Apparatus and method for printing multilayer organic thin films from vapor phase in an ultra-pure gas ambient

Patent metadata

Field	Value
Publication number	US-10704144-B2
Application number	US-201615290101-A
Country	US
Kind code	B2
Filing date	Oct 11, 2016
Priority date	Oct 12, 2015
Publication date	Jul 7, 2020
Grant date	Jul 7, 2020

Abstract

Systems and techniques for depositing organic material on a substrate are provided, in which one or more shield gas flows prevents contamination of the substrate by the chamber ambient. Thus, multiple layers of the same or different materials may be deposited in a single deposition chamber, without the need for movement between different deposition chambers, and with reduced chance of cross-contamination between layers.

First claim

We claim:

1. An organic printing deposition system, comprising:
a print head comprising:
a nozzle block comprising a delivery aperture, the delivery aperture being in fluid communication with a source of organic material to be deposited on a substrate by the printing deposition system, and one or more exhaust apertures;
one or more shield gas distribution channels, each shield gas distribution channel being disposed in a leading position or a trailing position of the delivery aperture when viewed from the substrate;
a first array of shield gas apertures that are separate from and disposed adjacent to a first side of the nozzle block, and a second array of shield gas apertures that are separate from and disposed adjacent to a second side of the nozzle block, wherein the first array of shield gas apertures and the second array of shield gas apertures are respectively coupled to the one or more shield gas distribution channels, and wherein the nozzle block includes the delivery aperture and the one or more exhaust apertures; and
the one or more exhaust apertures are disposed adjacent to the delivery aperture such that, during operation of the print head, non-condensing gas flow generated by the delivery aperture is captured by the one or more exhaust apertures,
wherein the delivery aperture, the first array of shield gas apertures, and the second array of shield gas apertures are configured so that the gas flow generated by the delivery aperture during operation mixes with shield gas flow output from the first array of shield gas apertures and the second array of shield gas apertures,

a chiller plate disposed between the print head and the substrate that includes a window through which the print head protrudes, wherein the first array of shield gas apertures are located on the chiller plate and spaced in a first direction from the window, and wherein the second array of shield gas apertures are located on the chiller plate and are spaced in a second direction from the window,
wherein each of the first array of shield gas apertures and the second array of shield gas apertures is arranged to provide a flow of shield gas that prevents material from a chamber ambient in which the print head is operated from reaching the exhaust apertures of the nozzle block, wherein the shield gas is purified so that water and oxygen levels of the shield gas are less than 0.001 parts-per-million (ppm) prior to being output in a deposition chamber of the printing deposition system, and
wherein the print head is moveable in a direction of a substrate normal, independently of other components of the organic printing deposition system.

2. The system of claim 1 , wherein the print head is removable from the chamber as a one-piece unit.

3. The system of claim 1 , wherein each of the first array of shield gas apertures and the second array of shield gas apertures ejects shield gas into the space between the substrate and the print head during operation of the print head such that all gas ingested by the exhaust apertures originates from either the delivery aperture, or the first array of shield gas apertures and the second array of shield gas apertures.

4. The system of claim 1 , wherein an angle between the nozzle block and the substrate can be adjusted independently of other components of the organic printing deposition system.

5. The system of claim 1 , wherein the system comprises multiple print heads mounted in a single deposition chamber.

6. The system of claim 5 wherein the multiple print heads are mounted on a common, articulated carriage.

7. The system of claim 5 , wherein at least one of the print heads is a Delivery-Exhaust-Confinement Organic Vapor Jet Printing (DEC OVJP) print head.

8. The system of claim 1 , wherein the shield gas prevents the spread of contaminants into a deposition zone of the deposition chamber of the printing deposition system.

9. The system of claim 1 , wherein the print head that includes the nozzle block, the one or more shield gas distribution channels, the first array of shield gas apertures, the second array of shield gas apertures, and the one or more exhaust channels is monolithic.

10. The system of claim 1 , wherein the shield gas apertures are configured to output the shield gas antiparallel to the output of the organic source material by the delivery aperture, and in the same plane as the substrate.

11. An organic printing deposition system, comprising:
a print head comprising:
a nozzle block comprising a delivery aperture, the delivery aperture being in fluid communication with a source of organic material to be deposited on a substrate by the printing deposition system, and one or more exhaust apertures;
one or more shield gas distribution channels, each shield gas distribution channel being disposed in a leading position or a trailing position of the delivery aperture when viewed from the substrate;
a first array of shield gas apertures that are separate from and disposed adjacent to a first side of the nozzle block, and a second array of shield gas apertures that are separate from and disposed adjacent to a second side of the nozzle block, wherein the first array of shield gas apertures and the second array of shield gas apertures are respectively coupled to the one or more shield gas distribution channels, and wherein the nozzle block includes the delivery aperture and the one or more exhaust apertures;
additional one or more shield gas apertures respectively coupled to the one or more shield gas distribution channels that are separate from the print head; and
the one or more exhaust apertures are disposed adjacent to the delivery aperture such that, during operation of the print head, non-condensing gas flow generated by the delivery aperture is captured by the one or more exhaust apertures,
wherein the delivery aperture, the first array of shield gas apertures, and the second array of shield gas apertures are configured so that the gas flow generated by the delivery aperture during operation mixes with shield gas flow output from the first array of shield gas apertures and the second array of shield gas apertures,

a chiller plate disposed between the print head and the substrate that includes a window through which the print head protrudes, wherein the first array of shield gas apertures are located on the chiller plate and spaced in a first direction from the window, and wherein the second array of shield gas apertures are located on the chiller plate and are spaced in a second direction from the window,
wherein each of the first array of shield gas apertures and the second array of shield gas apertures is arranged to provide a flow of shield gas that prevents material from a chamber ambient in which the print head is operated from reaching the exhaust apertures of the nozzle block, wherein the shield gas is purified so that water and oxygen levels of the shield gas are less than 0.001 parts-per-million (ppm) prior to being output in a deposition chamber of the printing deposition system, and wherein the print head is moveable in a direction of a substrate normal, independently of other components of the organic printing deposition system.

Assignees

• Universal Display Corp

Inventors

• Mcgraw Gregory
• Quinn William E
• Kottas Gregg
• Harikrishna Mohan Siddharth
• King Matthew

Classifications

• C23C14/564

  Means for minimising impurities in the coating chamber such as dust, moisture, residual gases · CPC title

• C23C14/228

  Gas flow assisted PVD deposition · CPC title

• C23C14/12

  Organic material · CPC title

• B41J2/04 Primary

  generating single droplets or particles on demand · CPC title

• Y02E10/549

  Organic PV cells · CPC title