Polymer, resist composition containing polymer, and method for manufacturing device using same

US10781276B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10781276-B2
Application numberUS-201615763600-A
CountryUS
Kind codeB2
Filing dateSep 29, 2016
Priority dateOct 1, 2015
Publication dateSep 22, 2020
Grant dateSep 22, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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An object of the present invention is to provide a polymer used for a resist composition having high absorption efficiency for a particle beam or an electromagnetic wave, and excellence in sensitivity, resolution and pattern performance characteristics, and provide a resist composition containing the polymer and a method of manufacturing a device using thereof. The polymer comprises: a unit A; and a unit B, wherein the unit A has an onium salt structure and generates a first radical by irradiation with a particle beam or an electromagnetic wave, the unit B has a radical generating structure containing at least one multiple bond which is between a carbon atom and a carbon atom or between a carbon atom and a heteroatom, and generates a second radical by irradiation with a particle beam or an electromagnetic wave, and the multiple bond is not one contained in a benzenoid aromatic.

First claim

Opening claim text (preview).

The invention claimed is: 1. A polymer, comprising: a unit A; and a unit B, wherein: the unit A has an onium salt structure and generates a first radical by irradiation with a particle beam or an electromagnetic wave; the unit B has a radical generating structure containing at least one multiple bond selected from the group consisting of: a multiple bond between a carbon atom and a carbon atom; and a multiple bond between a carbon atom and a heteroatom; the unit B generates a second radical by irradiation with a particle beam or an electromagnetic wave; the multiple bond in the radical generating structure is not a multiple bond contained in a benzenoid aromatic; the polymer does not comprise a unit having an acid dissociable group whose solubility in a water-soluble developer is enhanced by an acid; and the unit B is represented by at least one of following general formulas (III) to (V), wherein, in the general formulas (III) to (V), R 1 is any one selected from the group consisting of: a hydrogen atom; a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms; and a linear, branched or cyclic alkenyl group having 1 to 6 carbon atoms, and where at least one hydrogen atom in the alkyl group and the alkenyl group in R 1 may be substituted with a fluorine atom; L is any one selected from the group consisting of: a carbonyloxy group, a phenylenediyl group, a naphthalenediyl group, a phenylenediyloxy group, a naphthalenediyloxy group, a phenylenediylcarbonyloxy group, a naphthalenediylcarbonyloxy group, a phenylenediyloxycarbonyl group and a naphthalenediyloxycarbonyl group; Sp is any one selected from the group consisting of: a direct bond; a linear, branched or cyclic alkylene group which may have a substituent, the alkylene group having 1 to 6 carbon atoms; and a linear, branched or cyclic alkenylene group which may have a substituent, the alkenylene group having 1 to 6 carbon atoms, and where at least one methylene group in the Sp may be substituted with a divalent heteroatom-containing group; each R 3 is independently any one selected from the group consisting of: a hydrogen atom; a hydroxy group; —R a , where R a is a linear, branched or cyclic alkyl group which may have a substituent, the alkyl group having 1 to 12 carbon atoms, and at least one methylene group in R a may be substituted with a divalent heteroatom-containing group; —OR a ; a group where at least one carbon-carbon single bond in R a is substituted with a carbon-carbon double bond; and —R b , where R b is an aryl group which may have a substituent, the aryl group having 6 to 14 carbon atoms, or R b is a heteroaryl group which may have a substituent, the heteroaryl group having 4 to 12 carbon atoms, where two of R 3 may form a ring structure with each other through a direct single bond, or any one selected from the group consisting of an oxygen atom, a sulfur atom and a methylene group; R 4 is any one selected from the group consisting of: —R a ; —R b ; —OR a ; —SR a ; —OR b ; —SR b ; —OC(═O)R a ; —OC(═O)R b ; —C(═O)OR a ; —C(═O)OR b ; —OC(═O)OR a ; —OC(═O)OR b ; —NHC(═O)R a ; —NR a C(═O)R a ; —NHC(═O)R b ; —NR b C(═O)R b ; —NR a C(═O)R b ; —NR b C(═O)R a ; —N(R a ) 2 ; —N(R b ) 2 ; —N(R a )(R b ); —SO 3 R a ; —SO 3 R b ; —SO 2 R a ; —SO 2 R b ; a group where at least one carbon-carbon single bond in R a is substituted with a carbon-carbon double bond; and a nitro group, n 1 is an integer of 1 to 3, m 1 is an integer