Laser machining device for correcting processing conditions before laser machining based on contamination level of optical system

US10792758B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10792758-B2
Application numberUS-201816129239-A
CountryUS
Kind codeB2
Filing dateSep 12, 2018
Priority dateSep 14, 2017
Publication dateOct 6, 2020
Grant dateOct 6, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A laser machining device includes a storage unit configured to store a reference value based on an energy amount of returning light when laser light is emitted, in a state where external optical system is not contaminated, toward a reflection plate with a predetermined output low enough not to melt or deform the reflection plate such that a focus position of the laser light aligns with a predetermined position, and a processing condition correction unit configured to correct, prior to laser machining, a processing condition in accordance with the contamination level of the external optical system, wherein the processing condition correction unit includes a laser power correction section configured to correct a laser power of the processing condition based on the measurement value measured by a returning light measurement unit and the reference value.

First claim

Opening claim text (preview).

The invention claimed is: 1. A laser machining device configured to laser machine a workpiece after correcting a processing condition in accordance with a contamination level of an optical system, the laser machining device comprising: a laser oscillator; an external optical system configured to guide laser light from the laser oscillator and focus the laser light on the surface of a workpiece; a driver configured to move a focus position of the laser light emitted from the external optical system; a reflection plate disposed perpendicularly to an optical axis of the laser light and having a constant reflectance with respect to the laser light; a returning light measurement sensor configured to measure an energy amount of returning light reflected by the reflection plate and returning to the laser machining device; a memory configured to store a reference value based on the energy amount of the returning light when laser light is emitted, in a state where the external optical system is not contaminated, toward the reflection plate with a predetermined output low enough not to melt or deform the reflection plate such that the focus position of the laser light aligns with a predetermined position; and a processor configured to correct, prior to laser machining, a processing condition in accordance with the contamination level of the external optical system, wherein the processor is configured to: issue, with respect to the driver, a command to align the focus position to a position identical to the predetermined position toward the reflection plate, issue, with respect to the laser oscillator, a command to emit laser light toward the reflection plate with a low output identical to the predetermined output, and correct the laser power of the processing condition based on the measurement value measured by the returning light measurement sensor and the reference value. 2. The laser machining device of claim 1 , wherein the returning light measurement sensor is disposed inside the external optical system. 3. The laser machining device of claim 1 , wherein the returning light measurement sensor is disposed inside the laser oscillator. 4. A laser machining device configured to laser machine a workpiece after correcting a processing condition in accordance with a contamination level of an optical system, the laser machining device comprising: a laser oscillator; an external optical system configured to guide laser light from the laser oscillator and focus the laser light on the surface of a workpiece; a driver configured to move a focus position of the laser light emitted from the external optical system; a half mirror disposed perpendicularly to an optical axis of the laser light and having a constant reflectance with respect to the laser light; a laser light removal unit configured to remove laser light transmitted through the half mirror; a returning light measurement sensor configured to measure an energy amount of returning light reflected by the half mirror and returning to the laser machining device; and a processor configured to correct, prior to laser machining, a processing condition in accordance with the contamination level of the external optical system; wherein the processor is configured to: issue, with respect to the driver, a command to align the focus position to a predetermined position toward the half mirror, issue, with respect to the laser oscillator, a command to emit laser light toward the half mirror with an output high enough to be used for laser machining, calculate a focus movement amount based on comparison of a first measurement value measured by the returning light measurement sensor within a laser emission initiation period in which the external optical system is not warmed up and a second measurement value measured by the returning light measurement sensor within a fixed time elapse period in which the external optical system is warmed up, and correct the focus position of the processing condition based on the calculated focus movement amount. 5. The laser machining device of claim 4 , further comprising: a memory configured to store a reference value based on the energy amount of the returning light when laser light is emitted, in a state where the external optical system is not contaminated, toward the half mirror such that the focus position of the laser light aligns with a position identical to the predetermined position; wherein the processor is further configured to: correct the laser power of the processing condition based on the first measurement value measured by the returning light measurement sensor within a laser emission initiation period in which the external optical system is not warmed up and the reference value. 6. A laser machining device configured to laser machine a workpiece after correcting a processing condition in accordance with a contamination level of an optical system, the laser machining device comprising: a laser oscillator; an external optical system configured to guide laser light from the laser oscillator and focus the laser light on the surface of a workpiece; a driver configured to move a focus position of the laser light emitted from the external optical system; a half mirror disposed perpendicularly to an optical axis of the laser light and having a constant reflectance with respect to the laser light; a laser light removal unit configured to remove laser light transmitted through the half mirror; a returning light measurement sensor configured to measure an energy amount of returning light reflected by the half mirror and returning to the laser machining device; and a processor configured to correct, prior to laser machining, a processing condition in accordance with the contamination level of the external optical system; wherein the processor is configured to: issue, with respect to the driver, a command to align the focus position on the surface of the half mirror, issue, with respect to the laser oscillator, a command to emit laser light toward the half mirror with an output high enough to be used for laser machining, issue, with respect to the driver, a command to move the focus position above and below from the surface of the half mirror, issue, with respect to the laser oscillator, a command to respectively emit laser light in a state in which the focus position is aligned above and below, generate a graph that includes a first measurement value measured in a state in which the focus position is aligned with the surface of the half mirror and a plurality of second measurement values measured in a state in which the focus position is aligned above and below the surface of the half mirror, calculate a focus position from the graph, and calculate a focus movement amount based on a difference between the calculated focus position and the focus position commanded to be aligned on the surface of the half mirror, and correct the focus position of the processing condition based on the calculated focus movement amount. 7. The laser machining device of claim 6 , further comprising: a memory configured to store a reference value based on the energy amount of the returning light when laser light is emitted, in a state where the external optical system is not contaminated, such that the focus position of the laser light aligns with the surface of the half mirror; wherein the processor is further configured to: correct the laser power of the processing condition based on a third measurement value measured by the returning light measurement sensor within a laser emission initiation period in which the external optical system is not warmed up and the reference value.

Assignees

Inventors

Classifications

  • Protective screens · CPC title

  • Energy control of the laser beam (B23K26/0622 takes precedence) · CPC title

  • for monitoring laser beam transmission optics · CPC title

  • comprising lenses · CPC title

  • B23K26/046Primary

    Automatically focusing the laser beam · CPC title

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What does patent US10792758B2 cover?
A laser machining device includes a storage unit configured to store a reference value based on an energy amount of returning light when laser light is emitted, in a state where external optical system is not contaminated, toward a reflection plate with a predetermined output low enough not to melt or deform the reflection plate such that a focus position of the laser light aligns with a predet…
Who is the assignee on this patent?
Fanuc Corp
What technology area does this patent fall under?
Primary CPC classification B23K26/046. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Oct 06 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).