Abatement system

Patent metadata

Field	Value
Publication number	US-10702824-B2
Application number	US-201615745923-A
Country	US
Kind code	B2
Filing date	Jun 15, 2016
Priority date	Jul 22, 2015
Publication date	Jul 7, 2020
Grant date	Jul 7, 2020

Abstract

Venturi Scrubbers are used to separate particulate from a large range of fluids. Many provide additional liquid and/or gas to drive the fluid and aid in the removal of particulate. The present invention provides a liquid ring pump through which the fluid to be treated is first passed and then exhausted, with additional work fluid to a Venturi scrubber such that the particulate can be separated from the exhaust fluid.

First claim

The invention claimed is:

1. An abatement system for abating effluent gas evacuated from a processing chamber, the abatement system comprising:
a liquid ring pump for compressing and pre-scrubbing gas evacuated from a processing chamber, the liquid ring pump comprising a gas inlet for receiving evacuated gas, a liquid inlet for receiving liquid for generating a liquid ring in a stator of the pump when a rotor rotates in the stator and a gas and liquid outlet for exhausting gas and liquid in a gas/liquid ratio; and
a venturi scrubber comprising an inlet for receiving the gas and liquid mixture from the liquid ring pump, a conical inlet portion wherein the inlet is arranged to convey the gas and liquid mixture tangentially to the conical inlet portion such that the liquid portion of the mixture is forced to spin around an inside wall of the venturi scrubber, a nozzle, downstream of the conical inlet portion, through which the gas and liquid is conveyed for providing mixing of the gas with the liquid, and a liquid sump for collecting liquid conveyed through the nozzle and a gas outlet for exhausting gas from the venturi scrubber, the liquid ring pump being configured to exhaust gas and liquid at a pressure which drives the gas and liquid through the venturi scrubber and wherein the gas/liquid ratio of the effluent gas stream exhausted from the liquid ring pump is adapted to promote scrubbing by the venturi scrubber.

2. The abatement system as claimed in claim 1 , comprising a combustor located to combust effluent gas exhausted from the liquid ring pump prior to passage of the gas stream through the nozzle of the venturi scrubber.

3. The abatement system as claimed in claim 2 , wherein the combustor comprises an oxidant inlet for the supply of an oxidant flow into an inlet portion of the venturi scrubber and an ignition source located to ignite the effluent gas entering the venturi scrubber in the flow of oxidant for combusting the effluent gas stream.

4. The abatement system as claimed in claim 3 , wherein the oxidant inlet is formed in the venturi scrubber and the ignition source extends into the venturi scrubber for combusting effluent gas in the venturi scrubber.

5. The abatement system as claimed in claim 1 , comprising a plurality of said liquid ring pumps arranged for compressing and pre-scrubbing effluent gas exhausted from respective processing chambers, wherein the liquid rings pumps are configured for the respective effluent gas streams exhausted by said chambers.

6. The abatement system as claimed in claim 1 , comprising a plurality of said liquid ring pumps arranged for compressing and pre-scrubbing effluent gas exhausted during respective processing and cleaning steps in one or more process chambers, wherein the liquid rings pumps are configured for the respective effluent gas streams exhausted during processing and cleaning steps.

7. The abatement system as claimed in claim 5 , wherein said plurality of liquid ring pumps exhaust an effluent gas and liquid mixture to said venturi scrubber.

8. The abatement system as claimed in claim 5 , comprising at least one valve located between a said process chamber and the plurality of liquid ring pumps for conveying effluent gas exhausted from said processing chamber to a selected one of said liquid ring pumps dependent on the step carried out in the process chamber during which effluent gas is generated.

9. The abatement system as claimed in claim 8 , wherein said valve is a three way valve and conveys effluent gas generated during a process step to a first said liquid ring pump and effluent gas generated during a cleaning step to a second said liquid ring pump.

10. The abatement system as claimed in claim 8 , comprising a plurality of valves located between respective process chambers and the liquid ring pumps for conveying effluent gas exhausted from respective said process chambers to a selected one of the liquid ring pumps dependent on the step carried out in the process chamber during which effluent gas is generated.

11. The abatement system as claimed in claim 10 , wherein said valves are three way valves and convey effluent gas generated in respective process chambers during a process step to a first said liquid ring pump and effluent gas generated during a cleaning step to a second said liquid ring pump.

12. The abatement system as claimed in claim 1 , comprising a wet scrubber located downstream of the venturi scrubber for wet scrubbing gas exhausted from the venturi scrubber.

Assignees

• Edwards Ltd

Inventors

• Knight Gary Peter
• Seeley Andrew James
• Price Duncan Michael

Classifications

• B01D53/68 Primary

  Halogens or halogen compounds · CPC title

• F04C19/001

  General arrangements, plants, flowsheets · CPC title

• B01D2257/204

  Inorganic halogen compounds · CPC title

• B01D2257/553

  Compounds comprising hydrogen, e.g. silanes · CPC title

• B01D2257/2027

  Fluorine · CPC title