Sam assisted selective e-less plating on packaging materials

US10697065B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10697065-B2
Application numberUS-201615769699-A
CountryUS
Kind codeB2
Filing dateAug 8, 2016
Priority dateNov 30, 2015
Publication dateJun 30, 2020
Grant dateJun 30, 2020

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  1. Title

    What the patent document calls the invention.

  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method including activating an area of a polymer layer on a substrate with electromagnetic radiation; modifying the activated area; forming a self-assembled monolayer on the modified active area; reacting the self-assembled monolayer with the self-assembled monolayer; and reacting the self-assembled monolayer with a conductive material. A method including activating an area of a polymer dielectric layer on a substrate with electromagnetic radiation, the area selected for an electrically conductive line; modifying the activated area; forming a self-assembled monolayer on the modified active area; reacting the self-assembled monolayer with a catalyst; and electroless plating a conductive material on the self-assembled monolayer.

First claim

Opening claim text (preview).

What is claimed is: 1. An integrated circuit chip package substrate comprising a plurality of conductive lines formed on a radiation-activated dielectric material, the conductive lines formed of conductive material chemically bonded to the dielectric material through a self-assembled monolayer. 2. The substrate of claim 1 , wherein the conductive material is chemically bonded to the self-assembled monolayer through a catalyst. 3. The substrate of claim 1 , wherein the dielectric material comprises a polymer material. 4. A method comprising: activating an area of a polymer layer on a package substrate by exposing portions of a surface of the polymer layer to electromagnetic radiation; modifying the activated area; forming a self-assembled monolayer on the modified active area; reacting the self-assembled monolayer with a catalyst; and reacting the self-assembled monolayer with a conductive material. 5. The method of claim 4 , wherein modifying the activated area comprises forming a hydroxyl ion rich area. 6. The method of claim 4 , wherein the self-assembled monolayer comprises a functional group operable to react with the catalyst. 7. The method of claim 6 , wherein the functional group comprises one of an amine moiety, a sulfhydryl moiety and a pyridil moiety. 8. The method of claim 4 , wherein the catalyst is a metal and reacting the self-assembled monolayer with a conductive material comprises reducing the catalyst in a bath comprising a reducing agent and an ionic form of the conductive material. 9. The method of claim 8 , wherein reacting the self-assembled monolayer with a conductive material comprises reducing the state of the ionic form of conductive material. 10. A method comprising: activating an area of a polymer dielectric layer on a substrate by exposing portions of a surface of the polymer layer to electromagnetic radiation, the area selected for an electrically conductive line; modifying the activated area; forming a self-assembled monolayer on the modified active area; reacting the self-assembled monolayer with a catalyst; and electroless plating a conductive material on the self-assembled monolayer. 11. The method of claim 10 , wherein modifying the activated area comprises forming a hydroxyl ion rich area. 12. The method of claim 10 , wherein the self-assembled monolayer comprises a functional group operable to react with the catalyst. 13. The method of claim 12 , wherein the functional group comprises one of an amine moiety, a sulfhydryl moiety and a pyridil moiety. 14. The method of claim 10 , wherein the catalyst comprises palladium. 15. The method of claim 10 , wherein electroless plating a conductive material comprises reducing the catalyst in a bath comprising a reducing agent that is oxidized. 16. The method of claim 15 , wherein the bath comprises an ionic form of the conductive material in an oxidized state and electroless plating a conductive material comprises reducing the state of the ionic form of the conductive material. 17. The method of claim 10 , wherein the substrate comprises a package substrate.

Assignees

Inventors

Classifications

  • Subject matter not provided for in other groups of this subclass · CPC title

  • H10W70/05Primary

    of insulating or insulated package substrates, or of interposers, or of redistribution layers (manufacture or treatment of leadframes H10W70/04) · CPC title

  • Multilayered product (layered product B32B) · CPC title

  • laminating inorganic sheets comprising printed circuits, e.g. green ceramic sheets · CPC title

  • by other methods than those of C23C18/22 - C23C18/30 · CPC title

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What does patent US10697065B2 cover?
A method including activating an area of a polymer layer on a substrate with electromagnetic radiation; modifying the activated area; forming a self-assembled monolayer on the modified active area; reacting the self-assembled monolayer with the self-assembled monolayer; and reacting the self-assembled monolayer with a conductive material. A method including activating an area of a polymer diele…
Who is the assignee on this patent?
Intel Corp
What technology area does this patent fall under?
Primary CPC classification H10W70/05. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jun 30 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).