Method for manufacturing information recording medium

US10706885B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10706885-B2
Application numberUS-201615761407-A
CountryUS
Kind codeB2
Filing dateSep 9, 2016
Priority dateSep 18, 2015
Publication dateJul 7, 2020
Grant dateJul 7, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The same digital data is recorded with highly integrated manner on a plurality of media able to durably hold information over long-term. A minute graphic pattern indicating data bit information is drawn on a resist layer formed on a quartz glass substrate by exposing a beam and developed so as to prepare a master medium (M 1 ), which comprises the quartz glass substrate having a minute recess and protrusion structure formed by etching where the remaining resist are used as a mask (FIG. (a)). The recess and protrusion structure recorded on the master medium (M 1 ) is shaped and transferred onto a flexible recording medium (G 2 ) on which a UV curable resin layer ( 61 ) is formed, whereby an intermediate medium (M 2 ) is prepared (FIGS. (b)-(d)). The inverted recess and protrusion structure transferred to the intermediate medium (M 2 ) is shaped and transferred onto a recording medium (G 3 ) comprising a quartz glass substrate ( 70 ) on which a UV curable resin layer ( 80 ) is formed, whereby a reproduction medium (M 3 ) having the same recess and protrusion structure as that of the master medium (M 1 ) is prepared (FIGS. (e)-(h)). In shaping and transferring process, the media are separated using the flexibility of the intermediate medium (M 2 ).

