Multisurface simultaneous sputtering and shuttering

Patent metadata

Field	Value
Publication number	US-10774417-B2
Application number	US-201715609268-A
Country	US
Kind code	B2
Filing date	May 31, 2017
Priority date	Jun 3, 2016
Publication date	Sep 15, 2020
Grant date	Sep 15, 2020

Abstract

A deposition system comprises a vacuum chamber having a cylindrical inner wall, a cylindrical parts carousel disposed concentrically inside the cylindrical inner wall of the vacuum chamber, and one or more deposition sources arranged to flow deposition material onto the cylindrical parts carousel. A cylindrical shutter assembly is disposed concentrically inside the cylindrical inner wall of the vacuum chamber, and has (1) a shuttered position in which the cylindrical shutter assembly blocks the one or more deposition sources from depositing onto the parts carousel and (2) an unshuttered position in which the cylindrical shutter assembly does not block the one or more deposition sources from depositing onto the parts carousel. A drive train rotates the cylindrical shutter assembly between the shuttered and unshuttered positions. The drive train not operatively connected to rotate the cylindrical parts carousel. The deposition sources may include inner and outer sputter sources.

First claim

The invention claimed is:

1. A deposition system comprising:
a vacuum chamber;
a cylindrical parts carousel sized to load inside the vacuum chamber and having a carousel drive train operatively connected to rotate the cylindrical parts carousel about a cylinder axis;
two or more deposition sources arranged to flow deposition material onto the cylindrical parts carousel when the cylindrical parts carousel is loaded inside the vacuum chamber;
a shutter assembly including at least one cylindrical shutter sub-assembly having shutter elements corresponding to the deposition sources, the shutter assembly disposed or sized to load inside the vacuum chamber with the at least one cylindrical shutter sub-assembly arranged concentrically with the cylindrical parts carousel; and
a drive train configured to rotate the shutter assembly about the cylinder axis independently of rotation of the cylindrical parts carousel about the cylinder axis, the drive train configured to rotate the at least one cylindrical shutter sub-assembly between (1) a shuttered position in which each shutter element is interposed between its corresponding deposition source and the parts carousel and (2) an unshuttered position in which none of the shutter elements is interposed between its corresponding deposition source and the parts carousel.

2. The deposition system of claim 1 wherein each deposition source comprises a sputter deposition source including at least one sputter source arranged for deposition material sputtered from the sputter source to flow onto the cylindrical parts carousel when the cylindrical parts carousel is loaded inside the vacuum chamber.

3. The deposition system of claim 2 wherein:
each sputter deposition source includes:
an outer sputter source arranged at a larger radius than the cylindrical parts carousel such that deposition material sputtered from the outer sputter source flows inward onto the cylindrical parts carousel, and
an inner sputter source arranged at a smaller radius than the cylindrical parts carousel such that deposition material sputtered from the inner sputter source flows outward onto the cylindrical parts carousel; and
the at least one cylindrical shutter sub-assembly having shutter elements includes:
an outer cylindrical shutter sub-assembly arranged at a larger radius than the cylindrical parts carousel such that in the shuttered position each shutter element of the outer cylindrical shutter sub-assembly is interposed between its corresponding outer sputter source and the cylindrical parts carousel, and
an inner cylindrical shutter sub-assembly arranged at a smaller radius than the cylindrical parts carousel such that in the shuttered position each shutter element of the inner cylindrical shutter sub-assembly is interposed between its corresponding inner sputter source and the cylindrical parts carousel.

4. The deposition system of claim 3 wherein the shutter assembly further includes a connecting ring that connects the outer and inner cylindrical shutter sub-assemblies.

5. The deposition system of claim 1 wherein the vacuum chamber has a cylindrical inner wall and the cylindrical parts carousel is sized to load inside the vacuum chamber with the cylindrical parts carousel and the cylindrical inner wall of the vacuum chamber arranged concentrically.

6. The deposition system of claim 1 wherein the drive train is a manual drive train comprising a rotational mechanical vacuum feedthrough via which the at least one cylindrical shutter sub-assembly can be manually rotated with the vacuum chamber evacuated.

