Leached superabrasive elements and systems, methods and assemblies for processing superabrasive materials

Patent metadata

Field	Value
Publication number	US-10723626-B1
Application number	US-201615158533-A
Country	US
Kind code	B1
Filing date	May 18, 2016
Priority date	May 31, 2015
Publication date	Jul 28, 2020
Grant date	Jul 28, 2020

Abstract

A method of processing a polycrystalline diamond body includes positioning an electrode near the polycrystalline diamond body such that a gap is defined between the electrode and the polycrystalline diamond body, the polycrystalline diamond body having a metallic material disposed in interstitial spaces defined within the polycrystalline diamond body. The method includes applying a voltage between the electrode and the polycrystalline diamond body, and passing a processing solution through the gap. The electrode is a cathode and the polycrystalline diamond body is an anode. An assembly for processing a polycrystalline diamond body includes the polycrystalline diamond body, an electrode positioned such that a gap is defined between the electrode and the polycrystalline diamond body, a processing solution passing through the gap such that the processing solution is in electrical communication with each of the polycrystalline diamond body and the electrode, and at least one power source.

First claim

What is claimed is:

1. A method of processing a polycrystalline diamond body, the method comprising:
positioning an electrode near a polycrystalline diamond body such that a gap is defined between the electrode and the polycrystalline diamond body, the polycrystalline diamond body comprising a metallic material disposed in interstitial spaces defined within the polycrystalline diamond body;
applying a voltage between the electrode and the polycrystalline diamond body, wherein the electrode is a cathode and the polycrystalline diamond body is an anode;
pumping a processing solution to cause flow of the processing solution within an internal passage extending through the electrode and discharge of the processing solution into the gap defined between the electrode and the polycrystalline diamond body;
wherein the processing solution is directed to flow radially outward from a central region of the electrode toward peripheral edges of the electrode.

2. The method of claim 1 , wherein the processing solution is in electrical communication with each of the electrode and the polycrystalline diamond body during the application of the voltage.

3. The method of claim 1 , wherein the processing solution leaches the metallic material from interstitial spaces within at least a volume of the polycrystalline diamond body.

4. The method of claim 1 , wherein the electrode does not directly contact the polycrystalline diamond body.

5. The method of claim 1 , wherein the processing solution at least partially oxidizes the metallic material.

6. The method of claim 1 , wherein the processing solution comprises an aqueous electrolyte solution.

7. The method of claim 6 , wherein the processing solution comprises electrolytes at a molar concentration of between approximately 0.01 M and approximately 3 M.

8. The method of claim 1 , wherein the processing solution comprises at least one of:
acetic acid;
ammonium chloride;
arsenic acid;
ascorbic acid;
carboxylic acid;
citric acid;
formic acid;
hydrobromic acid;
hydrofluoric acid;
hydroiodic acid;
lactic acid;
malic acid;
nitric acid;
oxalic acid;
phosphoric acid;
propionic acid;
pyruvic acid;
succinic acid;
tartaric acid.

9. The method of claim 1 , wherein the processing solution comprises at least one of an ion, a salt, and an ester of at least one of:
acetic acid;
ammonium chloride;
arsenic acid;
ascorbic acid;
carboxylic acid;
citric acid;
formic acid;
hydrobromic acid;
hydrofluoric acid;
hydroiodic acid;
lactic acid;
malic acid;
nitric acid;
oxalic acid;
phosphoric acid;
propionic acid;
pyruvic acid;
succinic acid;
tartaric acid.

10. The method of claim 1 , wherein the electrode comprises at least one of:
copper;
tungsten carbide;
cobalt;
zinc;
iron;
platinum;
palladium;
niobium;
graphite;
graphene;
nichrome;
gold;
silver.

11. The method of claim 1 , wherein the metallic material disposed in the interstitial spaces defined within the polycrystalline diamond body comprises at least one of:
cobalt;
nickel;
iron;
tungsten.

12. The method of claim 1 , wherein the processing solution comprises a metal salt.

13. The method of claim 1 , wherein a masking layer is disposed over at least a portion of the polycrystalline diamond body.

14. The method of claim 1 , wherein a cation of the metallic material is present in the processing solution following application of the voltage.

