Laser exposure head with reduced leakage

Patent metadata

Field	Value
Publication number	US-10761399-B2
Application number	US-201816045864-A
Country	US
Kind code	B2
Filing date	Jul 26, 2018
Priority date	Jul 26, 2018
Publication date	Sep 1, 2020
Grant date	Sep 1, 2020

Abstract

A laser exposure system includes an electrically-controlled diffraction grating which can be controlled to be in a first state where the incident light beam is undiffracted and a second state where the incident light beam is diffracted into a plurality of light beams including a zero-order light beam and first and second diffracted light beams. An aperture structure which passes the first and second diffracted light beams while blocking the zero-order light beam. A polarization rotator rotates a polarization state of the second diffracted light, and a polarization beam combiner combines the first diffracted light beam and the polarization-rotated second diffracted light beam onto a common path forming a combined light beam. An optical element focuses the combined light beam onto an imaging medium. A controller controls the state of the electrically-controlled diffraction grating in accordance with pixel data to form a printed image.

First claim

The invention claimed is:

1. A laser exposure system, comprising:
an electro-optic substrate including an electrically-controlled diffraction grating having a controllable state;
a laser source directing an incident light beam into the electro-optic substrate, wherein when the electrically-controlled diffraction grating is controlled to be in a first state the incident light beam passes through the electro-optic substrate without diffraction providing an undiffracted light beam, and wherein when the electrically-controlled diffraction grating is controlled to be in a second state the incident light beam is diffracted into a plurality of light beams corresponding to different diffraction orders, the plurality of light beams including a zero-order light beam corresponding to a zero diffraction order, and first and second diffracted light beams corresponding to diffraction orders of −n and +n;
an aperture structure including first and second apertures positioned such that the first diffracted light beam passes through the first aperture and the second diffracted light beam passes through the second aperture, wherein the aperture plate blocks the undiffracted light beam when the electrically-controlled diffraction grating is in the first state and blocks the zero-order light beam when the electrically-controlled diffraction grating is in the second state;
a polarization rotator which rotates a polarization state of the second diffracted light beam to provide a polarization-rotated second diffracted light beam;
a polarization beam combiner which combines the first diffracted light beam and the polarization-rotated second diffracted light beam onto a common path forming a combined light beam;
a print lens which focuses the combined light beam onto an imaging medium; and
a controller which controls the state of the electrically-controlled diffraction grating in accordance with pixel data.

2. The laser exposure system of claim 1 , wherein a period of the electrically-controlled diffraction grating is selected such that the plurality of light beams includes only the zero-order light beam corresponding to the zero diffraction order, and first and second diffracted light beams corresponding to diffraction orders of −1 and +1.

3. The laser exposure system of claim 1 , wherein an angle of incidence of the incident light beam onto the electrically-controlled diffraction grating is selected such that the plurality of light beams includes only the zero-order light beam corresponding to the zero diffraction order, and first and second diffracted light beams corresponding to diffraction orders of −1 and +1.

4. The laser exposure system of claim 2 , wherein a width of the first and second apertures is substantially equal to half of a separation between the first and second diffracted light beams in a plane of the aperture structure.

5. The laser exposure system of claim 1 , wherein the electro-optic substrate includes a plurality of electrically-controlled diffraction grating which are independently controllable in accordance with pixel data for different image pixels.

6. The laser exposure system of claim 5 , wherein the first diffracted light beams from each of the electrically-controlled diffraction gratings all pass through the first aperture, the second diffracted light beams from each of the electrically-controlled diffraction gratings all pass through the second aperture, and the zero-order light beams from each of the electrically-controlled diffraction gratings are all blocked by aperture structure.

7. The laser exposure system of claim 1 , wherein the polarization rotator is a half-wave plate.

8. The laser exposure system of claim 1 , wherein the polarization beam combiner is a cube beamsplitter constructed using two right angle prisms.

9. The laser exposure system of claim 1 , wherein optical path lengths between the electrically-controlled diffraction grating and the polarization beam combiner for the first and second light beams differ by no more than 2d 2 /λ where d is a grating period of the diffraction grating and λ is a wavelength of the light beam from the laser source.

Assignees

• Eastman Kodak Co

Inventors

• Karassiouk Valentine A
• Pilossof Nissim

Classifications

• G02B5/005

  Diaphragms (for cameras G03B9/02) · CPC title

• G02F1/315 Primary

  based on the use of controlled internal reflection · CPC title

• B41J2/442

  using lasers · CPC title

• G02B27/283

  used for beam splitting or combining · CPC title

• G02F2201/305

  diffraction grating · CPC title