Additive manufacturing employing a plurality of electron beam sources

US10744562B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10744562-B2
Application numberUS-201615005430-A
CountryUS
Kind codeB2
Filing dateJan 25, 2016
Priority dateJan 25, 2016
Publication dateAug 18, 2020
Grant dateAug 18, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

Adaptively forming a three-dimensional component may include providing a plurality of electron beam sources, and simultaneously controlling the plurality of electron beam sources to direct a plurality of electron beams onto a plurality of deposited layers of metallic powder to sequentially consolidate patterned portions of the plurality of deposited metallic powder layers to adaptively form the three-dimensional component.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for adaptively forming a three-dimensional component, the method comprising: simultaneously controlling a plurality of electron beam sources to direct a plurality of electron beams onto a plurality of deposited metallic powder layers to sequentially consolidate patterned portions of the plurality of deposited metallic powder layers to adaptively form the three-dimensional component having a single crystal structure, wherein controlling comprises directing each of the plurality of electron beams onto a different region of the plurality of deposited metallic powder layers, focusing each of the plurality of electron beams onto a portion of each of the different regions, and moving the focused electron beams within the different regions and moving comprises randomly moving the focused electron beams within the different regions. 2. The method of claim 1 , further comprising controlling thermal gradients in consolidating the patterned portions of the plurality of deposited metallic powder layers to form the three-dimensional component having a single crystal structure. 3. The method of claim 1 , wherein controlling comprises applying the plurality of electron beams for less than about 100 milliseconds per deposited metallic powder layer. 4. The method of claim 1 , wherein controlling comprises directing each of the plurality of electron beams onto a different region of about 25 millimeters by 25 millimeters of the plurality of deposited metallic powder layers, focusing each of the plurality of electron beams onto a portion about 0.1 millimeter by about 0.1 millimeters of each of the different regions, and moving the focused electron beams within the different regions for less than about 100 milliseconds per deposited metallic powder layer. 5. The method of claim 1 , wherein controlling comprises electrostatically focusing and/or magnetically focusing the plurality of electron beams. 6. The method of claim 1 , wherein each of the plurality of electron beam sources is configured to provide an electron beam of up to about 5 kW. 7. The method of claim 1 , wherein the three-dimensional component comprises a turbine component or a turbine component repair. 8. The method of claim 1 , wherein said plurality of electron beam sources comprises an array of 10 electron beam sources by 10 electron beam sources. 9. The method of claim 1 , wherein the metallic powder comprises titanium, titanium alloy, aluminum, aluminum alloy, stainless steel, or Co—Cr—W alloy. 10. The method of claim 1 , further comprising controlling a thickness of the plurality of deposited metallic powder layers. 11. The method of claim 1 , wherein each electron beam source is configured to provide a two-dimensional electron beam thermal spot having a width of about 0.1 mm and a length of about 0.1 mm. 12. The method of claim 1 , wherein the plurality of deposited metallic powder layers are provided in a build chamber, and the method further comprises forming a vacuum in the build chamber. 13. The method of claim 12 , wherein at least a portion of the plurality of electron beam sources are in or in fluid communication with the build chamber. 14. The method of claim 1 , wherein each of the plurality of electron beam sources is operable to provide an electron beam with an accelerating voltage of about 60 kV and a power in a range up to about 10 kW. 15. The method of claim 1 , wherein each of the plurality of electron beam sources is configured to provide an electron beam with a power of about 2 kW to about 8 kW. 16. The method of claim 1 , wherein each of the plurality of electron beam sources is configured to provide an electron beam with a power of about 5 kW to about 7 kW. 17. The method of claim 1 , wherein each of the plurality of electron beam sources is configured to provide an electron beam with a power of about 6.4 kW. 18. The method of claim 1 , wherein the plurality of electron beam sources are fixed relative to the plurality of deposited layers, and the controlling comprises independently directing each of the plurality of electron beams onto the plurality of deposited layers of metallic powder.

Assignees

Inventors

Classifications

  • B22F10/28Primary

    Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM] · CPC title

  • Two or more · CPC title

  • Temperature or temperature gradient, e.g. temperature of the melt pool · CPC title

  • for controlling or regulating additive manufacturing processes · CPC title

  • Scanning parameters, e.g. hatch distance or scanning strategy · CPC title

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What does patent US10744562B2 cover?
Adaptively forming a three-dimensional component may include providing a plurality of electron beam sources, and simultaneously controlling the plurality of electron beam sources to direct a plurality of electron beams onto a plurality of deposited layers of metallic powder to sequentially consolidate patterned portions of the plurality of deposited metallic powder layers to adaptively form the…
Who is the assignee on this patent?
Gen Electric
What technology area does this patent fall under?
Primary CPC classification B22F10/28. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Aug 18 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).