fe2O3 and MnO2, wherein P2O5 is contained in an amount that is greater than 25 wt % and less than or equal to 40 wt % based on a total weight of the glass frit, SiO2 is contained in an amount that is greater than or equal to 10 wt % and less than or equal to 25 wt % based on the total weight of the glass frit, B2O3 is contained in an amount of 3 wt % to 20 wt % based on the total weight of the glass frit, Al2O3 is contained in an amount of 7 to 24 wt % based on the total weight of the glass frit, ZrO2 is contained in an amount of 1 wt % to 7 wt % based on the total weight of the glass frit, and the group I-based oxide is contained in an amount of 7 wt % to 28 wt % based on the total weight of the glass frit, wherein the fluorinated compounds is contained in an amount of 0.1 wt % to 5 wt % based on the total weight of the glass frit, wherein the adhesion-enhancing component is contained in an amount of 1 wt % to 5 wt % based on the total weight of the glass frit, wherein the glass frit comprises more P2O5 than SiO2. 2. The glass composition of claim 1 , wherein the group I-based oxide comprises at least one metal oxide selected from a group consisting of Li2O, Na2O and K2O. 3. The glass composition of claim 1 , wherein the glass frit comprises at least one of TiO2 and SnO, and wherein said at least one of TiO2 and SnO is contained in an amount of 1 wt % to 10 wt % based on the total weight of the glass frit. 4. The glass composition of claim 1 , wherein the glass frit comprises at least one of a group II-based oxide and ZnO, and wherein said at least one of the group II-based oxide and ZnO is contained in an amount of 0.1 wt % to 10 wt % based on the total weight of the glass frit. 5. The glass composition of claim 4 , wherein the group II-based oxide comprises at least one oxide selected from a group consisting of CaO, MgO and BaO. 6. A cooking device comprising: a cavity portion having a heating space defined therein; a door to provide access to the heating space; and at least one heat source to supply heat inside the heating space, wherein at least one of the cavity portion and the door comprises a metal base, and a functional layer disposed on the metal base, wherein the functional layer comprises a glass frit comprising P2O5, SiO2, B2O3, Al2O3, ZrO2 group I-based oxide, a fluorinated compound including at least one of NaF, CaF2 and AlF3, and an adhesion-enhancing component including at least one of Co 3 O 4 , NiO, Fe2O3 and MnO2, wherein P2O5 is contained in an amount that is greater than 25 wt % and less than or equal to 40 wt % based on a total weight of the glass frit, SiO2 is contained in an amount that is greater than or equal to 10 wt % and less than or equal to 25 wt % based on the total weight of the glass frit, B2O3 is contained in an amount of 3 wt % to 20 wt % based on the total weight of the glass frit, Al2O3 is contained in an amount of 7 to 24 wt % based on the total weight of the glass frit, ZrO2 is contained in an amount of 1 wt % to 7 wt % based on the total weight of the glass frit, and the group I-based oxide is contained in an amount of 7 wt % to 28 wt % based on the total weight of the glass frit, wherein the fluorinated compounds is contained in an amount of 0.1 wt % to 5 wt % based on the total weight of the glass frit, wherein the adhesion-enhancing component is contained in an amount of 1 wt % to 5 wt % based on the total weight of the glass frit, wherein the glass frit comprises more P2O5 than SiO2. 7. The device of claim 6 , wherein the group I-based oxide comprises at least one metal oxide selected from a group consisting of Li2O, Na2O and K2O. 8. The device of claim 6 , wherein the glass frit comprises at least one of TiO2 and SnO, at least one of group II-based oxide and ZnO, wherein at least one of TiO2 and SnO is contained in an amount of 1 wt % to 10 wt % based on the total weight of the glass frit, at least one of the group II-based oxide and ZnO is contained in an amount of 0.1 wt % to 10 wt % based on the total weight of the glass frit, and the adhesion-enhancing component is contained in an amount of 1 wt % to 5 wt % based on the total weight of the glass frit. 9. The device of claim 8 , wherein the group II-based oxide comprises at least one oxide selected from a group consisting of CaO, MgO and BaO, and wherein the adhesion-enhancing component comprises at least one metal oxide selected from a group consisting of Co3O4, NiO, Fe2O3 and MnO2. 10. The device of claim 9 , wherein the functional layer is in direct contact with the metal base. 11. The device of claim 9 , wherein at least one of the cavity portion and the door comprises a buffer layer disposed between the metal base and the functional layer.
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