Gas-dissolved liquid producing apparatus

US10835876B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10835876-B2
Application numberUS-201816225666-A
CountryUS
Kind codeB2
Filing dateDec 19, 2018
Priority dateDec 25, 2017
Publication dateNov 17, 2020
Grant dateNov 17, 2020

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A gas-dissolved liquid producing apparatus 1 includes a gas supply unit 2, a first liquid supply unit 3, a gas-dissolved liquid generator 4, a second liquid generator 20, a second liquid supply unit 21, a flow rate measuring unit 14, and a controller 23. The controller 23 controls the supply amount of the first liquid to be supplied to the gas-dissolved liquid generator 4 according to the flow rate of circulated gas-dissolved liquid measured by the flow rate measuring unit 14. The gas-dissolved liquid generator 4 dissolves gas supplied from the gas supply unit 2 in first liquid supplied from the first liquid supply unit 3 and second liquid supplied from the second liquid supply unit 21 to generate gas-dissolved liquid.

First claim

Opening claim text (preview).

What is claimed is: 1. A gas-dissolved liquid producing apparatus comprising: a gas supply unit that supplies gas serving as a raw material of gas-dissolved liquid; a first liquid supply unit that supplies a first liquid serving as a raw material of the gas-dissolved liquid; a gas-dissolved liquid generator that dissolves the gas supplied from the gas supply unit in the first liquid supplied from the first liquid supply unit to generate the gas-dissolved liquid; a second liquid generator to which the gas-dissolved liquid generated in the gas-dissolved liquid generator is circulated and supplied to generate a second liquid serving as a raw material of the gas-dissolved liquid from the circulated gas-dissolved liquid; a second liquid supply unit that supplies the second liquid generated in the second liquid generator to the gas-dissolved liquid generator; a flow rate measuring unit that measures a flow rate of the circulated gas-dissolved liquid supplied to the second liquid generator; and a controller that controls the first liquid supply unit and the second liquid supply unit, wherein the controller controls a supply amount of the first liquid to be supplied to the gas-dissolved liquid generator according to the flow rate of the circulated gas-dissolved liquid measured by the flow rate measuring unit, and the gas-dissolved liquid generator dissolves the gas supplied from the gas supply unit in the first liquid supplied from the first liquid supply unit and the second liquid supplied from the second liquid supply unit to generate the gas-dissolved liquid. 2. The gas-dissolved liquid producing apparatus according to claim 1 , further comprising: a gas-dissolved liquid reservoir that stores the circulated gas-dissolved liquid; and a liquid level measuring unit that measures a height of a liquid level of the gas-dissolved liquid stored in the gas-dissolved liquid reservoir, wherein the controller controls whether to actuate the second liquid supply unit based on the height of the liquid level of the gas-dissolved liquid measured by the liquid level measuring unit. 3. The gas-dissolved liquid producing apparatus according to claim 1 , wherein the second liquid generator subjects the circulated gas-dissolved liquid to a thermal decomposition treatment or a photolysis treatment to generate the second liquid from the gas-dissolved liquid. 4. The gas-dissolved liquid producing apparatus according to claim 1 , wherein the second liquid generator subjects the circulated gas-dissolved liquid to a degasification treatment to generate the second liquid from the gas-dissolved liquid. 5. The gas-dissolved liquid producing apparatus according to claim 1 , wherein the gas-dissolved liquid that has been generated in the gas-dissolved liquid generator and supplied to an outside of the gas-dissolved liquid producing apparatus is circulated outside the gas-dissolved liquid producing apparatus and then supplied to the second liquid generator. 6. The gas-dissolved liquid producing apparatus according to claim 1 , wherein the gas-dissolved liquid that has been generated in the gas-dissolved liquid generator and has not been supplied to an outside of the gas-dissolved liquid producing apparatus is circulated inside the gas-dissolved liquid producing apparatus and supplied to the second liquid generator. 7. A gas-dissolved liquid producing method implemented in a gas-dissolved liquid producing apparatus, the gas-dissolved liquid producing apparatus including a gas supply unit that supplies gas serving as a raw material of gas-dissolved liquid; a first liquid supply unit that supplies a first liquid serving as a raw material of the gas-dissolved liquid; a gas-dissolved liquid generator that dissolves the gas supplied from the gas supply unit in the first liquid supplied from the first liquid supply unit to generate the gas-dissolved liquid; a second liquid generator to which the gas-dissolved liquid generated in the gas-dissolved liquid generator is circulated and supplied to a generate second liquid serving as a raw material of the gas-dissolved liquid from the circulated gas-dissolved liquid; a second liquid supply unit that supplies the second liquid generated in the second liquid generator to the gas-dissolved liquid generator; a flow rate measuring unit that measures a flow rate of the circulated gas-dissolved liquid supplied to the second liquid generator; and a controller that controls the first liquid supply unit and the second liquid supply unit, the producing method comprising: controlling, by the controller, a supply amount of the first liquid to be supplied to the gas-dissolved liquid generator according to a flow rate of the circulated gas-dissolved liquid measured by the flow rate measuring unit; and dissolving, by the gas-dissolved liquid generator, the gas supplied from the gas supply unit in the first liquid supplied from the first liquid supply unit and the second liquid supplied from the second liquid supply unit to generate the gas-dissolved liquid.

Assignees

Inventors

Classifications

  • using mainly spraying means, e.g. nozzles · CPC title

  • Volumetric flow rate · CPC title

  • B01F21/30Primary

    Workflow diagrams or layout of plants, e.g. flow charts; Details of workflow diagrams or layout of plants, e.g. controlling means · CPC title

  • using flow-mixing means for introducing the gases, e.g. baffles · CPC title

  • using flow mixing · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10835876B2 cover?
A gas-dissolved liquid producing apparatus 1 includes a gas supply unit 2, a first liquid supply unit 3, a gas-dissolved liquid generator 4, a second liquid generator 20, a second liquid supply unit 21, a flow rate measuring unit 14, and a controller 23. The controller 23 controls the supply amount of the first liquid to be supplied to the gas-dissolved liquid generator 4 according to the flow …
Who is the assignee on this patent?
Ebara Corp
What technology area does this patent fall under?
Primary CPC classification B01F21/30. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Nov 17 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).