Devices for trapping and controlling microparticles with radiation

US10758904B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10758904-B2
Application numberUS-201715625400-A
CountryUS
Kind codeB2
Filing dateJun 16, 2017
Priority dateFeb 5, 2015
Publication dateSep 1, 2020
Grant dateSep 1, 2020

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A particle manipulation device includes a substrate and a microchannel included in the substrate and configured to receive a fluid including particles therein. A biasing structure is formed on the substrate adjacent to, but outside the microchannel. The biasing structure is configured to dispense radiation at a frequency to bias movement of the particles within the microchannel from outside the microchannel.

First claim

Opening claim text (preview).

What is claimed is: 1. A particle manipulation device, comprising: a chip including: an electromagnetic radiation generator formed on a substrate of the chip and configured as at least one biasing structure, the at least one biasing structure configured to generate a radio frequency selected to bias movement of the particles within a fluid; and a control module including: a generation circuit configured to generate a signal for exciting the at least one biasing structure in response to a feedback loop. 2. The device as recited in claim 1 , further comprising a microchannel including one or more of: a plurality of paths configured to separate particles biased by the biasing structures; at least one chamber for trapping particles biased by the biasing structures; or at least one chamber for detecting particles. 3. The device as recited in claim 1 , wherein the control module and the chip are integrated on the substrate. 4. The device as recited in claim 1 , wherein the control module and the chip are integrated together on a monolithic substrate. 5. The device as recited in claim 1 , wherein the chip includes electrical contacts and the control module connects to the electrical contacts as an external device. 6. The device as recited in claim 2 , wherein the chip includes a detection structure integrated on the substrate and control module includes a detector interface for providing feedback to adjust the at least one biasing structure. 7. The device as recited in claim 6 , wherein the detection structure includes at least one of an antenna or an image sensor configured to detect characteristics of particles in the microchannel. 8. The device as recited in claim 1 , wherein the at least one biasing structure is configured to generate non-ionizing radiation to apply dielectrophoresis forces to the particles. 9. A method for particle manipulation, comprising: biasing the particles traveling in a fluid using an electromagnetic radiation generator formed on a substrate and configured as at least one biasing structure, the at least one biasing structure being configured to generate a radio frequency selected to bias movement of the particles within the fluid; and adjusting the biasing in response to feedback. 10. The method as recited in claim 9 , further comprising introducing particles into a microchannel including one or more paths and chamber configured to trap, separate or redirect the particles responsive to the biasing by the biasing structures. 11. The method as recited in claim 9 , further comprising detecting particles using a sensor configured to detect characteristics of the particles. 12. The method as recited in claim 9 , wherein the substrate includes a microchannel formed thereon, wherein the microchannel is separable from the substrate, and the method further comprising disposing of the microchannel after use. 13. The method as recited in claim 9 , wherein the at least one biasing structure includes at least one antenna, the method further comprising generating radiation to apply dielectrophoresis forces to the particles. 14. The method as recited in claim 9 , wherein the at least one biasing structure generates non-ionizing radiation to apply dielectrophoresis forces to the particles.

Assignees

Inventors

Classifications

  • characterised by the means or forces applied to move the fluids · CPC title

  • specially adapted for handling suspended solids or molecules independently from the bulk fluid flow, e.g. for trapping or sorting beads or physically stretching molecules · CPC title

  • Separators · CPC title

  • Flow chambers · CPC title

  • Microapparatus (sample containers with integrated microfluidic structures B01L3/5027) · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10758904B2 cover?
A particle manipulation device includes a substrate and a microchannel included in the substrate and configured to receive a fluid including particles therein. A biasing structure is formed on the substrate adjacent to, but outside the microchannel. The biasing structure is configured to dispense radiation at a frequency to bias movement of the particles within the microchannel from outside the…
Who is the assignee on this patent?
IBM
What technology area does this patent fall under?
Primary CPC classification B01L3/502761. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Sep 01 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).