Fingerprint recognition apparatus and manufacturing method therefor, mobile terminal, and fingerprint lock

US10755075B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10755075-B2
Application numberUS-201816106604-A
CountryUS
Kind codeB2
Filing dateAug 21, 2018
Priority dateDec 12, 2017
Publication dateAug 25, 2020
Grant dateAug 25, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present disclosure relates to the field of fingerprint recognition technologies, and provides a fingerprint recognition apparatus and a manufacturing method therefor, a mobile terminal, and a fingerprint lock. The apparatus includes: a substrate defining a protrusion on a surface of the substrate; a fingerprint chip, including: a signal processing circuit connected to the protrusion by passing through a TSV structure, a plurality of sensing electrodes connected to the signal processing circuit, and a protection layer covering the plurality of sensing electrodes; and a touch cover plate located on the protection layer.

First claim

Opening claim text (preview).

What is claimed is: 1. A fingerprint recognition apparatus, comprising: a substrate defining a protrusion on a surface of the substrate; a fingerprint chip, comprising: a signal processing circuit connected to the protrusion through a through substrate via (TSV) structure; a plurality of sensing electrodes connected to the signal processing circuit; and a protection layer covering the plurality of sensing electrodes; and a touch cover plate located on the protection layer. 2. The apparatus according to claim 1 , wherein: the protection layer has a first opening extending to each sensing electrode of the plurality of sensing electrodes; and the apparatus further comprises: a conductive material filling the first opening, wherein the touch cover plate is located on the conductive material filling. 3. The apparatus according to claim 1 , further comprising: a buffer layer located on the protection layer, wherein there is a second opening extending from a surface of the buffer layer to each sensing electrode of the plurality of sensing electrodes; and a conductive material filling the second opening, wherein the touch cover plate is located on the conductive material filling. 4. The apparatus according to claim 3 , wherein the conductive material filling comprises a soft conductive material. 5. The apparatus according to claim 4 , wherein the soft conductive material comprises graphite or a conductive silver paste. 6. The apparatus according to claim 3 , wherein the buffer layer comprises an organic polymer. 7. A mobile terminal, comprising: the fingerprint recognition apparatus according to claim 1 . 8. A fingerprint lock, comprising: the fingerprint recognition apparatus according to claim 1 . 9. A method for manufacturing a fingerprint recognition apparatus, comprising: forming a protrusion on a surface of a substrate; forming a fingerprint chip, wherein the fingerprint chip comprises: a signal processing circuit connected to the protrusion through a through substrate via (TSV) structure; a plurality of sensing electrodes connected to the signal processing circuit; and a protection layer covering the plurality of sensing electrodes; and forming a touch cover plate on the protection layer. 10. The method according to claim 9 , wherein the protection layer has a first opening extending to each sensing electrode of the plurality of sensing electrodes; and wherein the method further comprises: before forming a touch cover plate on the protection layer, forming a conductive material filling the first opening, wherein the touch cover plate is formed on the conductive material filling. 11. The method according to claim 9 , wherein the protection layer has a first opening extending to each sensing electrode; and wherein forming a touch cover plate on the protection layer comprises: forming a buffer layer filling the first opening on the protection layer; forming a second opening extending from a surface of the buffer layer to each sensing electrode of the plurality of sensing electrodes; forming a conductive material filling the first opening; and forming the touch cover plate on the conductive material filling. 12. The method according to claim 11 , wherein the second opening is in alignment with the first opening. 13. The method according to claim 9 , wherein forming a touch cover plate on the protection layer comprises: forming a buffer layer on the protection layer; forming an opening extending from a surface of the buffer layer to each sensing electrode of the plurality of sensing electrodes; forming a conductive material filling the opening; and forming the touch cover plate on the conductive material filling. 14. The method according to claim 11 , wherein the conductive material comprises a soft conductive material. 15. The method according to claim 14 , wherein the soft conductive material comprises graphite or a conductive silver paste. 16. The method according to claim 11 , wherein the buffer layer comprises an organic polymer.

Assignees

Inventors

Classifications

  • G06F3/044Primary

    by capacitive means · CPC title

  • Protecting the fingerprint sensor against damage caused by the finger · CPC title

  • non-optical, e.g. ultrasonic or capacitive sensing · CPC title

  • Matching; Classification · CPC title

  • using biometric data, e.g. fingerprints, iris scans or voiceprints · CPC title

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What does patent US10755075B2 cover?
The present disclosure relates to the field of fingerprint recognition technologies, and provides a fingerprint recognition apparatus and a manufacturing method therefor, a mobile terminal, and a fingerprint lock. The apparatus includes: a substrate defining a protrusion on a surface of the substrate; a fingerprint chip, including: a signal processing circuit connected to the protrusion by pass…
Who is the assignee on this patent?
Semiconductor Mfg International (Beijing) Corporation, Semiconductor Mfg International (Shanghai) Corporation, Semiconductor Mfg (Beijing) International Corporation, and 1 more
What technology area does this patent fall under?
Primary CPC classification G06F3/044. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Aug 25 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).