Method of forming a microphase separated block copolymer and microphase separated block copolymer

Patent metadata

Field	Value
Publication number	US-10793649-B2
Application number	US-201816179078-A
Country	US
Kind code	B2
Filing date	Nov 2, 2018
Priority date	Nov 3, 2017
Publication date	Oct 6, 2020
Grant date	Oct 6, 2020

Abstract

A method of forming a microphase separated block copolymer includes exposing a block copolymer to acid vapor under conditions effective to provide the microphase separated block copolymer. The block copolymer includes a first hydrophobic block and a second hydrophobic block that is acid-sensitive. The microphase separated block copolymer includes the first hydrophobic block and a hydrophilic block derived from the second hydrophobic block. Exposing the block copolymer to the acid vapor is conducted in the solid state.

First claim

The invention claimed is:

1. A method of forming a gradient microphase separated block copolymer film, the method comprising:
exposing a block copolymer film comprising
a first hydrophobic block; and
a second hydrophobic block, wherein the second hydrophobic block is acid-sensitive;

to acid vapor under conditions effective to provide the gradient microphase separated block copolymer comprising
a first portion adjacent to a first edge of the film, wherein the first portion is microphase separated and comprises domains comprising the first hydrophobic block and domains comprising a hydrophilic block derived from the second hydrophobic block;
a gradient portion exhibiting a microphase separation gradient extending from the first portion to a second, opposite edge of the film; and
optionally, a second portion, wherein the second portion is phase-mixed and comprises the block copolymer comprising the first hydrophobic block and the second hydrophobic block, provided that when the second portion is present, the second portion is adjacent to the second, opposite edge of the film and the gradient portion extends from the first portion to the second portion; and

thermally annealing the gradient microphase separated block copolymer film;
wherein the exposing is conducted in the solid state.

2. The method of claim 1 , wherein the first portion of the gradient microphase separated block copolymer film comprises lamellar microdomains or cylindrical microdomains.

3. The method of claim 1 , wherein the first hydrophobic block comprises repeating units derived from a C 1-12 alkyl (meth)acrylate, a C 6-20 aryl (meth)acrylate, styrenic monomers, fluorinated monomers, diene monomers, or combinations thereof.

4. The method of claim 1 , wherein the first hydrophobic block comprises repeating units derived from styrene.

5. The method of claim 1 , wherein the second hydrophobic block comprises repeating units according to formula (I),

wherein R 1 is independently at each occurrence hydrogen or methyl, X is —O— or —NH—, and L 1 is independently at each occurrence a C 1-6 alkylene group.

6. The method of claim 1 , wherein the hydrophilic block derived from the hydrophobic block comprises repeating units according to formula (II), (III), or a combination there of

wherein R 1 is independently at each occurrence hydrogen or methyl, X is —O— or —NH—, and L 1 is independently at each occurrence a C 1-6 alkylene group.

7. The method of claim 1 , wherein the acid vapor comprises trifluoroacetic acid vapor, hydrochloric acid vapor, trichloroacetic acid, dichloroacetic acid, hydrobromic acid, or combinations thereof.

8. The method of claim 1 , wherein the block copolymer has a number average molecular weight of 2,000 to 200,000 grams per mole.

9. The method of claim 1 , wherein the block copolymer has a volume fraction of the second hydrophobic block of 0.25 to 0.75.

10. The method of claim 1 , wherein exposing the block copolymer to the acid vapor is for a time of 1 to 30 minutes.

11. The method of claim 1 , wherein thermally annealing the microphase separated block copolymer is at a temperature of 100 to 200° C. for a time of 1 to 24 hours.

12. The method of claim 1 , wherein the block copolymer film is positioned relative to the acid vapor source such that the first edge of the film is a first distance from the acid vapor source, and the second edge is a second distance from the acid Vapor source, wherein the first distance is less than the second distance.

13. The method of claim 12 , wherein the first portion of the microphase separated block copolymer film comprises lamellar microdomains or cylindrical microdomains.

14. The method of claim 12 , wherein the block copolymer film has a thickness of 10 to 100 nanometers.

15. The method of claim 12 , wherein
the first hydrophobic block comprises repeating units derived from a C 1-12 alkyl (meth)acrylate, a C 6-20 aryl (meth)acrylate, styrenic monomers, fluorinated monomers, diene monomers, or combinations thereof;
the second hydrophobic block comprises repeating units according to formula (I), (II), or a combination thereof

wherein R 1 is independently at each occurrence hydrogen or methyl, X is —O— or —NH—, and L 1 is independently at each occurrence a C 1-6 alkylene group;
the hydrophilic block derived from the hydrophobic block comprises repeating units according to formula (II), (III), or a combination thereof

wherein R 1 is independently at each occurrence hydrogen or methyl, X is —O— or —NH—, and L 1 is independently at each occurrence a C 1-6 alkylene group; and
wherein the acid vapor comprises trifluoroacetic acid vapor.

16. A gradient microphase separated thin film comprising a block copolymer, wherein the thin film comprises
a first portion adjacent to a first edge of the thin film, wherein the first portion is microphase separated and comprises domains comprising a first hydrophobic block and domains comprising a hydrophilic block;
a gradient portion exhibiting a microphase separation gradient extending from the first portion to a second, opposite edge of the film; and
optionally a second portion, wherein the second portion is phase-mixed and comprises the block copolymer comprising the first hydrophobic block and a second hydrophobic block that is acid-sensitive, provided that when the second portion is present, the second portion is adjacent to the second, opposite edge of the film and the gradient portion extends from the first portion to the second portion;
wherein a χN value between the first hydrophobic block and the hydrophilic blocks is greater than 10.5; and
wherein the first portion comprising the microphase separated block copolymer comprises lamellar or cylindrical microdomains having a pitch of less than or equal to 6 nanometers.

17. The gradient microphase separated block copolymer of claim 16 , wherein
the first hydrophobic block comprises repeating units derived from a C 1-12 alkyl (meth)acrylate, a C 6-20 aryl (meth)acrylate, styrenic monomers, fluorinated monomers, diene monomers, and combinations thereof; and
the hydrophilic block comprises repeating units according to formula (II), (III), or a combination thereof

wherein R 1 is independently at each occurrence hydrogen or methyl, X is —O— or —NH—, and L 1 is independently at each occurrence a C 1-6 alkylene group.

Assignees

• Univ Massachusetts
• Univ New York State Res Found

Inventors

• Russell Thomas P
• Yu Duk Man
• Rzayev Javid
• Mapas Jose Kenneth D

Classifications

• C08F6/26 Primary

  Treatment of polymers prepared in bulk {also solid polymers or polymer melts, (C08F6/001, C08F6/006, C08F6/008, C08F6/02, C08F6/04 take precedence)} · CPC title

• C08L53/00

  Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers · CPC title