of 0 to 4 when n 1 is 1, m 1 is an integer of 0 to 6 when n 1 is 2, and m 1 is 0 to 8 when n 1 is 3; and R 5 is any one selected from the group consisting of: a linear, branched or cyclic alkylene group which may have a substituent, the alkylene group having 1 to 12 carbon atoms; a linear, branched or cyclic alkyleneoxy group which may have a substituent, the alkyleneoxy group having 1 to 12 carbon atoms; a linear, branched or cyclic alkenylene group which may have a substituent, the alkenylene group having 1 to 12 carbon atoms; a linear, branched or cyclic alkenyleneoxy group which may have a substituent, the alkenyleneoxy group having 1 to 12 carbon atoms; an arylene group which may have a substituent, the arylene group having 6 to 14 carbon atoms; and a heteroarylene group which may have a substituent, the heteroarylene group having 4 to 12 carbon atoms, and where at least one methylene group in R 5 may be substituted with a divalent heteroatom-containing group. 2. The polymer of claim 1 , wherein the unit A is represented by a following general formula (I), wherein, in the general formula (I), M + is a sulfonium ion or an iodonium ion, X − is a monovalent anion, L is any one selected from the group consisting of: a carbonyloxy group, a phenylenediyl group, a naphthalenediyl group, a phenylenediyloxy group, a naphthalenediyloxy group, a phenylenediylcarbonyloxy group, a naphthalenediylcarbonyloxy group, a phenylenediyloxycarbonyl group and a naphthalenediyloxycarbonyl group, Sp is any one selected from the group consisting of: a direct bond; a linear, branched or cyclic alkylene group which may have a substituent, the alkylene group having 1 to 6 carbon atoms; and a linear, branched or cyclic alkenylene group which may have a substituent, the alkenylene group having 1 to 6 carbon atoms, and where at least one methylene group in the Sp may be substituted with a divalent heteroatom-containing group, and R 1 is any one selected from the group consisting of: a hydrogen atom; a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms; and a linear, branched or cyclic alkenyl group having 1 to 6 carbon atoms, and where at least one hydrogen atom in the alkyl group and the alkenyl group in R 1 may be substituted with a fluorine atom. 3. The polymer of claim 2 , wherein the unit A is represented by a following formula (II), wherein, in the general formula (II), R 1 , L, Sp and X − are the same as those in the general formula (I), R 2a is any one selected from the group consisting of: a linear, branched or cyclic alkylene group which may have a substituent, the alkylene group having 1 to 6 carbon atoms; a linear, branched or cyclic alkenylene group which may have a substituent, the alkenylene group having 1 to 6 carbon atoms; an arylene group which may have a substituent, the arylene group having 6 to 14 carbon atoms; a heteroarylene group which may have a substituent, the heteroarylene group having 4 to 12 carbon atoms; and a direct bond, and where at least one methylene group in R 2a may be substituted with a divalent heteroatom-containing group, and each of R 2b is independently any one selected from the group consisting of: a linear, branched or cyclic alkyl group which may have a substituent, the alkyl group having 1 to 6 carbon atoms; a linear, branched or cyclic alkenyl group which may have a substituent, the alkenyl group having 1 to 6 carbon atoms; an aryl group which may have a substituent, the aryl group having 6 to 14 carbon atoms; and a heteroaryl group which may have a substituent, the heteroaryl group having 4 to 12 carbon atoms, and where at least one methylene group in R 2b may be substituted with a divalent heteroatom-containing group, and two selected from R

Assignees

Inventors

Classifications

  • C08F220/38Primary

    Esters containing sulfur · CPC title

  • and one or more carboxylic moieties in the chain · CPC title

  • and two or more oxygen atoms in the alcohol moiety · CPC title

  • Oxygen · CPC title

  • Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) · CPC title

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What does patent US10781276B2 cover?
An object of the present invention is to provide a polymer used for a resist composition having high absorption efficiency for a particle beam or an electromagnetic wave, and excellence in sensitivity, resolution and pattern performance characteristics, and provide a resist composition containing the polymer and a method of manufacturing a device using thereof. The polymer comprises: a un…
Who is the assignee on this patent?
Toyo Gosei Co Ltd
What technology area does this patent fall under?
Primary CPC classification C08F220/38. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 22 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).