Resin solution composition

US10752791B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10752791-B2
Application numberUS-201615767163-A
CountryUS
Kind codeB2
Filing dateOct 7, 2016
Priority dateOct 16, 2015
Publication dateAug 25, 2020
Grant dateAug 25, 2020

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  5. First independent claim

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Abstract

Official abstract text for this publication.

The present invention relates to a resin solution composition containing at least one resin selected from the group consisting of aromatic polysulfones, aromatic polyamideimides, aromatic polyetherimides, aromatic polyimides and aromatic polyamic acids, a sulfone-based solvent, and an ester-based solvent, wherein in this resin solution composition, an amount of the resin, relative to the total mass of the resin solution composition, is at least 10% by mass but not more than 50% by mass, and an amount of the ester-based solvent, relative to the total amount of the sulfone-based solvent and the ester-based solvent, is at least 15% by mass but not more than 85% by mass.

First claim

Opening claim text (preview).

The invention claimed is: 1. A resin solution composition comprising an aromatic polysulfone resin, a sulfone-based solvent, and an ester-based solvent, wherein the resin solution composition is in a state in which uniform transparency is maintained and no gelling occurs after storage for at least one week at a temperature of 5 to 35° C., and in the resin solution composition, an amount of the resin, relative to a total mass of the resin solution composition, is at least 10% by mass but not more than 50% by mass, and an amount of the ester-based solvent, relative to a total amount of the sulfone-based solvent and the ester-based solvent, is at least 15% by mass but not more than 85% by mass. 2. The resin solution composition according to claim 1 , wherein the ester-based solvent is γ-butyrolactone or γ-valerolactone. 3. The resin solution composition according to claim 1 , wherein the ester-based solvent is γ-butyrolactone. 4. The resin solution composition according to claim 1 , wherein the sulfone-based solvent is sulfolane. 5. The resin solution composition according to claim 1 , wherein the aromatic polysulfone has a repeating unit represented by formula (1) shown below: -Ph 1 -SO 2 -Ph 2 -O—  (1) wherein each of Ph 1 and Ph 2 independently represents a phenylene group; and one hydrogen atom on the phenylene group may be substituted with an alkyl group of 1 to 10 carbon atoms, an aryl group of 6 to 20 carbon atoms or a halogen atom, and when two or more hydrogen atoms on the phenylene group are substituted, each hydrogen atom may be independently substituted with an alkyl group of 1 to 10 carbon atoms, an aryl group of 6 to 20 carbon atoms or a halogen atom. 6. A resin solution composition comprising an aromatic polysulfone resin, a sulfone-based solvent, and a ketone-based solvent, wherein the resin solution composition is in a state in which uniform transparency is maintained and no gelling occurs after storage for at least one week at a temperature of 5 to 35° C., and in the resin solution composition, an amount of the resin, relative to a total mass of the resin solution composition, is at least 10% by mass but not more than 50% by mass, and an amount of the ketone-based solvent, relative to a total amount of the sulfone-based solvent and the ketone-based solvent, is at least 20% by mass but not more than 42% by mass. 7. The resin solution composition according to claim 6 , wherein the ketone-based solvent is acetone or methyl ethyl ketone. 8. The resin solution composition according to claim 6 , wherein the ketone-based solvent is acetone. 9. The resin solution composition according to claim 6 , wherein the sulfone-based solvent is sulfolane. 10. The resin solution composition according to claim 6 , wherein the aromatic polysulfone has a repeating unit represented by formula (1) shown below: -Ph 1 -SO 2 -Ph 2 -O—  (1) wherein each of Ph 1 and Ph 2 independently represents a phenylene group; and one hydrogen atom on the phenylene group may be substituted with an alkyl group of 1 to 10 carbon atoms, an aryl group of 6 to 20 carbon atoms or a halogen atom, and when two or more hydrogen atoms on the phenylene group are substituted, each hydrogen atom may be independently substituted with an alkyl group of 1 to 10 carbon atoms, an aryl group of 6 to 20 carbon atoms or a halogen atom. 11. A resin solution composition comprising an aromatic polysulfone resin, a sulfone-based solvent, an ester-based solvent, and a ketone-based solvent, wherein the resin solution composition is in a state in which uniform transparency is maintained and no gelling occurs after storage for at least one week at a temperature of 5 to 35° C., and in the resin solution composition, an amount of the resin, relative to a total mass of the resin solution composition, is at least 10% by mass but not more than 50% by mass, an amount of the ester-based solvent, relative to a total amount of the sulfone-based solvent, the ester-based solvent and the ketone-based solvent, is at least 15% by mass but not more than 85% by mass, and an amount of the ketone-based solvent, relative to a total amount of the sulfone-based solvent, the ester-based solvent and the ketone-based solvent, is not more than 42% by mass. 12. The resin solution composition according to claim 11 , wherein the ester-based solvent is γ-butyrolactone or γ-valerolactone. 13. The resin solution composition according to claim 11 , wherein, the ester-based solvent is γ-butyrolactone. 14. The resin solution composition according to claim 11 , wherein the ketone-based solvent is acetone or methyl ethyl ketone. 15. The resin solution composition according to claim 11 , wherein the ketone-based solvent is acetone. 16. The resin solution composition according to claim 11 , wherein the sulfone-based solvent is sulfolane. 17. The resin solution composition according to claim 11 , wherein the aromatic polysulfone has a repeating unit represented by formula (1) shown below: -Ph 1 -SO 2 -Ph 2 -O—  (1) wherein each of Ph 1 and Ph 2 independently represents a phenylene group; and one hydrogen atom on the phenylene group may be substituted with an alkyl group of 1 to 10 carbon atoms, an aryl group of 6 to 20 carbon atoms or a halogen atom, and when two or more hydrogen atoms on the phenylene group are substituted, each hydrogen atom may be independently substituted with an alkyl group of 1 to 10 carbon atoms, an aryl group of 6 to 20 carbon atoms or a halogen atom.

Assignees

Inventors

Classifications

  • C08L81/06Primary

    Polysulfones; Polyethersulfones · CPC title

  • Compositions of unspecified macromolecular compounds · CPC title

  • Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors · CPC title

  • Polysulfones; Polyethersulfones · CPC title

  • C08J3/095Primary

    Oxygen containing compounds · CPC title

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What does patent US10752791B2 cover?
The present invention relates to a resin solution composition containing at least one resin selected from the group consisting of aromatic polysulfones, aromatic polyamideimides, aromatic polyetherimides, aromatic polyimides and aromatic polyamic acids, a sulfone-based solvent, and an ester-based solvent, wherein in this resin solution composition, an amount of the resin, relative to the total …
Who is the assignee on this patent?
Sumitomo Chemical Co
What technology area does this patent fall under?
Primary CPC classification C08L81/06. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 25 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).