SiOx filtration unit and method for operating the SiOx filtration unit

US10814264B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10814264-B2
Application numberUS-201615766415-A
CountryUS
Kind codeB2
Filing dateOct 10, 2016
Priority dateOct 9, 2015
Publication dateOct 27, 2020
Grant dateOct 27, 2020

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

There is provided a Czochralski puller installation for Si monocrystalline ingot growth, including: a Czochralski puller; a SiOx dust filter system; and a vacuum pump connected downstream of said SiOx dust filter system, the SiOx dust filter system including at least a first filtration branch having a first SiOx filter unit, and at least a second filtration branch having a second SiOx filter unit, the first filtration branch and the second filtration branch being disposed in parallel and connected to a common first connection point upstream of first and second upstream valves and to a common second connection point downstream of first and second downstream valves, the first and the second filtration branches being connected through a bypass branch having a needle valve for pressure equilibration between the first and the second filtration branches.

First claim

Opening claim text (preview).

The invention claimed is: 1. A Czochralski puller installation for Si monocrystalline ingot growth, comprising: a Czochralski puller; a SiOx dust filter system; and a vacuum pump connected downstream of said SiOx dust filter system, the SiOx dust filter system comprising at least a first filtration branch having a first SiOx filter unit presenting an exchangeable filter contained in a canister comprising a canister valve configured to allow an increase in pressure in the canister to atmospheric pressure during a filter change, a first upstream valve and a first downstream valve configured to isolate the first SiOx filter unit during the filter change, and at least a second filtration branch having a second SiOx filter unit presenting an exchangeable filter contained in a canister comprising a canister valve configured to allow an increase in pressure in the canister to atmospheric pressure during a filter change, a second upstream valve and a second downstream valve configured to isolate the second SiOx filter unit during the filter change, the first filtration branch and the second filtration branch being disposed in parallel and connected to a common first connection point upstream of the first and the second upstream valves and to a common second connection point downstream of the first and the second downstream valves, wherein the first and the second filtration branches are connected through a bypass branch having a needle valve for pressure equilibration between the first and the second filtration branches, wherein the common second connection point is configured to be connected to the vacuum pump, the vacuum pump having a maximum pumping flow, and the needle valve is configured to let pass, in one open position, a gas flow enough for pressure reduction in one of the first and respective second SiOx filter units while pressure variation at the Czochralski puller stays in tolerance limits of a Czochralski pulling process. 2. The Czochralski puller installation according to claim 1 , wherein the first filter unit and the second filter unit comprise respectively, as a filter, a SiOx filter cartridge. 3. The Czochralski puller installation according to claim 1 , wherein the needle valve is configured to be controlled between a closed position inhibiting a gas flow between the first and the second filtration branches and at least the one open position allowing gas to flow between the first and the second filtration branches. 4. The Czochralski puller installation according to claim 1 , wherein the bypass branch is connected to a third connection point disposed between the first SiOx filter unit and the first upstream valve of the first filtration branch and a fourth connection point disposed between the second SiOx filter unit and the second upstream valve of the second filtration branch. 5. A method for operating a Czochralski puller installation according to claim 1 , the method comprising: closing the needle valve, an upstream valve, and a downstream valve of one filtration branch to isolate the SiOx filter unit, the upstream and the downstream valves of the other filtration branch being in an open position; opening a canister valve to put the canister of said SiOx filter unit at atmospheric pressure; opening the canister and exchanging the filter of the isolated SiOx filter unit; closing said canister valve and said canister; opening said needle valve for pressure equilibration between both filtration branches; opening said downstream valve for maintaining equal pressure between both filtration branches; and closing said needle valve.

Assignees

Inventors

Classifications

  • C30B15/00Primary

    Single-crystal growth by pulling from a melt, e.g. Czochralski method (under a protective fluid C30B27/00) · CPC title

  • Devices for taking out of action one or more units of multi-unit filters, e.g. for regeneration or maintenance · CPC title

  • connected in parallel · CPC title

  • Other waste gases · CPC title

  • Mounting of filtering elements within casings, housings or frames (B01D46/2422 takes precedence) · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10814264B2 cover?
There is provided a Czochralski puller installation for Si monocrystalline ingot growth, including: a Czochralski puller; a SiOx dust filter system; and a vacuum pump connected downstream of said SiOx dust filter system, the SiOx dust filter system including at least a first filtration branch having a first SiOx filter unit, and at least a second filtration branch having a second SiOx filter un…
Who is the assignee on this patent?
Total Marketing Services
What technology area does this patent fall under?
Primary CPC classification C30B15/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 27 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).