15. The method of claim 1 , wherein the polycrystalline diamond body is bonded to a substrate.

16. The method of claim 1 , wherein pumping the processing solution to cause flow of the processing solution further comprises generating a pressure of between approximately 0.5 bar and approximately 20 bar within the processing solution.

17. A method of processing a polycrystalline diamond body, the method comprising:
positioning an electrode near a polycrystalline diamond body such that a gap is defined between the electrode and the polycrystalline diamond body, the polycrystalline diamond body comprising a metallic material disposed in interstitial spaces defined within the polycrystalline diamond body;
applying a voltage between the electrode and the polycrystalline diamond body, wherein the electrode is a cathode and the polycrystalline diamond body is an anode;
pumping a processing solution to cause flow of the processing solution within an internal passage extending through the electrode and discharge of the processing solution into the gap defined between the electrode and the polycrystalline diamond body;
wherein pumping the processing solution further comprises causing the processing solution to flow through the gap defined between the electrode and the polycrystalline diamond body at a flow rate of between approximately 1 L/min and approximately 100 L/min.

18. The method of claim 17 , wherein the processing solution is in electrical communication with each of the electrode and the polycrystalline diamond body during the application of the voltage.

19. The method of claim 17 , wherein the processing solution leaches the metallic material from interstitial spaces within at least a volume of the polycrystalline diamond body.

20. The method of claim 17 , wherein the electrode does not directly contact the polycrystalline diamond body.

21. The method of claim 17 , wherein the processing solution at least partially oxidizes the metallic material.

22. The method of claim 17 , wherein the processing solution comprises an aqueous electrolyte solution.

23. The method of claim 22 , wherein the processing solution comprises electrolytes at a molar concentration of between approximately 0.01 M and approximately 3 M.

24. The method of claim 17 , wherein the processing solution comprises at least one of:
acetic acid;
ammonium chloride;
arsenic acid;
ascorbic acid;
carboxylic acid;
citric acid;
formic acid;
hydrobromic acid;
hydrofluoric acid;
hydroiodic acid;
lactic acid;
malic acid;
nitric acid;
oxalic acid;
phosphoric acid;
propionic acid;
pyruvic acid;
succinic acid;
tartaric acid.

25. The method of claim 17 , wherein the processing solution comprises at least one of an ion, a salt, and an ester of at least one of:
acetic acid;
ammonium chloride;
arsenic acid;
ascorbic acid;
carboxylic acid;
citric acid;
formic acid;
hydrobromic acid;
hydrofluoric acid;
hydroiodic acid;
lactic acid;
malic acid;
nitric acid;
oxalic acid;
phosphoric acid;
propionic acid;
pyruvic acid;
succinic acid;
tartaric acid.

26. The method of claim 17 , wherein the electrode comprises at least one of:
copper;
tungsten carbide;
cobalt;
zinc;
iron;
platinum;
palladium;
niobium;
graphite;
graphene;
nichrome;
gold;
silver.

27. The method of claim 17 , wherein the metallic material disposed in the interstitial spaces defined within the polycrystalline diamond body comprises at least one of:
cobalt;
nickel;
iron;
tungsten.

28. The method of claim 17 , wherein the processing solution comprises a metal salt.

29. The method of claim 17 , wherein a masking layer is disposed over at least a portion of the polycrystalline diamond body.

30. The method of claim 17 , wherein a cation of the metallic material is present in the processing solution following ap

Assignees

• Us Synthetic Corp

Inventors

• Chapman Mark Pehrson

Classifications

• C01B32/26

  Preparation (by using ultra-high pressure B01J3/06; by crystal growth C30B29/04) · CPC title

• C01B32/28 Primary

  After-treatment, e.g. purification, irradiation, separation or recovery · CPC title

• C25C7/00

  Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells (for the production of aluminium C25C3/06 - C25C3/22) · CPC title

• C25C1/00

  Electrolytic production, recovery or refining of metals by electrolysis of solutions (C25C5/00 takes precedence) · CPC title

• C25F7/00

  Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects (for both electrolytic coating and removal C25D); Servicing or operating · CPC title