Wiping member, wiping method, and wiping device

US10759173B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10759173-B2
Application numberUS-201916423261-A
CountryUS
Kind codeB2
Filing dateMay 28, 2019
Priority dateMay 30, 2018
Publication dateSep 1, 2020
Grant dateSep 1, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A wiping member that wipes a nozzle surface of a liquid discharging head, includes a first region having an average porosity P1, a second region disposed on the first region, having an average porosity P2 greater than P1, and a third region disposed on the second region having an average porosity P3 greater than P2, wherein the wiping member has a thickness t in the direction perpendicular to the surface that contacts the nozzle surface and each of the first region, the second region, and the third region has a thickness of t/3 in the direction, wherein P2/P1 is from 1.1 to 1.4.

First claim

Opening claim text (preview).

What is claimed is: 1. A wiping member that wipes a nozzle surface of a liquid discharging head, having: a first region having an average porosity P1, a second region disposed on the first region, having an average porosity P2 greater than P1; and a third region disposed on the second region having an average porosity P3 greater than P2, wherein the wiping member has a thickness t in a direction perpendicular to a surface that contacts the nozzle surface and each of the first region, the second region, and the third region has a thickness of t/3 in the direction, wherein P2/P1 is from 1.1 to 1.4, wherein the first region forms the surface. 2. The wiping member according to claim 1 , wherein the first region extends from the surface to t/3, the second region extends from t/3 to 2t/3, and the third region extends from 2t/3 to t. 3. The wiping member according to claim 1 , wherein P1 is from 0.60 to 0.80. 4. The wiping member according to claim 1 , wherein the surface of the wiping member comprises non-woven fabric. 5. The wiping member according to claim 1 , wherein P1/P2 is from 1.2 to 1.3. 6. The wiping member according to claim 1 , wherein the wiping member is a single layer. 7. A wiping method comprising: wiping a nozzle surface of a liquid discharging head using a wiping member, wherein the wiping member includes: a first region having an average porosity P1; a second region disposed on the first region, having an average porosity P2 greater than P1; and a third region disposed on the second region, having an average porosity P3 greater than P2, wherein the wiping member has a thickness t in a direction perpendicular to a surface that contacts the nozzle surface and each of the first region, the second region, and the third region has a thickness of t/3 in the direction, wherein P2/P1 is from 1.1 to 1.4. 8. The wiping method according to claim 7 , wherein the first region extends from the surface to t/3, the second region extends from t/3 to 2t/3, and the third region extends from 2t/3 to t. 9. The wiping method according to claim 7 , further comprising applying a cleaning liquid to the wiping member. 10. The wiping method according to claim 7 , wherein the cleaning liquid has a surface tension of 35 mN/m or less. 11. A wiping device comprising: a wiping member configured to wipe a nozzle surface of a liquid discharging head, wherein the wiping member includes a first region having an average porosity P1; a second region disposed on the first region, having an average porosity P2 greater than P1; and a third region disposed on the second region having an average porosity P3 greater than P2, wherein the wiping member has a thickness t in a direction perpendicular to a surface that contacts the nozzle surface and each of the first region, the second region, and the third region has a thickness of t/3 in the direction, wherein P2/P1 is from 1.1 to 1.4. 12. The wiping device according to claim 11 , wherein the first region extends from the surface to t/3, the second region extends from t/3 to 2t/3, and the third region extends from 2t/3 to t. 13. The wiping device according to claim 11 , further comprising a cleaning liquid application device configured to apply a cleaning liquid to the wiping member. 14. The wiping device according to claim 11 , wherein the cleaning liquid has a surface tension of 35 mN/m or less.

Assignees

Inventors

Classifications

  • Using cleaning liquid for wet wiping · CPC title

  • with wiping surface parallel with nozzle plate and mounted on reels, e.g. cleaning ribbon cassettes · CPC title

  • using wiping constructions (B41J2/16552 takes precedence) · CPC title

  • using cleaning fluids · CPC title

  • Cleaning of print head nozzles (B41J2/16505, B41J2/1707 take precedence) · CPC title

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What does patent US10759173B2 cover?
A wiping member that wipes a nozzle surface of a liquid discharging head, includes a first region having an average porosity P1, a second region disposed on the first region, having an average porosity P2 greater than P1, and a third region disposed on the second region having an average porosity P3 greater than P2, wherein the wiping member has a thickness t in the direction perpendicular to t…
Who is the assignee on this patent?
Ohkura Hiroko, Sakon Yohta, Izutani Akira, and 2 more
What technology area does this patent fall under?
Primary CPC classification B41J2/16535. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Sep 01 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).