Transparent photocatalyst coating and methods of manufacturing the same

Patent metadata

Field	Value
Publication number	US-10710063-B2
Application number	US-201916449677-A
Country	US
Kind code	B2
Filing date	Jun 24, 2019
Priority date	Jul 5, 2013
Publication date	Jul 14, 2020
Grant date	Jul 14, 2020

Abstract

Methods for making photocatalyst compositions and elements exhibiting desired photocatalytic activity levels and transparency.

First claim

What is claimed is:

1. A method of manufacturing a coated article comprising:
forming a thin layer of a photocatalytic composition by sputtering at least one photocatalytic source and at least one non-photocatalytic source onto a substrate target in a sputtering gas atmosphere, wherein the thin layer comprises a continuous first layer formed from the at least one photocatalytic source and a second layer formed from the at least one non-photocatalytic source, wherein the at least one photocatalytic source comprises at least one tin source, and the at least one non-photocatalytic source comprises at least one metal source, and wherein the second layer is formed immediately on top of the first layer.

2. The method of claim 1 , wherein the at least one tin source is selected from SnO 2 and Sn metal.

3. The method of claim 1 , wherein the first layer has a thickness of about 20 nm to about 200 nm.

4. The method of claim 1 , wherein the ratio of the volume of the first layer to the volume of the second layer is about 1 to about 100.

5. The method of claim 4 , wherein the ratio of the volume of the first layer to the volume of the second layer is about 5 to about 10.

6. The method of claim 1 , wherein the at least one non-photocatalytic source comprises copper.

7. The method of claim 1 , wherein the at least one non-photocatalytic source comprises a co-catalytic source.

8. The method of claim 7 , wherein the co-catalytic source comprises CeO 2 .

9. The method of claim 1 , wherein the sputtering gas atmosphere comprises argon.

10. The method of claim 9 , wherein the sputtering gas atmosphere further comprises oxygen.

11. The method of claim 8 , wherein the molar ratio of the at least one photocatalytic source to CeO 2 is about 1:1.

12. The method of claim 8 , wherein the molar ratio of the at least one photocatalytic source to CeO 2 is about 4:1.

13. The method of claim 1 , further comprising heating the substrate at a temperature between room temperature and 500° C.

14. The method of claim 1 , further comprising heating the substrate for a time between 10 seconds and 2 hours.

Assignees

• Nitto Denko Corp

Inventors

• Fukumura Takuya
• Pan Guang
• Sambandan Ekambaram
• Mukherjee Rajesh

Classifications

• C23C14/0688 Primary

  Cermets, e.g. mixtures of metal and one or more of carbides, nitrides, oxides or borides · CPC title

• B01J23/14

  of germanium, tin or lead · CPC title

• C23C14/08

  Oxides (C23C14/10 takes precedence) · CPC title

• B01J23/10

  of rare earths · CPC title

• B01J23/72

  Copper · CPC title