Composition for cleaning magnetic patterns

Patent metadata

Field	Value
Publication number	US-10833251-B2
Application number	US-201816108316-A
Country	US
Kind code	B2
Filing date	Aug 22, 2018
Priority date	Nov 25, 2015
Publication date	Nov 10, 2020
Grant date	Nov 10, 2020

Abstract

A composition for cleaning a magnetic pattern, a method of manufacturing a magnetic memory device, a method of forming a magnetic pattern, and a magnetic memory device, the composition including a glycol ether-based organic solvent; a decomposing agent that includes an aliphatic amine; and at least one of a chelating agent, or a cleaning accelerator that includes an organic alkaline compound, wherein the composition is devoid of water.

First claim

What is claimed is:

1. A composition for cleaning a magnetic pattern, the composition comprising:
a glycol ether-based organic solvent;
about 4 weight percent to about 45 weight percent of a decomposing agent that includes an aliphatic amine, the weight percent being based on a total weight of the composition; and
at least one of:
a chelating agent, or
a cleaning accelerator that includes an organic alkaline compound,
wherein the composition is devoid of water,
wherein the composition has a pH of about 9 to about 12.5.

2. The composition as claimed in claim 1 , wherein the glycol ether-based organic solvent includes diethylene glycol monomethyl ether, triethylene glycol monobutyl ether, ethylene glycol monohexyl ether, diethylene glycol monohexyl ether, diethylene glycol monophenyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monomethyl ether, dipropylene glycol monopropyl ether, propylene glycol monobutyl ether, or dipropylene glycol monobutyl ether.

3. The composition claim 2 , wherein the organic solvent includes at least one of diethylene glycol monomethyl ether or dipropylene glycol monomethyl ether.

4. The composition as claimed in claim 1 , wherein the decomposing agent includes at least one of a primary amine or an alkanol amine.

5. The composition as claimed in claim 4 , wherein the decomposing agent includes at least one of monoethanol amine or isopropanol amine.

6. The composition as claimed in claim 1 , wherein:
the composition includes the cleaning accelerator, and
the cleaning accelerator includes a quaternary ammonium hydroxide.

7. The composition as claimed in claim 6 , wherein:
the composition includes the cleaning accelerator, and
the cleaning accelerator includes tetramethyl ammonium hydroxide or choline.

8. The composition as claimed in claim 1 , wherein:
the composition includes the chelating agent, and
the chelating agent includes ethylene diamine, diethylene triamine, triethylene tetramine, tetraethylene pentamine, or ethylenediamine tetraacetic acid.

9. The composition as claimed in claim 1 , wherein the composition is used for removing a metal complex formed by a combination of at least one ferromagnetic metal and at least one non-ferromagnetic metal.

10. The composition as claimed in claim 9 , wherein the aliphatic amine of the decomposing agent is capable of being coordinated with the metal complex.

11. A composition for cleaning a magnetic pattern, the composition comprising:
about 50 weight percent to about 95 weight percent of a glycol ether-based organic solvent;
about 4 weight percent to about 45 weight percent of a decomposing agent that includes an aliphatic amine;
about 0.001 weight percent to about 5 weight percent of a cleaning accelerator that includes an organic alkaline compound; and
about 0.001 weight percent to about 5 weight percent of a chelating agent, all weight percent being based on a total weight of the composition,
wherein the composition has a pH of about 9 to about 12.5.

12. The composition as claimed in claim 11 , wherein:
the organic solvent includes at least one of diethylene glycol monomethyl ether or dipropylene glycol monomethyl ether, and
the decomposing agent includes at least one of a primary amine or an alkanol amine.

13. The composition as claimed in claim 11 , wherein the cleaning accelerator includes a quaternary ammonium hydroxide.

14. The composition as claimed in claim 11 , wherein the chelating agent includes ethylenediamine tetraacetic acid.

15. The composition as claimed in claim 11 , wherein the composition is devoid of water.

16. A composition for cleaning a magnetic pattern, the composition consisting essentially of:
a glycol ether-based organic solvent;
an aliphatic amine; and
at least one of:
a chelating agent, or
an organic alkaline compound,
wherein the composition has a pH of about 9 to about 12.5.

17. The composition as claimed in claim 16 , wherein the glycol ether-based organic solvent includes diethylene glycol monomethyl ether, triethylene glycol monobutyl ether, ethylene glycol monohexyl ether, diethylene glycol monohexyl ether, diethylene glycol monophenyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monomethyl ether, dipropylene glycol monopropyl ether, propylene glycol monobutyl ether, or dipropylene glycol monobutyl ether.

18. The composition claim 17 , wherein the organic solvent includes at least one of diethylene glycol monomethyl ether or dipropylene glycol monomethyl ether.

19. The composition as claimed in claim 16 , wherein the aliphatic amine includes at least one of a primary amine or an alkanol amine.

20. The composition as claimed in claim 19 , wherein the aliphatic amine includes at least one of monoethanol amine or isopropanol amine.

Assignees

• Samsung Electronics Co Ltd
• Samyoung Pure Chemicals Co Ltd

Inventors

• Kim Ho-Young
• Bae Jin-Hye
• Han Hoon
• Lee Won-Jun
• Lee Chang-Kyu
• Baek Geun-Joo
• Jeon Jung-Ig

Classifications

• H10N50/85

  Materials of the active region · CPC title

• G11C11/161

  details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell · CPC title

• H01L27/228

  Electricity · mapped topic

• H01L43/08 Primary

  Electricity · mapped topic

• H01L43/10

  Electricity · mapped topic