Anti-scatter grid

US10706984B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10706984-B2
Application numberUS-201615546375-A
CountryUS
Kind codeB2
Filing dateJan 22, 2016
Priority dateJan 27, 2015
Publication dateJul 7, 2020
Grant dateJul 7, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An x-ray and/or gamma radiation absorbing slat, for use in an anti-scatter grid having a layer configuration, includes a film-shaped substrate of a metallic material on the basis of at least one heavy metal and at least one coating layer of a material on the basis of at least one metal from the group tin, antimony, tantalum, tungsten, rhenium, iridium, platinum, gold or bismuth. The material of the coating layer differs from the material of the film-shaped substrate. An anti-scatter grid for x-ray and/or gamma radiation, a method for producing an x-ray and/or gamma radiation absorbing slat and a method of producing an anti-scatter grid, are also provided.

First claim

Opening claim text (preview).

The invention claimed is: 1. A slat for absorbing at least one of x-ray or gamma radiation in an anti-scatter grid having a layer configuration, the slat comprising: a film-shaped substrate of a molybdenum-based material; and at least one coating layer of a tungsten-based material. 2. The slat according to claim 1 , wherein said film-shaped substrate has one side being coated with said at least one coating layer. 3. The slat according to claim 1 , wherein said film-shaped substrate has two sides each being coated with at least one respective coating layer. 4. The slat according to claim 1 , wherein the slat has a thickness of from 10 μm to 60 μm. 5. The slat according to claim 1 , wherein said material of said substrate has a lower absorption coefficient with respect to x-ray or gamma radiation than said material of said at least one coating layer. 6. An anti-scatter grid for at least one of x-ray or gamma radiation, the grid comprising: a stack of alternately disposed first and second slats; said first slat being constructed according to claim 1 ; and said second slat being constructed of a material being substantially transmissive to at least one of x-ray or gamma radiation. 7. A method for producing a slat for absorbing at least one of x-ray or gamma radiation, the method comprising the following steps: producing a film from a molybdenum-based material; coating the film with a tungsten-based material; and cutting the film to size in strip shape. 8. The method according to claim 7 , which further comprises carrying out the coating step by physical vapor deposition, chemical vapor deposition, thermal spraying or fused salt electrolysis. 9. The method according to claim 7 , which further comprises applying the coating in a layer having a thickness of between 5 μm and 50 μm. 10. The method according to claim 7 , which further comprises carrying out the step of producing the film with a thickness of between 5 μm and 30 μm. 11. A method of producing an anti-scatter grid, the method comprising the following steps: producing slats in a layer configuration for absorbing at least one of x-ray or gamma radiation; providing each slat with a film-shaped substrate of a molybdenum-based material; and providing each slat with at least one coating layer of a tungsten-based material.

Assignees

Inventors

Classifications

  • G21K1/025Primary

    using multiple collimators, e.g. Bucky screens; other devices for eliminating undesired or dispersed radiation · CPC title

  • on metallic substrates or on substrates of boron or silicon · CPC title

  • G21K1/10Primary

    Scattering devices; Absorbing devices; Ionising radiation filters · CPC title

  • using diaphragms, collimators · CPC title

  • the radiation being X-rays · CPC title

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What does patent US10706984B2 cover?
An x-ray and/or gamma radiation absorbing slat, for use in an anti-scatter grid having a layer configuration, includes a film-shaped substrate of a metallic material on the basis of at least one heavy metal and at least one coating layer of a material on the basis of at least one metal from the group tin, antimony, tantalum, tungsten, rhenium, iridium, platinum, gold or bismuth. The material of…
Who is the assignee on this patent?
Plansee Se
What technology area does this patent fall under?
Primary CPC classification G21K1/025. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jul 07 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).