LED for plant illumination
US-10154626-B2 · Dec 18, 2018 · US
US10716262B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10716262-B2 |
| Application number | US-201816194287-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 16, 2018 |
| Priority date | Mar 7, 2013 |
| Publication date | Jul 21, 2020 |
| Grant date | Jul 21, 2020 |
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An epitaxial wafer for plant lighting light-emitting diodes (LED), the epitaxial wafer includes: a growth substrate; a first red-light epitaxial laminated layer; a distributed Bragg reflector (DBR) semiconductor laminated layer; and a second red-light epitaxial laminated layer; wherein: the first red-light epitaxial laminated layer comprises a first N-type ohmic contact layer, a first N-type covering layer, a first light-emitting layer, a first P-type covering layer, and a first P-type ohmic contact layer; and the second red-light epitaxial laminated layer comprises a second N-type ohmic contact layer, a second N-type covering layer, a second light-emitting layer, a second P-type covering layer, and a second P-type ohmic contact layer.
Opening claim text (preview).
The invention claimed is: 1. A light-emitting diode (LED) for plant lighting, comprising: a first red-light epitaxial laminated layer having a first light-emitting layer; and a second red-light epitaxial laminated layer having a second light-emitting layer; wherein: a light-emitting area of the first red-light epitaxial laminated layer is less than a light-emitting area of the second red-light epitaxial laminated layer; and a light emitting wavelength of the first light-emitting layer is longer than a light emitting wavelength of the second light-emitting layer. 2. The LED of claim 1 , further comprising a distributed Bragg reflector (DBR) semiconductor laminated layer between the first red-light epitaxial laminated layer and the second red-light epitaxial laminated layer. 3. The LED of claim 2 , wherein the DBR semiconductor laminated layer is smaller than the light-emitting area of the second red-light epitaxial laminated layer, but larger than the light-emitting area of the first red-light epitaxial laminated layer. 4. The LED of claim 2 , wherein: a surface of the second red-light epitaxial laminated layer is preset with a light-emitting area and a non-light-emitting area; the DBR semiconductor laminated layer is formed on the non-light-emitting zone of the second red-light epitaxial laminated layer; and the first red-light epitaxial laminated layer is formed on the DBR semiconductor laminated layer. 5. The LED of claim 4 , wherein a doping concentration of the DBR semiconductor laminated layer is 5×10 17 to thereby form a high-resistance interface. 6. The LED of claim 4 , wherein the DBR semiconductor laminated layer form a high-resistance interface, when injecting a current to the LED, the DBR semiconductor laminated layer prevents the current from entering into the non-light-emitting area of the second red-light epitaxial laminated layer, but flows as far as possible to the light-emitting area of the second red-light epitaxial laminated layer. 7. The LED of claim 6 , further comprising an electrical coupling structure which electrically connects to the first red-light epitaxial laminated layer and the second red-light epitaxial laminated layer. 8. The LED of claim 7 , wherein: the first red-light epitaxial laminated layer further includes a first N-type semiconductor layer and a first P-type semiconductor layer; the second red-light epitaxial laminated layer further includes a second N-type semiconductor layer and a second P-type semiconductor layer; and the first P-type semiconductor layer electrically connects to the second N-type semiconductor layer via the electrical coupling structure. 9. The LED of claim 8 , further comprising an electrical current diffusion structure disposed over a non-light-emitting area of the second N-type semiconductor layer. 10. The LED of claim 1 , further comprising a high-resistance semiconductor layer between the first red-light epitaxial laminated layer and the second red-light epitaxial laminated layer, and wherein: a surface of the second red-light epitaxial laminated layer is preset with a light-emitting area and a non-light-emitting area; the high-resistance semiconductor layer is formed on the non-light-emitting zone of the second red-light epitaxial laminated layer; and the first red-light epitaxial laminated layer is formed on the high-resistance semiconductor layer. 11. The LED of claim 10 , when injecting a current to the LED, the high-resistance semiconductor layer prevents the current from entering into the non-light-emitting area of the second red-light epitaxial laminated layer, but flows as far as possible to the light-emitting area of the second red-light epitaxial laminated layer. 12. The LED of claim 11 , further comprising an electrical coupling structure which electrically connects to the first red-light epitaxial laminated layer and the second red-light epitaxial laminated layer. 13. The LED of claim 12 , wherein: the first red-light epitaxial laminated layer further includes a first N-type semiconductor layer and a first P-type semiconductor layer; the second red-light epitaxial laminated layer further includes a second N-type semiconductor layer and a second P-type semiconductor layer; and the first P-type semiconductor layer electrically connects to the second N-type semiconductor layer via the electrical coupling structure. 14. The LED of claim 13 , further comprising an electrical current diffusion structure disposed over a non-light-emitting area of the second N-type semiconductor layer. 15. The LED of claim 1 , wherein a light emitting wavelength of the first light-emitting layer is 710 nm-750 nm, and a light emitting wavelength of the second light-emitting layer is 640 nm-680 nm. 16. The LED of claim 15 , wherein the light emitting wavelength of the first light-emitting layer is 730 nm, and the light emitting wavelength of the second light-emitting layer is 660 nm. 17. The LED of claim 1 , wherein the light-emitting area of the first red-light epitaxial laminated layer is one-third of the light-emitting area of the second red-light epitaxial laminated layer. 18. A fabrication method of a plant lighting light-emitting diode (LED), the method comprising: providing a LED epitaxial wafer, which comprising: a first red-light epitaxial laminated layer includes a first light-emitting layer, and a second red-light epitaxial laminated layer includes a second light-emitting layer, wherein a light emitting wavelength of the first light-emitting layer is longer than a light emitting wavelength of the second light-emitting layer; defining a first light-emitting zone and a second light-emitting zone on the epitaxial wafer surface; and removing the red-light epitaxial laminated layer of the second light-emitting area to forming a first light-emitting area for the first red-light epitaxial laminated layer and a second light-emitting area for the second red-light epitaxial laminated layer; where the first light-emitting area is less than the second light-emitting area. 19. The method of claim 18 , wherein the epitaxial wafer further comprising a DBR semiconductor laminated layer between the first red-light epitaxial laminated layer and the second red-light epitaxial laminated layer, and also removing the DBR semiconductor laminated layer of the second light-emitting area. 20. The method of claim 19 , further comprising: forming an electrical coupling structure which electrically connects to the first red-light epitaxial laminated layer and the second red-light epitaxial laminated layer.
having reflecting means, e.g. semiconductor Bragg reflectors · CPC title
having a plurality of light-emitting regions, e.g. multi-junction LEDs or light-emitting devices having photoluminescent regions within the bodies · CPC title
within the light-emitting regions, e.g. having quantum confinement structures · CPC title
with electric lighting · CPC title
Measures for saving energy, e.g. in green houses · CPC title
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