Methods of forming a self-assembled block copolymer material

Patent metadata

Field	Value
Publication number	US-10828924-B2
Application number	US-201816004063-A
Country	US
Kind code	B2
Filing date	Jun 8, 2018
Priority date	Feb 5, 2008
Publication date	Nov 10, 2020
Grant date	Nov 10, 2020

Abstract

Methods for fabricating stamps and systems for patterning a substrate, and devices resulting from those methods are provided.

First claim

What is claimed is:

1. A method of forming a self-assembled block copolymer material, comprising:
contacting a block copolymer material with a stamp comprising hydrophilic regions and hydrophobic regions, each of the hydrophilic regions and each of the hydrophobic regions having a width equal to an inherent pitch value (L o ) of the block copolymer material; and
annealing the block copolymer material to self-assemble the block copolymer material into perpendicular-oriented polymer domains, a first of the perpendicular-oriented polymer domains preferentially wetting the hydrophilic regions of the stamp and a second of the perpendicular-oriented polymer domains preferentially wetting the hydrophilic regions of the stamp.

2. The method of claim 1 , further comprising:
removing the stamp from contact with the perpendicular-oriented polymer domains; and
contacting another block copolymer material with the stamp.

3. The method of claim 1 , further comprising:
removing one of the perpendicular-oriented polymer domains relative to another of the perpendicular-oriented polymer domains to form a mask exhibiting openings extending to and exposing portions of an underlying structure; and
etching the exposed portions of the underlying structure through the openings in the mask.

4. The method of claim 1 , further comprising:
forming a template comprising additional hydrophilic regions and additional hydrophobic regions;
forming an elastomeric polymer material on a surface of the template, the elastomeric polymer material comprising hydrophilic molecules and hydrophobic molecules;
curing the elastomeric polymer material to form the stamp, the hydrophilic regions of the stamp registered to the additional hydrophilic regions of the template and the hydrophobic regions of the stamp registered to the additional hydrophobic regions of the template; and
removing the stamp from the template.

5. The method of claim 4 , further comprising selecting the elastomeric polymer material from the group consisting of a poly(dimethylsiloxane), a silicone, and a polyurethane.

6. The method of claim 4 , further comprising selecting the hydrophobic molecules from the group consisting of perfluorinated alkenes, vinyl esters, and hydrocarbon alkenes.

7. The method of claim 4 , further comprising selecting the hydrophilic molecules from the group consisting of oligo(ethylene glycol) methacrylate, undec-11-enyl hexaethylene glycol monomethyl ether, and vinylic poly(ethylene glycol).

Assignees

• Micron Technology Inc

Inventors

• Millward Dan B
• Sandhu Gurtej S

Classifications

• B81C99/009 Primary

  Manufacturing the stamps or the moulds · CPC title

• B82Y10/00

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

• B05D1/283

  Transferring monomolecular layers or solutions of molecules adapted for forming monomolecular layers from carrying elements · CPC title

• Y10T428/24802

  Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] · CPC title

• B82Y30/00

  Nanotechnology for materials or surface science, e.g. nanocomposites · CPC title