Curable and hygroscopic resin composition for sealing electronic devices, resin cured material, and electronic device

US10829670B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10829670-B2
Application numberUS-201815875792-A
CountryUS
Kind codeB2
Filing dateJan 19, 2018
Priority dateJul 21, 2015
Publication dateNov 10, 2020
Grant dateNov 10, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A curable and hygroscopic resin composition for sealing electronic devices, comprising: a radically polymerizable compound (a); a hygroscopic compound (b) containing a structure represented by Formula (1); and a photo-radical polymerization initiator (c); a resin cured material formed by curing the composition, and an electronic device sealed by curing the composition. wherein in Formula (1), R designates (i) an acyl group, (ii) a hydrocarbon group, or (iii) a group having at least one selected from the group consisting of —O—, —S—, —CO—, and —NH—, between a carbon-carbon bond of the above-described hydrocarbon group; M designates a boron or aluminum atom; n is an integer of 2 to 20; and *1 and *2 each designate a binding site to a terminal group or are bonded to each other.

First claim

Opening claim text (preview).

The invention claimed is: 1. A curable and hygroscopic resin composition for sealing electronic devices, comprising: a radically polymerizable compound (a); a hygroscopic compound (b) containing a structure represented by Formula (1); and a photo-radical polymerization initiator (c): wherein in Formula (1), R designates (i) an acyl group, (ii) a hydrocarbon group, or (iii) a group having at least one selected from the group consisting of —O—, —S—, —CO—, and —NH—, between a carbon-carbon bond of the above-described hydrocarbon group; provided that, a part of hydrogen atoms, which the forgoing groups (i), (ii) and (iii) each have, may be substituted with a hydroxyl group, a halogen atom or a cyano group; M designates a boron atom or an aluminum atom; n is an integer of 2 to 20; plural Ws and M's may be the same or different from each other, respectively; and *1 and *2 each designate a binding site to a terminal group or are bonded to each other. 2. The curable and hygroscopic resin composition for sealing electronic devices described in claim 1 , wherein the radically polymerizable compound (a) is a (meth)acrylate compound. 3. The curable and hygroscopic resin composition for sealing electronic devices described in claim 1 , wherein the radically polymerizable compound (a) has one or more alicyclic skeletons. 4. The curable and hygroscopic resin composition for sealing electronic devices described in claim 3 , wherein the alicyclic skeleton is at least one of a tricyclodecane skeleton and a hydrogenated bisphenol A skeleton. 5. The curable and hygroscopic resin composition for sealing electronic devices described in claim 1 , comprising a solvent (d), wherein the boiling point of the solvent (d) is 100° C. or more. 6. The curable and hygroscopic resin composition for sealing electronic devices described in claim 5 , wherein the boiling point of the solvent (d) is 160° C. or more. 7. The curable and hygroscopic resin composition for sealing electronic devices described in claim 5 , wherein the boiling point of the solvent (d) is 240° C. or more. 8. The curable and hygroscopic resin composition for sealing electronic devices described in claim 5 , wherein the solvent (d) is a naphthene-series solvent or an isoparaffin-series solvent. 9. The curable and hygroscopic resin composition for sealing electronic devices described in claim 5 , wherein the ratio d/b of the content of the solvent (d) to the content of the hygroscopic compound (b) is 2 or less. 10. The curable and hygroscopic resin composition for sealing electronic devices described in claim 1 , wherein the hygroscopic compound (b) is represented by Formula (2): wherein, in Formula (2), R 1 has the same meaning as R in Formula (1). 11. The curable and hygroscopic resin composition for sealing electronic devices described in claim 1 , wherein the hygroscopic compound (b) is contained in an amount of 0.1 mass % or more and 50 mass % or less, in 100 mass % of the curable and hygroscopic resin composition. 12. The curable and hygroscopic resin composition for sealing electronic devices described in claim 2 , wherein the radically polymerizable compound (a) has one or more alicyclic skeletons.

Assignees

Inventors

Classifications

  • by a substrate and the encapsulations · CPC title

  • Fillings or auxiliary members in containers, e.g. centering rings (fillings or auxiliary members for thermal protection or control in containers or encapsulations H10W40/70) · CPC title

  • by multiple encapsulations, e.g. by a thin protective coating and a thick encapsulation · CPC title

  • comprising organic materials, e.g. plastics or resins · CPC title

  • comprising getter material or desiccants · CPC title

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Frequently asked questions

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What does patent US10829670B2 cover?
A curable and hygroscopic resin composition for sealing electronic devices, comprising: a radically polymerizable compound (a); a hygroscopic compound (b) containing a structure represented by Formula (1); and a photo-radical polymerization initiator (c); a resin cured material formed by curing the composition, and an electronic device sealed by curing the composition. …
Who is the assignee on this patent?
Furukawa Electric Co Ltd
What technology area does this patent fall under?
Primary CPC classification C09J11/06. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Nov 10 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).