Copper-containing articles

US10745570B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10745570-B2
Application numberUS-201815880830-A
CountryUS
Kind codeB2
Filing dateJan 26, 2018
Priority dateMay 18, 2015
Publication dateAug 18, 2020
Grant dateAug 18, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A water-soluble composition includes reducible copper ions or copper nanoparticles complexed with a reactive polymer. The reactive polymer can be crosslinked using suitable irradiation to provide copper-containing water-insoluble complexes. The water-soluble composition can be used to provide various articles and electrically-conductive materials that can be assembled in electronic devices. The reactive polymer has greater than 1 mol % of recurring units comprising sulfonic acid or sulfonate groups, at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition, and optionally at least 1 mol % of recurring units comprising a pendant amide, amine, hydroxyl, lactam, phosphonic acid, or carboxylic acid group.

First claim

Opening claim text (preview).

The invention claimed is: 1. A copper-containing article comprising a substrate and having disposed thereon a copper-containing composition comprising a water-soluble complex of a reactive polymer with reducible copper ions or copper nanoparticles, the reactive polymer comprising: (a) greater than 1 mol % of recurring units comprising sulfonic acid or sulfonate groups, (b) at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition, and optionally (c) at least 1 mol % of recurring units comprising a pendant amide, amine, hydroxyl, lactam, phosphonic acid, or carboxylic acid group, all amounts based on the total recurring units in the reactive polymer. 2. The copper-containing article of claim 1 , wherein the reactive polymer comprises: (i-a) at least 5 mol % and up to and including 50 mol % of the recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition, based on the total recurring units in the reactive polymer, (i-b) at least 1 mol % and up to and including 93 mol % of recurring units comprising a pendant hydroxyl, amide, or carboxylic acid group, based on the total recurring units in the reactive polymer, or both (i-a) and (i-b). 3. The copper-containing article of claim 1 , wherein the recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition comprise: a photosensitive —C(═O)—CR═CR 1 —Y group wherein R and R 1 are independently hydrogen or an alkyl group having 1 to 7 carbon atoms, a 5- to 6-membered cycloalkyl group, an alkoxy group having 1 to 7 carbon atoms, a phenyl group, or a phenoxy group, and Y is an aryl or heteroaryl group; (ii) a photosensitive, non-aromatic unsaturated carbocyclic group; (iii) a photosensitive, aromatic or non-aromatic heterocyclic group comprising a carbon-carbon double bond that is conjugated with an electron withdrawing group; (iv) a photosensitive non-aromatic unsaturated heterocyclic group comprising one or more amide groups that are conjugated with a carbon-carbon double bond, which photosensitive non-aromatic unsaturated heterocyclic group is linked to the water-soluble backbone at an amide nitrogen atom; or (v) a photosensitive substituted or unsubstituted 1,2-diarylethylene group. 4. The copper-containing article of claim 1 , wherein the substrate has a first supporting side and an opposing second supporting side, and the copper-containing composition is disposed on one or both the first supporting side and the opposing second supporting of the substrate. 5. The copper-containing article of claim 1 , wherein the copper-containing composition is disposed on the substrate in a patternwise fashion. 6. A copper-containing article comprising a substrate and having disposed thereon a water-insoluble composition comprising a crosslinked water-insoluble complex of a crosslinked reacted polymer with reducible copper ions or copper nanoparticles, the crosslinked reacted polymer derived from photoexposure of a reactive polymer comprising: (a) greater than 1 mol % of recurring units comprising sulfonic acid or sulfonate groups, (b) at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition, and optionally (c) at least 1 mol % of recurring units comprising a pendant amide, amine, hydroxyl, lactam, phosphonic acid, or carboxylic acid group, all amounts based on the total recurring units in the reactive polymer. 7. The copper-containing article of claim 6 , wherein the water-insoluble composition comprises copper nanoparticles that have an average diameter of at least 2 nm and up to and including 500 nm. 8. The copper-containing article of claim 6 , wherein the same or different crosslinked water-insoluble complex is disposed on both the first supporting side and the opposing second supporting side of the substrate in the same or different patternwise fashion. 9. The copper-containing article of claim 6 , wherein the substrate is a continuous polymeric web. 10. The copper-containing article of claim 6 , wherein the reactive polymer comprises: (i-a) at least 5 mol % and up to and including 50 mol % of the recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition, based on the total recurring units in the reactive polymer, (i-b) at least 1 mol % and up to and including 93 mol % of recurring units comprising a pendant hydroxyl, amide, or carboxylic acid group, based on the total recurring units in the reactive polymer, or both (i-a) and (i-b). 11. The copper-containing article of claim 6 , wherein the recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition comprise: a photosensitive —C(═O)—CR═CR 1 —Y group wherein R and R 1 are independently hydrogen or an alkyl group having 1 to 7 carbon atoms, a 5- to 6-membered cycloalkyl group, an alkoxy group having 1 to 7 carbon atoms, a phenyl group, or a phenoxy group, and Y is an aryl or heteroaryl group; (ii) a photosensitive, non-aromatic unsaturated carbocyclic group; (iii) a photosensitive, aromatic or non-aromatic heterocyclic group comprising a carbon-carbon double bond that is conjugated with an electron withdrawing group; (iv) a photosensitive non-aromatic unsaturated heterocyclic group comprising one or more amide groups that are conjugated with a carbon-carbon double bond, which photosensitive non-aromatic unsaturated heterocyclic group is linked to the water-soluble backbone at an amide nitrogen atom; or (v) a photosensitive substituted or unsubstituted 1,2-diarylethylene group.

Assignees

Inventors

Classifications

  • Metallic powder characterised by the size or surface area of the particles · CPC title

  • C09D5/1618Primary

    inorganic · CPC title

  • C08F2/60Primary

    Polymerisation by the diene synthesis · CPC title

  • and containing other heteroatoms, e.g. 2-acrylamido-2-methylpropane sulfonic acid [AMPS] · CPC title

  • Sulfur · CPC title

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What does patent US10745570B2 cover?
A water-soluble composition includes reducible copper ions or copper nanoparticles complexed with a reactive polymer. The reactive polymer can be crosslinked using suitable irradiation to provide copper-containing water-insoluble complexes. The water-soluble composition can be used to provide various articles and electrically-conductive materials that can be assembled in electronic devices. The…
Who is the assignee on this patent?
Eastman Kodak Co, Eastman Rodack Company
What technology area does this patent fall under?
Primary CPC classification C09D5/1618. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 18 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).