Powder for additive modeling, structure, semiconductor production device component, and semiconductor production device

US10759712B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10759712-B2
Application numberUS-201816178884-A
CountryUS
Kind codeB2
Filing dateNov 2, 2018
Priority dateNov 9, 2017
Publication dateSep 1, 2020
Grant dateSep 1, 2020

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  1. Title

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Abstract

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A material powder for additive modeling including a nitride, and a eutectic oxide, the nitride having an average density lower than an average density of the eutectic oxide, is used to produce a structure using an additive modeling method.

First claim

Opening claim text (preview).

What is claimed is: 1. A material powder for additive modeling, comprising: a eutectic oxide; and a nitride having an average density lower than an average density of the eutectic oxide, wherein a weight ratio of eutectic oxide:nitride is from 10:1 to 3:10, and wherein the eutectic oxide contains aluminum oxide, and a compound of a rare earth oxide and aluminum oxide. 2. The material powder for additive modeling according to claim 1 , wherein the nitride is at least one selected from the group consisting of aluminum nitride, silicon nitride, and boron nitride. 3. The material powder for additive modeling according to claim 1 , wherein the eutectic oxide has a melting point of less than or equal to a decomposition temperature of the nitride. 4. The material powder for additive modeling according to claim 1 , further comprising terbium oxide containing tetravalent terbium. 5. The material powder for additive modeling according to claim 1 , wherein the nitride alone constitutes a particle. 6. The material powder for additive modeling according to claim 1 , wherein the eutectic oxide is included as a particle of the eutectic oxide. 7. The material powder for additive modeling according to claim 4 , wherein the terbium oxide containing tetravalent terbium is included as a particle of the terbium oxide containing tetravalent terbium. 8. A method of producing a structure, the method comprising: preparing a powder containing a nitride particle and a particle containing a eutectic oxide containing aluminum oxide, and a compound of a rare earth oxide and aluminum oxide; constituting a powder layer including the powder; and irradiating the powder layer with an energy beam according to shape data of a three-dimensional model, the powder layer being irradiated with the energy beam so that a temperature of an irradiation portion of the energy beam is less than or equal to a decomposition temperature of the nitride particle, wherein the nitride particle has an average density lower than an average density of the eutectic oxide particle and the weight ratio of the eutectic oxide particle:nitride particle is from 10:1 to 3:10. 9. The material powder for additive modeling according to claim 1 , wherein the compound of the rare earth oxide and aluminum oxide is included with a composition range of ±10% from a eutectic point. 10. The material powder for additive modeling according to claim 1 , wherein the eutectic oxide is an Al 2 O 3 —Gd 2 O 3 eutectic system and the nitride contains aluminum nitride. 11. The material powder for additive modeling according to claim 10 , further comprising terbium oxide containing tetravalent terbium.

Assignees

Inventors

Classifications

  • B28B1/001Primary

    Rapid manufacturing of 3D objects by additive depositing, agglomerating or laminating of material (selective deposition modelling of metallic powder B22F10/00; rapid manufacturing of 3D objects in general and in particular of plastics B29C64/00) · CPC title

  • Direct deposition of metal particles, e.g. direct metal deposition [DMD] or laser engineered net shaping [LENS] · CPC title

  • Nozzles · CPC title

  • characterised by the type, e.g. laser or electron beam · CPC title

  • Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM] · CPC title

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What does patent US10759712B2 cover?
A material powder for additive modeling including a nitride, and a eutectic oxide, the nitride having an average density lower than an average density of the eutectic oxide, is used to produce a structure using an additive modeling method.
Who is the assignee on this patent?
Canon Kk
What technology area does this patent fall under?
Primary CPC classification B28B1/001. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Sep 01 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).