Process for producing an insulator layer, process for producing an organic optoelectronic component comprising an insulator layer and organic optoelectronic component comprising an insulator layer

US10756294B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10756294-B2
Application numberUS-201515311182-A
CountryUS
Kind codeB2
Filing dateApr 15, 2015
Priority dateMay 15, 2014
Publication dateAug 25, 2020
Grant dateAug 25, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method is specified for production of an insulator layer. This method comprises the following process steps: A) providing a precursor comprising a mixture of a first, a second and a third component where—the first component comprises a compound of the general where R1 and R2 are each independently selected from a group comprising hydrogen and alkyl radicals and n=1 to 10 000; the second component comprises a compound of the general where R3 is an alkyl radical, and the third component comprises at least one amine compound; B) applying the precursor to a substrate; C) curing the precursor to form the insulator layer. The first compound comprises an epoxy group and a hydroxyl group. The second compound comprises an ester group. The curing takes place at room temperature or at temperatures between 50° C. and 260° C.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for producing an insulator layer, comprising the method steps: A) providing a precursor by mixing a first, a second and a third component, wherein the first component comprises a compound of the general formula IA and four compounds of the following formula IB-1, IB-2, IB-3 and IB-4 wherein R 1 and R 2 are each independently selected from a group consisting of hydrogen and alkyl radicals and n=1 to 10,000; the second component comprises a compound of the general formula IIA wherein R 3 is an alkyl radical, and the third component comprises at least one amine compound B) applying the precursor to a substrate; C) curing the precursor for the formation of the insulator layer. 2. The method according to claim 1 , wherein the precursor consists of the first, the second and the third component and the first component is present at a concentration of 70 to 80 weight percent with respect to the total weight of the precursor. 3. The method according to claim 1 , wherein the first component contains 45 to 65 weight percent of the compound of formula IA with respect to the total weight of the first component. 4. The method according to claim 1 , wherein the compound of the general formula IIA of the second component has the following formula IIA-1: 5. The method according to claim 1 , wherein the amine compound is selected from a group consisting of the compound of formula III-1, the compound of formula III-2 and combinations thereof: 6. A method for producing an insulator layer, comprising the method steps: A) providing a precursor by mixing a first, a second and a third component, wherein the precursor consists of the first, the second and the third component and the first component is present at a concentration of 70 to 80 weight percent, the second component is present at a concentration of 5 to 15 weight percent and the third component is present at a concentration of 10 to 20 weight percent with respect to the total weight of the precursor, the first component comprises a compound of the general formula IA and four compounds of the following formulas IB-1, IB-2, IB-3 and IB-4 wherein R 1 and R 2 are each independently selected from a group consisting hydrogen and alkyl radicals and n=1 to 10,000; the second component comprises a compound of the general formula IIA wherein R 3 is an alkyl radical, and the third component comprises at least one amine compound B) applying the precursor to a substrate; C) curing the precursor for formation of the insulator layer. 7. The method according to claim 6 , wherein the first component contains 45 to 65 weight percent of the compound of formula IA with respect to the total weight of the first component. 8. The method according to claim 6 , wherein the compound of the general formula IIA of the second component has the following formula IIA-1: 9. The method according to claim 6 , wherein the amine compound is selected from a group consisting of the compound of formula III-1, the compound of formula III-2 and combinations thereof:

Assignees

Inventors

Classifications

  • combined with auxiliary electrodes, e.g. ITO layer combined with metal lines · CPC title

  • Passivation; Containers; Encapsulations · CPC title

  • C08K5/101Primary

    of monocarboxylic acids · CPC title

  • H01B3/40Primary

    epoxy resins · CPC title

  • Amines · CPC title

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What does patent US10756294B2 cover?
A method is specified for production of an insulator layer. This method comprises the following process steps: A) providing a precursor comprising a mixture of a first, a second and a third component where—the first component comprises a compound of the general where R1 and R2 are each independen…
Who is the assignee on this patent?
Osram Oled Gmbh
What technology area does this patent fall under?
Primary CPC classification C08K5/101. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 25 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).