Method for operating a particle beam generator for a particle beam device and particle beam device comprising a particle beam generator

Patent metadata

Field	Value
Publication number	US-10763076-B2
Application number	US-201916405405-A
Country	US
Kind code	B2
Filing date	May 7, 2019
Priority date	May 16, 2018
Publication date	Sep 1, 2020
Grant date	Sep 1, 2020

Abstract

A method for operating a particle beam generator for a particle beam device, and a particle beam device for carrying out this method, are provided. An extractor voltage may be set to an extractor value using a first variable voltage supply unit. An emission current of the particle beam generator may be measured. When the emission current of the particle beam generator decreases, a suppressor voltage applied to a suppressor electrode may be adjusted using a second variable voltage supply unit such that a specific emission current of the particle beam generator is reached or maintained. When the emission current of the particle beam generator increases, the extractor voltage applied to the extractor electrode may be adjusted using the first variable voltage supply unit such that the specific emission current of the particle beam generator is reached or maintained.

First claim

The invention claimed is:

1. A method of operating a particle beam generator for a particle beam device, wherein the particle beam generator includes at least one particle source configured to emit charged particles, at least one suppressor electrode configured to suppress emissions of the charged particles from a side surface of the particle source, at least one extractor electrode configured to extract the charged particles from the particle source, at least one first variable voltage supply unit for applying an extractor voltage to the extractor electrode, and at least one second variable voltage supply unit for applying a suppressor voltage to the suppressor electrode, the method comprising:
setting the extractor voltage to an extractor value using the first variable voltage supply unit;
measuring an emission current of the particle beam generator;
adjusting, when the emission current of the particle beam generator decreases, the suppressor voltage applied to the suppressor electrode using the second variable voltage supply unit such that a specific emission current of the particle beam generator is reached or maintained; and
adjusting, when the emission current of the particle beam generator increases, the extractor voltage applied to the extractor electrode using the first variable voltage supply unit such that the specific emission current of the particle beam generator is reached or maintained.

2. The method according to claim 1 , wherein adjusting the suppressor voltage applied to the suppressor electrode includes decreasing the suppressor voltage applied to the suppressor electrode.

3. The method according to claim 1 , wherein adjusting the extractor voltage applied to the extractor electrode includes increasing the extractor voltage applied to the extractor electrode.

4. The method according to claim 1 , wherein setting the extractor voltage to the extractor value includes setting the extractor voltage from a first value of the extractor voltage to a second value of the extractor voltage, wherein the first value of the extractor voltage is higher than the second value of the extractor voltage.

5. The method according to claim 4 , wherein adjusting the extractor voltage applied to the extractor electrode includes increasing the extractor voltage applied to the extractor electrode from the second value of the extractor voltage to the first value of the extractor voltage until the first value of the extractor voltage is reached.

6. The method according to claim 5 , further comprising:
increasing, when the first value of the extractor voltage is reached, the suppressor voltage applied the suppressor electrode using the second variable voltage supply unit such that the specific emission current of the particle beam generator is reached or maintained.

7. The method according to claim 1 , wherein adjusting the suppressor voltage applied to the suppressor electrode comprises increasing the suppressor voltage applied to the suppressor electrode.

8. The method according to claim 1 , wherein adjusting the extractor voltage applied to the extractor electrode includes decreasing the extractor voltage applied to the extractor electrode.

9. The method according to claim 7 , wherein setting the extractor voltage to the extractor value includes setting the extractor voltage from a first value of the extractor voltage to a second value of the extractor voltage, wherein the first value of the extractor voltage is lower than the second value of the extractor voltage.

10. The method according to claim 9 , wherein adjusting the extractor voltage applied to the extractor electrode includes decreasing the extractor voltage applied to the extractor electrode from the second value of the extractor voltage to the first value of the extractor voltage until the first value of the extractor voltage is reached.

11. The method according to claim 10 , further comprising:
decreasing, when the first value of the extractor voltage is reached, the suppressor voltage applied the suppressor electrode using the second variable voltage supply unit such that the specific emission current of the particle beam generator is reached or maintained.

12. The method according to claim 1 , wherein the method further comprises one of the following steps:
(i) using an ion beam generator as the particle beam generator; and
(ii) using an electron beam generator as the particle beam generator.

13. A computer program product comprising a program code which is loaded into a processor and which, when being executed, controls a particle beam device including a particle beam generator having at least one particle source configured to emit charged particles, at least one suppressor electrode configured to suppress emissions of the charged particles from a side surface of the particle source, at least one extractor electrode configured to extract the charged particles from the particle source, at least one first variable voltage supply unit for applying an extractor voltage to the extractor electrode, and at least one second variable voltage supply unit for applying a suppressor voltage to the suppressor electrode, the executed program code setting the extractor voltage to an extractor value using the first variable voltage supply unit, measuring an emission current of the particle beam generator, adjusting, when the emission current of the particle beam generator decreases, the suppressor voltage applied to the suppressor electrode using the second variable voltage supply unit such that a specific emission current of the particle beam generator is reached or maintained, and adjusting, when the emission current of the particle beam generator increases, the extractor voltage applied to the extractor electrode using the first variable voltage supply unit such that the specific emission current of the particle beam generator is reached or maintained.

14. A particle beam device for imaging, analyzing and/or processing an object, comprising:
at least one particle beam generator for generating a particle beam having charged particles, wherein the particle beam generator includes at least one particle source configured to emit charged particles, at least one suppressor electrode configured to suppress emissions of the charged particles from a side surface of the particle source, at least one extractor electrode configured to extract the charged particles from the particle source, at least one first variable voltage supply unit for applying an extractor voltage to the extractor electrode, and at least one second variable voltage supply unit for applying a suppressor voltage to the suppressor electrode; and
a processor into which a computer program product is loaded that sets the extractor voltage to an extractor value using the first variable voltage supply unit, measures an emission current of the particle beam generator, adjusts, when the emission current of the particle beam generator decreases, the suppressor voltage applied to the suppressor electrode using the second variable voltage supply unit such that a specific emission current of the particle beam generator is reached or maintained, and adjusts, when the emission current of the particle beam generator increases, the extractor voltage applied to the extractor electrode using the first variable voltage supply unit such that the specific emission current of the particle beam generator is reached or maintained.

15. The particle beam device according to claim 14 , further comprising:
at least one objective lens for focusing the particle beam onto the object; and
at least one detector for detecting interaction particles and

Assignees

• Zeiss Carl Microscopy Gmbh

Inventors

• Pavia Giuseppe

Classifications

• H01J37/28 Primary

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

• H01J37/08

  Ion sources; Ion guns · CPC title

• H01J2237/0805

  Liquid metal sources · CPC title

• H01J27/26

  using surface ionisation, e.g. field effect ion sources, thermionic ion sources (H01J27/20, H01J27/24 take precedence) · CPC title

• H01J2237/06316

  Schottky emission · CPC title