CVD or PVD reactor for coating large-area substrates

Patent metadata

Field	Value
Publication number	US-10822701-B2
Application number	US-201515528476-A
Country	US
Kind code	B2
Filing date	Nov 18, 2015
Priority date	Nov 20, 2014
Publication date	Nov 3, 2020
Grant date	Nov 3, 2020

Abstract

A CVD or PVD coating device comprises a housing and a gas inlet organ secured to the housing via a retaining device, the gas inlet organ having a gas outlet surface with gas outlet openings. The retaining device is only secured at its horizontal edge to the housing so as to stabilize the retaining device with respect to deformations and temperature. The gas inlet organ is secured, at a plurality of suspension points, to the retaining device by means of a plurality of hanging elements distributed over the entire horizontal surface of the retaining device. The retaining device has mechanical stabilization elements formed by a retaining frame having vertical walls that are interconnected at vertical connection lines. An actively cooled heat shield is situated between the retaining device and the gas inlet organ.

First claim

What is claimed is:

1. A chemical vapor deposition (CVD) or physical vapor deposition (PVD) coating device, comprising:
a housing ( 1 , 2 );
a gas inlet organ ( 7 ) in a form of a hollow body, the gas inlet organ ( 7 ) having a hollow space disposed between a rear wall of the gas inlet organ ( 7 ) and a front wall of the gas inlet organ ( 7 ), wherein the front wall has a gas outlet surface ( 7 ′) exhibiting gas outlet openings ( 8 ) arranged like a showerhead, and wherein the gas inlet organ ( 7 ) is provided with temperature control channels for heating the gas inlet organ ( 7 ) at a high temperature during a coating process;
a retaining device ( 3 ) secured to an upper section of the housing ( 1 ), wherein the gas inlet organ ( 7 ) is secured to the retaining device ( 3 ) with hangers ( 6 ) being fixed at a plurality of suspension points ( 6 ′) uniformly distributed in a two-dimensional fashion over an entire extension surface of the gas inlet organ ( 7 ), each of the hangers ( 6 ) having a head ( 6 ″) that is secured to the retaining device ( 3 ); and
an actively cooled temperature control device ( 11 , 12 ) arranged between the rear wall of the gas inlet organ ( 7 ) and the retaining device ( 3 ) as an active heat shield, wherein the actively cooled temperature control device ( 11 , 12 ) is configured to stabilize a temperature of the retaining device ( 3 ), is secured to the hangers ( 6 ), and extends over the entire extension surface of the gas inlet organ ( 7 ),
wherein the rear wall of the gas inlet organ ( 7 ) is arranged between the actively cooled temperature control device ( 11 , 12 ) and the front wall of the gas inlet organ ( 7 ).

2. The CVD or PVD coating device of claim 1 , wherein the actively cooled temperature control device ( 11 , 12 ) has temperature control medium channels ( 12 ).

3. The CVD or PVD coating device of claim 1 , wherein the retaining device ( 3 ) has mechanical stabilization elements ( 4 , 5 ).

4. The CVD or PVD coating device of claim 1 , wherein the retaining device ( 3 ) consists of a retaining frame exhibiting vertical walls ( 4 , 5 ) interconnected at vertical connection lines.

5. The CVD or PVD coating device of claim 1 , wherein the retaining device ( 3 ) is secured to the housing ( 1 ) exclusively at a horizontal edge ( 3 ′) of the retaining device ( 3 ).

6. The CVD or PVD coating device of claim 1 , wherein the retaining device ( 3 ) is secured to the housing ( 1 ) with elastic fastening means ( 13 , 14 ).

7. The CVD or PVD coating device of claim 1 , wherein the hangers ( 6 ) are distributed over an entirety of a horizontal extension surface ( 20 ) of the retaining device ( 3 ), wherein the hangers ( 6 ) extend in a vertical direction from the suspension points ( 6 ′) of the gas inlet organ ( 7 ) to the retaining device ( 3 ).

8. The CVD or PVD coating device of claim 1 , wherein one or more heat shields ( 10 ) are arranged in a vertical space between the gas inlet organ ( 7 ) and the retaining device ( 3 ).

9. The CVD or PVD coating device of claim 8 , wherein the one or more heat shields includes the actively cooled temperature control device ( 11 ) arranged immediately adjacent to the retaining device ( 3 ).

10. The CVD or PVD coating device of claim 7 , wherein two of the suspension points ( 6 ′) which are located immediately adjacent to one another are spaced apart from each other at most by one fifth of a circle equivalent diagonal of the gas inlet organ ( 7 ).

11. The CVD or PVD coating device of claim 1 , wherein the retaining device ( 3 ) comprises a plurality of cells, each of the cells having cell walls ( 4 , 5 ) extending in a vertical direction and a horizontal cell surface, wherein an area of the horizontal cell surface measures at most one percent of a base area of the retaining device ( 3 ).

12. The CVD or PVD coating device of claim 7 , wherein the actively cooled temperature control device ( 11 , 12 ) comprises a plate whose surface extension corresponds to the horizontal extension surface ( 20 ) of the retaining device ( 3 ) or the extension surface of the gas inlet organ ( 7 ).

Assignees

• Aixtron Se

Inventors

• Franken Walter
• Zintzen Bernhard
• Janssen Henricus Wilhelmus Aloysius

Classifications

• C23C16/45565 Primary

  Shower nozzles · CPC title

• B01J3/03

  Pressure vessels, or vacuum vessels, having closure members or seals specially adapted therefor · CPC title

• C23C16/545 Primary

  for coating elongated substrates · CPC title

• C23C14/12

  Organic material · CPC title

• B01J3/02

  Feed or outlet devices therefor · CPC title