7. The deposition system of claim 1 wherein the shutter elements are installed in selected receptacles of the at least one cylindrical shutter sub-assembly.

8. A shuttering system for shuttering sputter deposition sources of a sputter deposition system during pre-burn of the sputter deposition sources, the sputter deposition system having a cylindrical parts carousel that rotates during sputter deposition, the shuttering system comprising:
at least one cylindrical shutter sub-assembly sized to be arranged concentrically inside or outside of the cylindrical parts carousel and having shutter elements arranged to (1) block the sputter deposition sources when the cylindrical shutter sub-assembly is in a shuttered rotational position and (2) not block the sputter deposition sources when the cylindrical shutter sub-assembly is in an unshuttered rotational position; and
a drive train configured to rotate the at least one cylindrical shutter sub-assembly between the shuttered and unshuttered rotational positions;
wherein the drive train is configured to rotate the at least one cylindrical shutter sub-assembly independently from the rotation of the cylindrical parts carousel and the drive train comprises a rotational mechanical vacuum feedthrough via which the at least one cylindrical shutter sub assembly can be manually rotated with the sputter deposition system under vacuum.

9. The shuttering system of claim 8 wherein the at least one cylindrical shutter sub-assembly includes:
an outer cylindrical shutter sub-assembly sized to be arranged concentrically outside of the cylindrical parts carousel;
an inner cylindrical shutter sub-assembly sized to be arranged concentrically inside of the cylindrical parts carousel; and
a connecting yoke that yokes together the outer and inner cylindrical shutter sub-assemblies to rotate together as a unit;
wherein the outer cylindrical shutter sub-assembly has shutter elements arranged to block outer sputter deposition sources when the yoked cylindrical shutter sub-assemblies are in the shuttered rotational position and to not block the outer sputter deposition sources when the yoked cylindrical shutter sub-assemblies are in the unshuttered rotational position; and
wherein the inner cylindrical shutter sub-assembly has shutter elements arranged to block inner sputter deposition sources when the yoked cylindrical shutter sub-assemblies are in the shuttered rotational position and to not block the inner sputter deposition sources when the yoked cylindrical shutter sub-assemblies are in the unshuttered rotational position.

10. The shuttering system of claim 8 wherein the drive train comprises a motor configured to rotate the at least one cylindrical shutter sub-assembly with the sputter deposition system under vacuum.

11. The shuttering system of claim 8 wherein the shutter elements are installed in selected receptacles of the at least one cylindrical shutter sub-assembly.

12. A deposition system comprising:
a vacuum chamber having a cylindrical inner wall;
a cylindrical parts carousel disposed concentrically inside the cylindrical inner wall of the vacuum chamber;
two or more deposition sources arranged to flow deposition material onto the cylindrical parts carousel;
a cylindrical shutter assembly disposed concentrically inside the cylindrical inner wall of the vacuum chamber and having (1) a shuttered position in which the cylindrical shutter assembly blocks all of the two or more deposition sources from depositing onto the parts carousel and (2) an unshuttered position in which the cylindrical shutter assembly does not block any of the two or more deposition sources from depositing onto the parts carousel; and
a drive train configured to rotate the cylindrical shutter assembly between the shuttered and unshuttered positions, the drive train not operatively connected to rotate the cylindrical parts carousel.

13. The deposition system of claim 12 wherein:
each deposition source includes:
an outer sputter deposition source arranged at a larger radius than the cylindrical parts carousel such that

Assignees

• Materion Corp

Inventors

• Aslett Zan
• Newell Michael P
• Ahern Donald W

Classifications

• H01J37/32651

  Shields, e.g. dark space shields, Faraday shields · CPC title

• C23C14/3464

  using more than one target (C23C14/56 takes precedence) · CPC title

• H01J37/32403

  Treating multiple sides of workpieces, e.g. 3D workpieces · CPC title

• C23C14/505

  for rotation of the substrates · CPC title

• C23C14/54 Primary

  Controlling or regulating the coating process · CPC title