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for manufacturing an information recording medium which prepares a plurality of information recording media in which a same digital data has been recorded, the method comprising: a master medium preparation step in which a process for recording digital data to be stored as a recess and protrusion structure pattern on a recording surface of a first recording medium is performed to prepare a master medium; an intermediate medium preparation step in which a process for transferring the recess and protrusion structure pattern recorded at the master medium onto a recording surface of a second recording medium is performed to prepare an intermediate medium; and a reproduction medium preparation step in which a process for transferring the recess and protrusion structure pattern recorded at the intermediate medium on a recording surface of a third recording medium is performed to prepare a reproduction medium; wherein in the master medium preparation step, a medium which includes a quartz glass substrate as the first recording medium is used to form a resist layer on a surface of the first recording medium, beam exposure is performed on a surface of the resist layer to draw a graphic pattern which shows bit information of digital data to be stored, the resist layer is developed to remove a part thereof, etching processing is performed, with a remaining part of the resist layer given as a mask, thereby preparing the master medium which includes a quartz glass substrate having a first recess and protrusion structure pattern on a surface thereof, in the intermediate medium preparation step, a shape formation process which utilizes the first recess and protrusion structure pattern formed on the surface of the master medium is performed to form, on the recording surface of the second recording medium, a second recess and protrusion structure pattern which is reverse in recess and protrusion relationship to the first recess and protrusion structure pattern, in the reproduction medium preparation step, a medium which includes a quartz glass substrate as the third recording medium is used to form, on the recording surface of the third recording medium, a third recess and protrusion structure pattern which is reverse in recess and protrusion relationship to the second recess and protrusion structure pattern by a shape formation process which utilizes the second recess and protrusion structure pattern formed on the surface of the intermediate medium, and wherein the first recording medium and the third recording medium are first attribute mediums and the second recording medium is a second attribute medium, and in the shape formation process of the intermediate medium preparation step and the shape formation process of the reproduction medium preparation step, the first attribute medium is curved and peeled from the second attribute medium. 2. The method for manufacturing an information recording medium according to claim 1 , wherein the first attribute medium includes a quartz glass substrate. 3. The method for manufacturing an information recording medium according to claim 1 , wherein the master medium preparation step includes, a data input step in which a computer inputs digital data to be stored, a unit data creating step in which the computer divides the digital data by a prescribed bit length unit to create a plurality of unit data, a unit bit matrix creating step in which the computer arranges data bits which constitute individual unit data in a two-dimensional matrix form to create a unit bit matrix, a unit bit graphic pattern creating step in which the computer converts the unit bit matrix to a geometrical pattern arranged inside a predetermined bit recording domain, thereby creating a unit bit graphic pattern, a unit recording graphic pattern creating step in which the computer adds an alignment mark to the unit bit graphic pattern, thereby creating a unit recording graphic pattern, a drawing data creating step in which the computer creates drawing data for drawing the unit recording graphic pattern, a beam exposure step in which beam exposure which uses electron beams or laser light is performed on a substrate in which the resist layer is added on the first recording medium, thereby conducting drawing on the basis of the drawing data, and a patterning step in which patterning processing is performed on the substrate which has been exposed, thereby creating the master medium having a physically structured pattern depending on the drawing data. 4. The method for manufacturing an information recording medium according to claim 3 , wherein, in the unit bit graphic pattern creating step, one of individual bits “ 1 ” and individual bits “ 0 ” which constitute the unit bit matrix is converted to individual bit figures composed of a closed domain, in the drawing data creating step, there is created drawing data which shows a contour line of the individual bit figures, in the beam exposure step, beam exposure is performed on a part inside the contour line of the individual bit figures, and in the patterning step, there is formed a physically structured pattern which has a recess and protrusion structure composed of a recess which shows one of a bit “ 1 ” and a bit “ 0 ” and a protrusion which shows the other of them. 5. The method for manufacturing an information recording medium according to claim 4 , wherein, in the patterning step, patterning processing is performed so as to form the master medium in which an interior of each bit figure is given as a recess and an exterior thereof is given as a protrusion. 6. The method for manufacturing an information recording medium according to claim 3 , wherein in the unit data creating step, the digital data is divided into unit data composed of (m×n) bits, in the unit bit matrix creating step, there is formed a unit bit matrix composed of m rows and n columns, and in the unit bit graphic pattern creating step, individual bits which constitute the unit bit matrix are allowed to correspond to grid points arranged in an m-row and n-column matrix form, a predetermined-shaped bit figure is arranged on a grid point corresponding to a bit “ 1 ” or a bit “ 0 ,” thereby creating a unit bit graphic pattern. 7. The method for manufacturing an information recording medium according to claim 6 , wherein in the unit bit graphic pattern creating step, there is created a unit bit graphic pattern arranged inside a rectangular bit recording domain, in the unit recording graphic pattern creating step, an alignment mark is added outside the rectangular bit recording domain, thereby creating a unit recording graphic pattern arranged inside a rectangular unit recording domain which includes the bit recording domain and the alignment mark, and in the drawing data creating step, the rectangular unit recording domain is arranged in a two-dimensional matrix form, thereby creating a drawing pattern which includes a plurality of unit recording graphic patterns and also creating drawing data for drawing the drawing pattern. 8. The method for manufacturing an information recording medium according to claim 6 , wherein, in the unit bit graphic pattern creating step, there is created a unit bit graphic pattern which is arranged inside a rectangular bit recording domain, in the unit recording graphic pattern creating step, an alignment mark is added outside the rectangular bit recording domain, thereby creating a unit recording graphic pattern which is arranged inside a rectangular unit recording domain including the bit recording domain and the alignment mark, in the drawing data creating step, the rectangular unit recording domain is partially overlapped vertically and laterally and arr

Assignees

Inventors

Classifications

  • Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography · CPC title

  • G11B7/263Primary

    Preparing and using a stamper, e.g. pressing or injection molding substrates (production of optical record carriers, e.g. optical discs B29D17/005) · CPC title

  • Preparing a master, e.g. exposing photoresist, electroforming · CPC title

  • G03F7/2059Primary

    using a scanning corpuscular radiation beam, e.g. an electron beam · CPC title

  • using a laser (ablative removal B41C) · CPC title

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What does patent US10706885B2 cover?
The same digital data is recorded with highly integrated manner on a plurality of media able to durably hold information over long-term. A minute graphic pattern indicating data bit information is drawn on a resist layer formed on a quartz glass substrate by exposing a beam and developed so as to prepare a master medium (M 1 ), which comprises the quartz glass substrate having a minute recess a…
Who is the assignee on this patent?
Dainippon Printing Co Ltd
What technology area does this patent fall under?
Primary CPC classification G11B7/263. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jul 07 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).