High-pressure gas supplying apparatus

US10697589B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10697589-B2
Application numberUS-201816130571-A
CountryUS
Kind codeB2
Filing dateSep 13, 2018
Priority dateNov 17, 2017
Publication dateJun 30, 2020
Grant dateJun 30, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided is a high-pressure gas supplying apparatus that may minimize impact to be exerted on a valve seat in a regulator and may reuse condensate water or gas produced from leaking gas that is gradually discharged to the outside. That is, it is possible to collect and reuse moisture (condensate water) or gas produced by the Joule-Thomson effect from leaking gas that is gradually discharged to the outside by the leaking gas discharge unit.

First claim

Opening claim text (preview).

What is claimed is: 1. A gas supplying apparatus comprising: a main flow path which connects a gas supply source and a consumer; a regulator which is provided in the main flow path and adjusts pressure of gas from the gas supply source to a pressure required by the consumer; a first inlet valve which is provided in the main flow path between the gas supply source and the regulator; a bypass flow path which is provided in the main flow path between the gas supply source and the regulator and bypasses the first inlet valve; a first orifice which is provided in the bypass flow path and allows gas to pass therethrough; a second inlet valve which is provided in the bypass flow path and disposed in parallel with the first inlet valve; an outlet valve which is provided in the main flow path between the regulator and the consumer; a leaking gas discharge flow path which is provided in the main flow path between the regulator and the outlet valve and discharges leaking gas from the regulator to the outside; a second orifice which is provided in the leaking gas discharge flow path and allows gas to continuously pass therethrough; and a collector which is provided at a rear end of the leaking gas discharge flow path, collects moisture produced by a decrease in temperature and gas produced by an increase in temperature at a rear end of the second orifice due to the Joule-Thomson effect. 2. The gas supplying apparatus according to claim 1 , wherein the first inlet valve introduces gas at a higher flow rate than the second inlet valve. 3. The gas supplying apparatus according to claim 2 , wherein the first inlet valve is controlled such that the first inlet valve is opened after the second inlet valve is opened. 4. The gas supplying apparatus according to claim 1 , wherein the second orifice has an inner diameter of 0.1 to 0.3 mm. 5. The gas supplying apparatus according to claim 1 , wherein the collector includes: a moisture collecting unit in which the gas and the moisture are introduced and the moisture is accommodated; and a gas collecting unit which is in communication with an upper end portion of the moisture collecting unit and draws the gas.

Assignees

Inventors

Classifications

  • F17D5/02Primary

    Preventing, monitoring, or locating loss · CPC title

  • of gas pipelines, e.g. alarm · CPC title

  • in gas pipelines · CPC title

  • for distribution of gas · CPC title

  • F16K1/303Primary

    with a valve member, e.g. stem or shaft, passing through the seat · CPC title

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What does patent US10697589B2 cover?
Provided is a high-pressure gas supplying apparatus that may minimize impact to be exerted on a valve seat in a regulator and may reuse condensate water or gas produced from leaking gas that is gradually discharged to the outside. That is, it is possible to collect and reuse moisture (condensate water) or gas produced by the Joule-Thomson effect from leaking gas that is gradually discharged to …
Who is the assignee on this patent?
Korea Aerospace Res Inst
What technology area does this patent fall under?
Primary CPC classification F17D5/02. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Jun 30 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).