Positive resist film laminate and pattern forming process

Patent metadata

Field	Value
Publication number	US-10719015-B2
Application number	US-201815950630-A
Country	US
Kind code	B2
Filing date	Apr 11, 2018
Priority date	Apr 17, 2017
Publication date	Jul 21, 2020
Grant date	Jul 21, 2020

Abstract

A laminate comprising a thermoplastic film and a positive resist film is provided, the positive resist film comprising (A) a novolak resin-naphthoquinone diazide (NQD) base resin composition, (B) a polyester, and (C) 3-30 wt % of an organic solvent. The resist film may be transferred to a stepped support without forming voids.

First claim

The invention claimed is:

1. A positive resist film laminate comprising a thermoplastic film as a first support and a novolak resin-naphthoquinone diazide (NQD) base positive resist film thereon,
said novolak resin-NQD base positive resist film comprising
(A) a novolak resin-NQD base resin composition,
(B) a polyester, and
(C) 3 to 30% by weight of an organic solvent,
the novolak resin-NQD base resin composition (A) comprising
(A-1) a novolak resin having phenolic hydroxyl groups wherein some or all hydrogen atoms of the phenolic hydroxyl groups are substituted by 1,2-naphthoquinone diazidosulfonyl groups,
(A-2) a novolak resin having phenolic hydroxyl groups wherein some or all hydrogen atoms of the phenolic hydroxyl groups are substituted by 1,2-naphthoquinone diazidosulfonyl groups, and a novolak resin having unsubstituted phenolic hydroxyl groups,
(A-3) a novolak resin having phenolic hydroxyl groups wherein some or all hydrogen atoms of the phenolic hydroxyl groups are substituted by 1,2-naphthoquinone diazidosulfonyl groups, and a 1,2-naphthoquinone diazidosulfonic acid ester,
(A-4) a novolak resin having phenolic hydroxyl groups wherein some or all hydrogen atoms of the phenolic hydroxyl groups are substituted by 1,2-naphthoquinone diazidosulfonyl groups, a novolak resin having unsubstituted phenolic hydroxyl groups, and a 1,2-naphthoquinone diazidosulfonic acid ester, or
(A-5) a novolak resin having unsubstituted phenolic hydroxyl groups and a 1,2-naphthoquinone diazidosulfonic acid ester,
wherein the polyester (B) is a condensate of a polyfunctional carboxylic acid with a polyhydric alcohol or a condensate of a polyfunctional carboxylic anhydride with a polyhydric alcohol.

2. The laminate of claim 1 wherein the polyester (B) is a polyester based on a polyfunctional carboxylic acid having 2 to 6 carboxyl groups.

3. A pattern forming process comprising the steps of:
(1) transferring the novolak resin-NQD base positive resist film of the laminate of claim 1 to a second support,
(2) exposing the resist film to UV radiation, and
(3) developing the resist film in an alkaline aqueous solution.

4. The process of claim 3 wherein the step (1) further includes pre-baking the resist film after the transfer.

5. The process of claim 3 wherein the step (2) further includes post-exposure baking.

6. The process of claim 3 , further comprising the step (4) of forming a metal plating layer on the second support by electroplating or electroless plating, subsequent to the step (3).

7. A positive resist film laminate comprising a thermoplastic film as a first support and a novolak resin-naphthoquinone diazide (NQD) base positive resist film thereon,
said novolak resin-NQD base positive resist film comprising
(A) a novolak resin-NQD base resin composition,
(B) a polyester, and
(C) 3 to 30% by weight of an organic solvent,
the novolak resin-NQD base resin composition (A) comprising
(A-1) a novolak resin having phenolic hydroxyl groups wherein some or all hydrogen atoms of the phenolic hydroxyl groups are substituted by 1,2-naphthoquinone diazidosulfonyl groups,
(A-2) a novolak resin having phenolic hydroxyl groups wherein some or all hydrogen atoms of the phenolic hydroxyl groups are substituted by 1,2-naphthoquinone diazidosulfonyl groups, and a novolak resin having unsubstituted phenolic hydroxyl groups,
(A-3) a novolak resin having phenolic hydroxyl groups wherein some or all hydrogen atoms of the phenolic hydroxyl groups are substituted by 1,2-naphthoquinone diazidosulfonyl groups, and a 1,2-naphthoquinone diazidosulfonic acid ester,
(A-4) a novolak resin having phenolic hydroxyl groups wherein some or all hydrogen atoms of the phenolic hydroxyl groups are substituted by 1,2-naphthoquinone diazidosulfonyl groups, a novolak resin having unsubstituted phenolic hydroxyl groups, and a 1,2-naphthoquinone diazidosulfonic acid ester, or
(A-5) a novolak resin having unsubstituted phenolic hydroxyl groups and a 1,2-naphthoquinone diazidosulfonic acid ester,
wherein the polyester (B) is alkali soluble.

8. The laminate of claim 1 , further comprising (D) a surfactant.

Assignees

• Shinetsu Chemical Co

Inventors

• Hirano Yoshinori
• Asai Satoshi
• Kondo Kazunori

Classifications

• G03F7/16

  Coating processes; Apparatus therefor (applying coatings to base materials in general B05; applying photosensitive compositions to base for photographic purposes G03C1/74) · CPC title

• G03F7/0392 Primary

  the macromolecular compound being present in a chemically amplified positive photoresist composition · CPC title

• G03F7/0233 Primary

  characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides · CPC title

• G03F7/168

  Finishing the coated layer, e.g. drying, baking, soaking · CPC title

• G03F7/40

  Treatment after imagewise removal, e.g. baking · CPC title