Optical modulator

US10775650B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10775650-B2
Application numberUS-201716327259-A
CountryUS
Kind codeB2
Filing dateAug 25, 2017
Priority dateAug 29, 2016
Publication dateSep 15, 2020
Grant dateSep 15, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An optical modulator includes a p-type first semiconductor layer ( 102 ) formed on a clad layer ( 101 ), an insulating layer ( 103 ) formed on the first semiconductor layer ( 102 ), and an n-type second semiconductor layer ( 104 ) formed on the insulating layer ( 103 ). The first semiconductor layer ( 102 ) is made of silicon or silicon-germanium, and the second semiconductor layer ( 104 ) is formed from a III-V compound semiconductor made of three or more materials.

First claim

Opening claim text (preview).

The invention claimed is: 1. An optical modulator comprising: a p-type first semiconductor layer made of one of silicon and silicon-germanium formed on a clad layer; an n-type second semiconductor layer formed from a III-V compound semiconductor made of at least three materials formed on an insulating layer disposed between said first semiconductor layer and said second semiconductor layer; a first electrode connected to the first semiconductor layer; and a second electrode connected to the second semiconductor layer, wherein part of the first semiconductor layer and part of the second semiconductor layer are arranged so as to overlap each other via the insulating layer in a planar view, and form an optical waveguide portion where light to be modulated is guided in a direction parallel to a plane of the clad layer, and the light waveguide portion satisfies a single mode condition. 2. The optical modulator according to claim 1 , wherein the first electrode is formed on a region of the first semiconductor layer where the optical waveguide portion is not being formed. 3. The optical modulator according to claim 1 , wherein the second semiconductor layer is formed from a plurality of stacked compound semiconductor layers, and among the plurality of compound semiconductor layers, the compound semiconductor layer closer to the insulating layer has a smaller band gap energy. 4. The optical modulator according to claim 1 , wherein the first semiconductor layer is formed from a plurality of stacked semiconductor layers, and among the plurality of semiconductor layers, the semiconductor layer closer to the insulating layer has a smaller bandgap energy. 5. The optical modulator according to claim 2 , wherein the second semiconductor layer is formed from a plurality of stacked compound semiconductor layers, and among the plurality of compound semiconductor layers, the compound semiconductor layer closer to the insulating layer has a smaller band gap energy. 6. The optical modulator according to claim 2 , wherein the first semiconductor layer is formed from a plurality of stacked semiconductor layers, and among the plurality of semiconductor layers, the semiconductor layer closer to the insulating layer has a smaller bandgap energy. 7. The optical modulator according to claim 3 , wherein the first semiconductor layer is formed from a plurality of stacked semiconductor layers, and among the plurality of semiconductor layers, the semiconductor layer closer to the insulating layer has a smaller bandgap energy.

Assignees

Inventors

Classifications

  • using free carrier effects, e.g. plasma effect · CPC title

  • single crystal Si · CPC title

  • G02F1/025Primary

    in an optical waveguide structure (G02F1/017, {G02F1/2257} take precedence) · CPC title

  • the optical waveguides being made of semiconducting material · CPC title

  • In×P and alloy · CPC title

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Frequently asked questions

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What does patent US10775650B2 cover?
An optical modulator includes a p-type first semiconductor layer ( 102 ) formed on a clad layer ( 101 ), an insulating layer ( 103 ) formed on the first semiconductor layer ( 102 ), and an n-type second semiconductor layer ( 104 ) formed on the insulating layer ( 103 ). The first semiconductor layer ( 102 ) is made of silicon or silicon-germanium, and the second semiconductor layer ( 104 ) is f…
Who is the assignee on this patent?
Nippon Telegraph & Telephone
What technology area does this patent fall under?
Primary CPC classification G02F1/025. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Sep 15 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).