Coating material comprising a ternary phase of Hf—B—C

Patent metadata

Field	Value
Publication number	US-10774416-B2
Application number	US-201615768765-A
Country	US
Kind code	B2
Filing date	Oct 14, 2016
Priority date	Oct 16, 2015
Publication date	Sep 15, 2020
Grant date	Sep 15, 2020

Abstract

The present disclosure relates to a coated substrate with a coating deposited on at least a part of the substrate surface, said coating comprising at least one metal boron carbide layer, characterized in that the metal boron carbide layer is a ternary compound exhibiting a polycrystalline structure formed of a single phase of hafnium, boron and carbon. Further a method for deposition of such a coating is provided.

First claim

The invention claimed is:

1. Coated substrate with a coating deposited on a surface of the substrate, said coating comprising at least one metal boron carbide layer, wherein the metal boron carbide layer is a ternary compound exhibiting a polycrystalline structure formed of a single phase of hafnium, boron and carbon.

2. Coated substrate of claim 1 , wherein the ternary compound has a chemical composition in atomic percentage that can be expressed by the formula Hf u B v C w , wherein u+v+w=100, 0<v<35 at.-%, 0<w<35 at.-% and u<60 at.-%.

3. Coated substrate of claim 1 , wherein the single phase exhibits a cubic solid solution structure or an orthorhombic structure.

4. Coated substrate of claim 2 , wherein the single phase exhibits a cubic solid solution structure or an orthorhombic structure.

5. Method for producing a coated substrate of claim 1 , wherein the method comprises following steps:
providing at least one substrate to be coated in a coating chamber,
depositing a layer of a ternary compound on at least a portion of the surface of the substrate, wherein said ternary compound layer is produced by using PVD techniques, wherein at least one target comprising a combination of the binary phases HfB 2 and HfC is used as material source for the layer deposition.

6. Method for producing a coated substrate of claim 2 , wherein the method comprises following steps:
providing at least one substrate to be coated in a coating chamber,
depositing a layer of a ternary compound on at least a portion of the surface of the substrate, wherein said ternary compound layer is produced by using PVD techniques, wherein at least one target comprising a combination of the binary phases HfB 2 and HfC is used as material source for the layer deposition.

7. Method of claim 5 , wherein the at least one target exhibits binary phase regions with particle sizes of less than 1.5 mm.

8. Method of claim 6 , wherein the at least one target exhibits binary phase regions with particle sizes of less than 1.5 mm.

9. Method of claim 5 , wherein the substrate temperature during deposition of the ternary compound layer is not higher than 500° C.

10. Method of claim 6 , wherein the substrate temperature during deposition of the ternary compound layer is not higher than 500° C.

11. Method of claim 7 , wherein a bias voltage is applied at the substrate during deposition of the ternary compound layer, wherein the bias voltage value is between −30 V and −100 V.

12. Method of claim 9 , wherein a bias voltage is applied at the substrate during deposition of the ternary compound layer, wherein the bias voltage value is between −30 V and −100 V.

13. Method of claim 5 , wherein the pressure in the coating chamber during deposition of the ternary compound layer is between 0.3 and 0.4 Pa.

14. Method of claim 7 , wherein the pressure in the coating chamber during deposition of the ternary compound layer is between 0.3 and 0.4 Pa.

15. Method of claim 9 , wherein the pressure in the coating chamber during deposition of the ternary compound layer is between 0.3 and 0.4 Pa.

16. Coated substrate of claim 1 , wherein the substrate is a sliding component.

17. Coated substrate of claim 2 , wherein the substrate is a sliding component.

18. Coated substrate of claim 1 , wherein the substrate is a tool for machining operations or a tool for forming operations.

19. Coated substrate of claim 2 , wherein the substrate is a tool for machining operations or a tool for forming operations.

Assignees

• Oerlikon Surface Solutions Ag
• Oerlikon Surface Solutions Ag Pfaeffikon

Inventors

• Bolvardi Hamid
• Arndt Mirjam
• Rudigier Helmut
• Schneider Jochen
• Pradeep Konda Gokuldoss

Classifications

• C23C14/067

  Borides · CPC title

• C23C14/345

  using substrate bias · CPC title

• C23C14/0635 Primary

  Carbides · CPC title

• C01B32/90

  Carbides · CPC title

• C23C14/3414

  Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy · CPC title