Etchant composition and silane compound

Patent metadata

Field	Value
Publication number	US-10781371-B2
Application number	US-201916421903-A
Country	US
Kind code	B2
Filing date	May 24, 2019
Priority date	May 26, 2018
Publication date	Sep 22, 2020
Grant date	Sep 22, 2020

Abstract

An etchant composition includes phosphoric acid and a silane compound represented by the following Chemical Formula 1:

wherein A is an n-valent radical, L is C 1 -C 5 hydrocarbylene, R 1 to R 3 are independently hydrogen, hydroxy, hydrocarbyl, or alkoxy, in which R 1 to R 3 exist respectively or are connected to each other by a heteroelement, and n is an integer of 2 to 5.

First claim

What is claimed is:

1. An etchant composition comprising: phosphoric acid and a silane compound represented by the following Chemical Formula 1:

wherein
A is an n-valent radical,
L is C 1 -C 5 hydrocarbylene,
R 1 to R 3 are independently hydrogen, hydroxy, hydrocarbyl, or alkoxy, in which R 1 to R 3 exist respectively or are connected to each other by a heteroelement, and
n is an integer of 2 to 4.

2. The etchant composition of claim 1 , wherein R 1 to R 3 are independently C 1 -C 20 alkoxy or R 1 to R 3 are C 1 -C 20 alkoxy connected to each other by a nitrogen.

3. The etchant composition of claim 1 , wherein A is C 1 -C 20 hydrocarbylene, a radical having N as a binding site, a radical having O as a binding site, a radical having S as a binding site, a radical having P as a binding site, or an amine salt radical.

4. The etchant composition of claim 3 , wherein the C 1 -C 20 hydrocarbylene is C 1 -C 20 alkylene or C 6 -C 20 arylene.

5. The etchant composition of claim 3 , wherein the radical having N as a binding site is *—NR 4 —*, *—NR 15 CSNR 16 —*, *—NR 17 CONR 18 —*, *—NR 19 L 1 NR 20 —*, *—NR 21 CONR 22 L 2 NR 23 CONR 24 —*, *—NR 25 CONL 3 L 4 NCONR 26 —*,

wherein R 14 to R 27 are independently hydrogen, C 1 -C 20 alkyl or C 6 -C 20 aryl,
L 1 to L 5 are C 1 -C 20 alkylene, C 6 -C 20 arylene, or R 41 (OR 42 )p, wherein R 41 and R 42 are independently C 1 -C 20 alkylene, and p is an integer of 1 to 5, and
L 6 is a direct bond or (CH 2 )qNR 43 NR 44 , wherein R 43 and R 44 are independently hydrogen, C 1 -C 20 alkyl, or C 6 -C 20 aryl, and q is an integer of 1 to 5.

6. The etchant composition of claim 3 , wherein the radical having O as a binding site is *—O—*.

7. The etchant composition of claim 3 , wherein the radical having S as a binding site is *—S—*, *—S—S—*,

8. The etchant composition of claim 3 , wherein the radical having P as a binding site is

wherein R 28 and R 29 are independently hydrogen, C 1 -C 20 alkyl, C 6 -C 20 aryl, C 1 -C 20 alkoxy, or C 1 -C 20 alkylC 1 -C 20 alkoxy.

9. The etchant composition of claim 3 , wherein the amine salt radical is *—N + (R 11 R 12 )X 3 − —* or

wherein R 11 and R 12 are independently hydrogen, C 1 -C 20 alkyl or C 6 -C 20 aryl, and X 1 to X 3 are independently halogen or a C 1 -C 20 alkylcarbonate group.

10. The etchant composition of claim 1 , wherein n is 2.

11. The etchant composition of claim 1 , wherein the silane compound is at least one selected from the following Structural Formulae 1 to 38:

wherein R is hydrogen, C 1 -C 20 alkyl, or C 6 -C 20 aryl.

12. The etchant composition of claim 1 , wherein the silane compound is included at 0.001 to 1 wt %, with respect to the entire etchant composition.

13. The etchant composition of claim 12 , further comprising a silane compound represented by the following Chemical Formula 2:

wherein R 71 to R 74 are independently hydrogen, hydrocarbyl, or heterohydrocarbyl.

14. The etchant composition of claim 13 , further comprising an ammonium salt.

15. A silane compound represented by the following Chemical Formula 1:

wherein
R 1 to R 3 are independently hydrogen, hydroxy, hydrocarbyl, or alkoxy, in which R 1 to R 3 exist respectively or are connected to each other by a heteroelement, and
L is C 1 -C 5 hydrocarbylene,
n is an integer of 2 to 4,
A is *—N 30 R 11 R 12 X 3 − —*,

*—NR 19 L 1 NR 20 —*, *—NR 21 CONR 22 L 2 NR 23 CONR 24 —*,

wherein R 11 , R 12 , R 19 to R 24 and R 27 are independently hydrogen, C 1 -C 20 alkyl, or C 6 -C 20 aryl,
X 1 to X 3 are independently halogen or a C 1 -C 20 alkylcarbonate group,
L 1 and L 5 are C 1 -C 20 alkylene or C 6 -C 20 arylene,
L 2 is C 1 -C 20 alkylene, C 6 -C 20 arylene, or R 41 (OR 42 ) p , wherein R 41 and R 42 are C 1 -C 20 alkylene, and p is an integer of 1 to 5, and
L 6 is a direct bond or (CH 2 )qNR 43 CONR 44 , wherein R 43 and R 44 are independently hydrogen, C 1 -C 20 alkyl, or C 6 -C 20 aryl, and q is an integer of 1 to 5.

16. The silane compound of claim 15 , wherein the silane compound represented by Chemical Formula 1 is selected from compounds represented by the following structural formulae:

Assignees

• Sk Innovation Co Ltd
• Sk Mat Co Ltd

Inventors

• Kim Cheol Woo
• Lee Je Ho
• Ham Jin Su
• Kwak Jae Hoon
• Lee Jong Ho

Classifications

• H10P50/667

  by liquid etching only · CPC title

• H10P50/642

  Chemical etching · CPC title

• H10P50/283

  by chemical means · CPC title

• H10P50/28

  of insulating materials · CPC title

• H10P50/00

  Etching of wafers, substrates or parts of devices · CPC title