Combination of an X-ray tube and a source grating with electron beam manipulation

Patent metadata

Field	Value
Publication number	US-10722201-B2
Application number	US-201615741047-A
Country	US
Kind code	B2
Filing date	Jul 27, 2016
Priority date	Jul 27, 2015
Publication date	Jul 28, 2020
Grant date	Jul 28, 2020

Abstract

Novel and advantageous systems and methods for performing X-ray imaging by using an X-ray source with source grating functionality incorporated therein are provided. An electron beam can be electromagnetically manipulated such that the X-ray source emits radiation in a pattern that is the same as if the radiation had already passed through a source grating.

First claim

What is claimed is:

1. An imaging system, comprising:
an X-ray source having source grating functionality incorporated therein, such that the X-ray source is configured to electromagnetically manipulate an electron beam therein such that the X-ray source emits X-ray radiation in a pattern that would have passed through a source grating whose functionality has been incorporated into the X-ray source;
wherein the X-ray source is configured to split an electron beam into a plurality of beamlets such that each beamlet is narrower than each gap between the beamlets.

2. The system according to claim 1 , further comprising:
a detector for detecting X-rays from the X-ray source;
a phase grating positioned between the X-ray source and the detector; and
an analyzer grating positioned between the phase grating and the detector.

3. The system according to claim 2 , configured such that a subject to be imaged is positioned between the X-ray source and the phase grating or between the phase grating and the detector.

4. The system according to claim 1 , wherein the system excludes a source grating.

5. The system according to claim 1 , wherein the X-ray source is configured to manipulate the electron beam within the X-ray source to trace a pattern of the source grating whose functionality has been incorporated into the X-ray source,
wherein the X-ray source is configured to manipulate the electron beam within the X-ray source before the electron beam reaches a metallic target of the X-ray source.

6. The system according to claim 1 , wherein the X-ray source comprises a metallic target that is in rotation mode or another motion mode,
wherein the radiation source comprises a plurality of negatively-charged structures configured to steer the electron beam within the X-ray source,
wherein the plurality of negatively-charged structures configured to steer the electron beam within the X-ray source comprises at least one of the following: a set of parallel plates configured to split an electron beam into a plurality of electron sheets; a set of rods configured to split an electron beam; and a set of coils.

7. The system according to claim 6 , wherein each negatively-charged structure configured to steer the electron beam within the X-ray source comprises graphene or a metal material.

8. The system according to claim 1 , wherein the X-ray source comprises a metallic target, and wherein the target has a shape of at least one spot, at least one line, or an extended area,
wherein the target has an area that is equal to that of the source grating, whose functionality has been incorporated into the radiation source, and
wherein the target has an area in a range of from 50 mm 2 to 500 mm 2 .

9. The system according to claim 1 , wherein the source grating whose functionality has been incorporated into the X-ray source has a period in a range of 15 μm to 80 μm.

10. The system according to claim 1 , wherein the X-ray source comprises a focusing element configured to focus an electron beam into a desired shape on a metallic target within the X-ray source,
wherein the desired shape is a focal spot with a radius of less than 20 μm, and
wherein the focusing element comprises at least one focusing plate or a solenoid with an elliptical aperture therethrough.

11. The system according to claim 10 , wherein the X-ray source is configured such that an exposure time for each focal spot is less than 10 milliseconds (ms).

12. The system according to claim 1 , wherein the X-ray source comprises a focusing element configured to focus the electron beam into a desired shape on a metallic target within the X-ray source,
wherein the desired shape is at least one line, such that the electron beam is focused into a flat beam, and
wherein the focusing element comprises at least one focusing plate or a solenoid with an elliptical aperture therethrough.

13. The system according to claim 1 , wherein the X-ray source comprises a metallic target that is a static anode or a rotating anode.

14. The system according to claim 1 , wherein the widths of the beamlets or the widths of the gaps between the beamlets are uniform.

15. The system according to claim 1 , wherein the widths of the beamlets or the widths of the gaps between the beamlets are non-uniform.

16. The system according to claim 1 , wherein a detector of the imaging system is a photon-counting detector, such that spectral information is included in data of the detector.

17. The system according to claim 1 , wherein the source grating whose functionality has been incorporated into the radiation source is a 1D source grating or a 2D source grating.

18. A method of imaging using the system according to claim 1 , the method comprising:
providing the X-ray radiation to a sample to be imaged using the X-ray source;
collecting the X-ray with a detector of the system; and
analyzing data from the detector to obtain an image.

19. The method according to claim 18 , wherein analyzing data from the detector to obtain an image comprises extracting X-ray diffraction fringes, phase-shift information, and dark-field information from the data from the detector.

20. The method according to claim 18 , wherein a detector of the imaging system is a photon-counting detector, such that spectral information is included in data of the detector.

Assignees

• Rensselaer Polytech Inst

Inventors

• Wang Ge
• Cong Wenxiang

Classifications

• H01J35/153

  Spot position control · CPC title

• H01J29/488

  Schematic arrangements of the electrodes for beam forming; Place and form of the elecrodes · CPC title

• A61B6/4064

  specially adapted for producing a particular type of beam · CPC title

• A61B6/4028

  resulting in acquisition of views from substantially different positions, e.g. EBCT · CPC title

• A61B6/4225

  using image intensifiers · CPC title