Evaporator body with titanium hydride coating, method for the production and usage thereof

Patent metadata

Field	Value
Publication number	US-10689750-B2
Application number	US-201615215170-A
Country	US
Kind code	B2
Filing date	Jul 20, 2016
Priority date	Jul 24, 2015
Publication date	Jun 23, 2020
Grant date	Jun 23, 2020

Abstract

An evaporator body for a PVD coating system comprises a basic body and an evaporator surface, to which a titanium dihydride layer is applied. A titanium hydride layer comprises an organic carrier agent and titanium hydride as the single inorganic solid. The thickness of the layer is less than or equal to 10 μm.

First claim

The invention claimed is:

1. A method for producing an evaporator body for a PVD coating system with a basic body and an evaporator surface on the basic body, which comprises the following steps:
providing a suspension of titanium hydride and an organic carrier agent in an organic solvent; and
applying the suspension onto the evaporator surface while forming a titanium hydride layer, in which titanium hydride is present as the only inorganic solid;
wherein the titanium hydride layer is formed in a thickness of no more than 10μ; and heating the evaporator body to melt aluminum in contact with the titanium hydride layer to form a Ti—Al wetting layer.

2. The method according to claim 1 , wherein the suspension is applied by means of a print process.

3. The method according to claim 1 , wherein the suspension contains titanium hydride in a portion of about 5 to 15% by weight in relation to the total weight of the suspension.

4. The method according to claim 1 , wherein the suspension is applied with a coating weight of 1 to 5 mg per cm 2 onto the evaporator surface.

5. The method according to claim 1 , in which the evaporator body is heated to a temperature greater than 1000° C.

6. The method according to claim 5 , wherein the basic body is heated to a temperature ranging from a 1400 to 1700° C.

7. The method according to claim 1 , wherein the suspension comprises a varnish.

8. The method according to claim 1 , wherein the Ti—Al wetting layer is bonded to the base body via an intermediate layer comprising titanium diboride and titanium nitride.

9. The method according to claim 1 , wherein the organic carrier agent comprising a synthetic resin.

10. The method of claim 1 , wherein the Ti—Al layer is of formula TiA 3 .

11. The method of claim 10 , wherein the Ti—Al layer further comprises Ti x Al y phases.

12. The method of claim 1 , wherein the thickness of the titanium hydride layer is 2-8 μm.

13. The method of claim 1 , wherein the thickness of the titanium hydride layer is 4-6 μm.

Assignees

• Kennametal Inc

Inventors

• Grau Rudolf Karl
• Yappi Rodrigue Ngoumeni
• Schweiger Hubert Josef

Classifications

• C23C28/34

  including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates · CPC title

• C23C14/246

  Replenishment of source material · CPC title

• B01B1/005

  Evaporation for physical or chemical purposes; