X-ray diffraction analysis method and X-ray diffraction analysis apparatus

Patent metadata

Field	Value
Publication number	US-10712294-B2
Application number	US-201815996766-A
Country	US
Kind code	B2
Filing date	Jun 4, 2018
Priority date	Jun 8, 2017
Publication date	Jul 14, 2020
Grant date	Jul 14, 2020

Abstract

An X-ray diffraction analysis method includes, placing a sample on a sample stage and acquiring a two-dimensional X-ray diffraction image from the sample using a two-dimensional detection circuit by irradiating the sample with an X-ray in a state where an X-ray irradiation angle is fixed, specifying a collection of diffraction spots having a predetermined range of diffraction angles from the X-ray diffraction image as a diffraction spot group, counting the number of diffraction spots having predetermined intensity or more in the diffraction spot group, grouping the diffraction spot group based on the number of diffraction spots, and identifying a crystal phase contained in the sample based on a diffraction angle of the grouped diffraction spot group.

First claim

What is claimed is:

1. An X-ray diffraction analysis method comprising:
placing a sample on a sample stage and acquiring a two-dimensional X-ray diffraction image from the sample using a two-dimensional detection circuit by irradiating the sample with an X-ray in a state where an X-ray irradiation angle is fixed;
specifying a plurality of collections of diffraction spots from the X-ray diffraction image as diffraction spot groups, each of the diffraction spot groups including the diffraction spots having respective ranges of diffraction angles;
counting the number of diffraction spots having predetermined intensity or more in each of the diffraction spot groups;
grouping the diffraction spot groups in such a manner that one or more diffraction spot groups having the same number of diffraction spots belong to the same group to make one or more groups; and
identifying one or more crystal phases contained in the sample based on one or more diffraction angles of the one or more diffraction spot groups which are included in the same group.

2. The X-ray diffraction analysis method according to claim 1 , further comprising:
calculating an X-ray diffraction profile of a relationship between diffraction angle and intensity by integrating the intensity of the diffraction spot in a crystal orientation; and
identifying the one or more crystal phases based on the X-ray diffraction profile.

3. The X-ray diffraction analysis method according to claim 1 , wherein the act of counting the number of diffraction spots includes counting the number of diffraction spots in each of the diffraction spot groups in a region at a predetermined crystal orientation width and a predetermined diffraction angle width.

4. The X-ray diffraction analysis method according to claim 1 , wherein the sample is a polycrystalline material containing a plurality of crystal phases.

5. The X-ray diffraction analysis method according to claim 1 , further comprising:
estimating a number of the one or more groups as a number of the one or more crystal phases contained in the sample; and
repeating the identify the number of the one or more crystal phases times.

6. An X-ray diffraction analysis apparatus comprising:
an X-ray source configured to irradiate a sample with an X-ray in a state where an X-ray irradiation angle is fixed;
a sample stage configured to place the sample thereon; a two-dimensional detection circuit configured to acquire a two-dimensional X-ray diffraction image from the sample; and
an arithmetic control circuit configured to:
acquire the two-dimensional X-ray diffraction image from the sample by a two-dimensional detection circuit;
specify a plurality of collections of diffraction spots from the X-ray diffraction image as diffraction spot groups, each of the diffraction spot groups including the diffraction spots having respective ranges of diffraction angles;
count the number of diffraction spots having predetermined intensity or more in each of the diffraction spot groups;
group the diffraction spot groups in such a manner that one or more diffraction spot groups having the same number of diffraction spots belong to the same group to make one or more groups; and
identify one or more crystal phases contained in the sample based on one or more diffraction angles of the one or more diffraction spot groups which are included in the same group.

7. The X-ray diffraction analysis apparatus according to claim 6 , wherein the two-dimensional detection circuit is configured to calculate an X-ray diffraction profile of a relationship between diffraction angle and intensity by integrating the intensity of the diffraction spot in a crystal orientation, and identify the one or more crystal phases based on the X-ray diffraction profile.

8. The X-ray diffraction analysis apparatus according to claim 6 , wherein the two-dimensional detection circuit is configured to:
estimate a number of the one or more groups as a number of the one or more crystal phases contained in the sample; and
repeat the identify the number of the one or more crystal phases times.

Assignees

• Fujitsu Ltd

Inventors

• Doi Shuuichi

Classifications

• G01N23/207 Primary

  Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions · CPC title

• G01N2223/0566

  analysing diffraction pattern · CPC title

• G01N23/04

  and forming images of the material · CPC title

• G01N23/201

  by measuring small-angle scattering · CPC title

• G01N23/20025

  Sample holders or supports therefor · CPC title