Method of forming pattern for a large area liquid crystal device

Patent metadata

Field	Value
Publication number	US-10730147-B2
Application number	US-201716349254-A
Country	US
Kind code	B2
Filing date	Nov 10, 2017
Priority date	Nov 11, 2016
Publication date	Aug 4, 2020
Grant date	Aug 4, 2020

Abstract

The present invention relates to a pattern forming method of a liquid crystal device.

First claim

The invention claimed is:

1. A method of forming patterns for a liquid crystal device, comprising:
providing the liquid crystal device with a substrate, a conductive layer provided on the substrate, and a liquid crystal alignment film on the conductive layer; and
exposing one area of the substrate by delaminating one area of the conductive layer and the liquid crystal alignment film by irradiating the one area with a laser;
wherein the laser irradiates the one area from the liquid crystal alignment film toward the conductive layer and
the laser is a Q switching IR laser having a beam diameter of 1 mm or larger and 16 mm or smaller, and an energy per pulse of 0.05 J or higher and 2.5 J or lower.

2. The method of claim 1 , wherein the substrate is a polycarbonate film, a colorless polyimide film, a polyethylene terephthalate film, or a cyclo olefin polymer film.

3. The method of claim 1 , wherein the conductive layer is an indium tin oxide film.

4. The method of claim 1 , wherein the liquid crystal alignment film includes at least one of a monomolecular compound, a monomeric compound, an oligomeric compound, and a polymeric compound.

5. The method of claim 1 , wherein the energy per pulse of the laser is 0.3 J or higher and 1.5 J or lower.

6. The method of claim 1 , wherein the beam diameter of the laser is 4 mm or larger and 9 mm or smaller.

7. The method of claim 1 , wherein a repetition frequency of the laser is 1 Hz or higher and 10 Hz or lower.

8. The method of claim 1 , wherein a pulse width of the laser is 1.0 ns or longer and 10.0 ns or shorter.

9. The method of claim 1 , wherein the exposing one area of the substrate is performed with volume expansion driven delamination of the conductive layer from the substrate.

10. The method of claim 1 , wherein the exposing one area of the substrate is performed by further providing an etching mask on the liquid crystal device and then removing the etching mask together with residues of the etched liquid crystal alignment film and conductive layer by irradiating the laser.

11. The method of claim 1 , further comprising incorporating the liquid crystal device into an automobile sunroof, a smart window, a privacy window, or a variable transmittance film.

Assignees

• Lg Chemical Ltd

Inventors

• Park Jeong Ho
• Lee Jin Soo
• Shin Bu Gon

Classifications

• H01B5/14

  comprising conductive layers or films on insulating-supports · CPC title

• G02F1/13392

  spacers dispersed on the cell substrate, e.g. spherical particles, microfibres · CPC title

• G02F1/133528

  Polarisers · CPC title

• B32B2457/202

  LCD, i.e. liquid crystal displays · CPC title

• B32B43/006 Primary

  Delaminating · CPC title