Electron emitter and method of fabricating same

Patent metadata

Field	Value
Publication number	US-10784071-B2
Application number	US-201716324518-A
Country	US
Kind code	B2
Filing date	Jul 31, 2017
Priority date	Aug 8, 2016
Publication date	Sep 22, 2020
Grant date	Sep 22, 2020

Abstract

Electron emitters and methods of fabricating the electron emitters are disclosed. According to certain embodiments, an electron emitter includes a tip with a planar region having a diameter in a range of approximately (0.05-10) micrometers. The electron emitter tip is configured to release field emission electrons. The electron emitter further includes a work-function-lowering material coated on the tip.

First claim

What is claimed is:

1. An electron emitter comprising:
a tip comprising single crystal tungsten and having a planar region with a diameter in a range of 1 micrometer to <10 micrometers; and
a work-function-lowering material coated on the tip.

2. The electron emitter of claim 1 , wherein the work-function-lowering material comprises:
at least one of an oxide compound of zirconium, hafnium, titanium, scandium, yttrium, vanadium, lanthanum, praseodymium, neodymium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, ytterbium, lutetium, or thorium, or
at least one of a nitride compound of zirconium, titanium, niobium, scandium, vanadium, or lanthanum, or
at least one of an oxynitride compound of zirconium, hafnium, titanium, scandium, yttrium, vanadium, lanthanum, praseodymium, neodymium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, ytterbium, lutetium, niobium, or thorium.

3. A thermal field emission cathode, comprising: an emitter comprising:
a tip comprising single crystal tungsten and having a planar region with a diameter in a range of 1 micrometer to <10 micrometers, the tip configured to release field emission electrons; and
a work-function-lowing material coated on the tip; and
a heating component configured to provide thermal energy to the emitter.

4. The thermal field emission cathode of claim 3 , wherein the work-function-lowering material comprises:
at least one of an oxide compound of zirconium, hafnium, titanium, scandium, yttrium, vanadium, lanthanum, praseodymium, neodymium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, ytterbium, lutetium, or thorium, or
at least one of a nitride compound of zirconium, titanium, niobium, scandium, vanadium, or lanthanum, or
at least one of an oxynitride compound of zirconium, hafnium, titanium, scandium, yttrium, vanadium, lanthanum, praseodymium, neodymium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, ytterbium, lutetium, niobium, or thorium.

5. The thermal field emission cathode of claim 3 , further comprising:
a base;
two electrodes embedded into the base; and
an electrically conductive wire including two ends and a central portion, wherein the two ends of the electrically conductive wire are connected to the two electrodes respectively, and the emitter is mounted on the central portion of the electrically conductive wire, the electrically conductive wire being convex to the emitter at the central portion.

6. A method comprising:
applying a restraint to an electron emitter having a tip, the tip comprising single crystal tungsten:
under the restraint, forming on the tip a planar region having a diameter in a range of 1 micrometer to <10 micrometers:
removing the restraint: and
after the restraint is removed, coating a work-function-lowering material on the tip.

7. The method of claim 6 , wherein forming the planar region on the tip comprises:
polishing the tip of the electron emitter to form the planar region.

8. The method of claim 6 further comprising:
attaching a fixture or a jig to the tip; and
using the fixture or jig to form the planar region.

9. The method of claim 6 , wherein applying the restraint to the electron emitter comprises:
applying wax on the tip.

10. The method of claim 6 , further comprising:
after the restraint is removed and before the work-function-lowering material is coated on the tip, heating the electron emitter, wherein the heating removes contaminants on the tip.

11. The method of claim 6 , wherein the work-function-lowering material comprises:
at least one of an oxide compound of zirconium, hafnium, titanium, scandium, yttrium, vanadium, lanthanum, praseodymium, neodymium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, ytterbium, lutetium, or thorium, or
at least one of a nitride compound of zirconium, titanium, niobium, scandium, vanadium, or lanthanum, or
at least one of an oxynitride compound of zirconium, hafnium, titanium, scandium, yttrium, vanadium, lanthanum, praseodymium, neodymium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, ytterbium, lutetium, niobium, or thorium.

12. The method of claim 6 further comprising:
etching an end portion of the electron emitter to form the tip.

13. The electron emitter of claim 1 , wherein the single crystal tungsten has a crystal orientation of <100>.

Assignees

• Asml Netherlands Bv

Inventors

• Dou Juying
• Fan Zheng
• Kuo Tzu-Yi
• Chen Zhongwei

Classifications

• H01J2237/06341

  Field emission · CPC title

• H01J2237/06325

  Cold-cathode sources · CPC title

• H01J2237/06316

  Schottky emission · CPC title

• H01J2237/06308

  Thermionic sources · CPC title

• H01J2209/0223

  Field emission cathodes · CPC title