Naphthobischalcogenadiazole derivative and production method therefor

US10793584B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10793584-B2
Application numberUS-201716473886-A
CountryUS
Kind codeB2
Filing dateOct 13, 2017
Priority dateDec 27, 2016
Publication dateOct 6, 2020
Grant dateOct 6, 2020

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

In order to provide a naphthobischalcogenadiazole derivative that can be used as an intermediate for producing a naphthobischalcogenadiazole compound into which a fluorine atom has been introduced, the naphthobischalcogenadiazole derivative in accordance with an aspect of the present invention is represented by a formula (I): where each of A 1 and A 2 is independently an oxygen atom, a sulfur atom, a selenium atom, or a tellurium atom; and each of X 1 and X 2 is independently a hydrogen atom, a halogen atom, a boronic acid group, a boronic acid ester group, a boronic acid diaminonaphthalene amide group, an N-methyliminodiacetic acid boronate group, a trifluoroborate salt group, or a triolborate salt group.

First claim

Opening claim text (preview).

The invention claimed is: 1. A naphthobischalcogenadiazole derivative represented by a formula (I): where each of A 1 and A 2 is independently an oxygen atom, a sulfur atom, a selenium atom, or a tellurium atom; and each of X 1 and X 2 is independently a boronic acid group, a boronic acid ester group, a boronic acid diaminonaphthalene amide group, an N-methyliminodiacetic acid boronate group, a trifluoroborate salt group, or a triolborate salt group. 2. The naphthobischalcogenadiazole derivative as set forth in claim 1 , wherein each of A 1 and A 2 is independently an oxygen atom, a sulfur atom, or a selenium atom. 3. The naphthobischalcogenadiazole derivative as set forth in claim 1 , wherein both of A 1 and A 2 are sulfur atoms or selenium atoms. 4. The naphthobischalcogenadiazole derivative as set forth in claim 1 , wherein both of X 1 and X 2 are boronic acid ester groups. 5. The naphthobischalcogenadiazole derivative as set forth in claim 4 , wherein the boronic acid ester group is a boronic acid dialkyl ester group or a boronic acid cyclic ester group. 6. A method for producing a naphthobischalcogenadiazole derivative represented by a formula (I): where each of A 1 and A 2 is independently an oxygen atom, a sulfur atom, a selenium atom, or a tellurium atom; and each of X 1 and X 2 is independently a hydrogen atom, a halogen atom, a boronic acid group, a boronic acid ester group, a boronic acid diaminonaphthalene amide group, an N-methyliminodiacetic acid boronate group, a trifluoroborate salt group, or a triolborate salt group, said method comprising the step of oxidizing and then reducing diamino-difluoro-dinitronaphthalene or hydrochloride thereof. 7. A method as set forth in claim 6 , said method comprising the steps of: reducing the diamino-difluoro-dinitronaphthalene or hydrochloride thereof to obtain tetraamino-difluoronaphthalene or hydrochloride thereof; causing the tetraamino-difluoronaphthalene or hydrochloride thereof to react with a sulfurizing agent, a selenizing agent, or a tellurizing agent to obtain a naphthobischalcogenadiazole derivative; and then causing the naphthobischalcogenadiazole derivative to react with a halogenating agent or a boronizing agent. 8. A method as set forth in claim 6 , said method comprising the steps of oxidizing and then reducing diamino-difluoro-dinitronaphthalene or hydrochloride thereof, and causing a naphthobischalcogenadiazole derivative, which has been obtained in the above step, to react with a halogenating agent or a boronizing agent. 9. A method as set forth in claim 6 , further comprising the steps of: producing tetraamino-difluoronaphthalene or hydrochloride thereof by reducing the diamino-difluoro-dinitronaphthalene or hydrochloride thereof; and then causing the tetraamino-difluoronaphthalene or hydrochloride thereof to react with a sulfurizing agent, a selenizing agent, or a tellurizing agent. 10. A method as set forth in claim 6 , further comprising the step of producing the diamino-difluoro-dinitronaphthalene or hydrochloride thereof by subjecting diamino-difluoronaphthalene or hydrochloride thereof to nitration reaction. 11. A method as set forth in claim 10 , further comprising the step of producing the diamino-difluoronaphthalene or hydrochloride thereof by subjecting difluoronaphthalene to amination reaction. 12. A method as set forth in claim 11 , further comprising the step of producing the difluoronaphthalene by subjecting diaminonaphthalene to fluorination reaction. 13. A method as set forth in claim 9 , further comprising the step of producing the diamino-difluoro-dinitronaphthalene or hydrochloride thereof by subjecting diamino-difluoronaphthalene or hydrochloride thereof to nitration reaction. 14. A method as set forth in claim 13 , further comprising the step of producing the diamino-difluoronaphthalene or hydrochloride thereof by subjecting difluoronaphthalene to amination reaction. 15. A method as set forth in claim 14 , further comprising the step of producing the difluoronaphthalene by subjecting diaminonaphthalene to fluorination reaction.

Assignees

Inventors

Classifications

  • Organic PV cells · CPC title

  • Ortho-condensed systems · CPC title

  • C07D513/04Primary

    Ortho-condensed systems · CPC title

  • comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene · CPC title

  • characterised by the channel regions · CPC title

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What does patent US10793584B2 cover?
In order to provide a naphthobischalcogenadiazole derivative that can be used as an intermediate for producing a naphthobischalcogenadiazole compound into which a fluorine atom has been introduced, the naphthobischalcogenadiazole derivative in accordance with an aspect of the present invention is represented by a formula (I): …
Who is the assignee on this patent?
Univ Osaka, Ishihara Sangyo Kaisha
What technology area does this patent fall under?
Primary CPC classification C07D513/04. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 06 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).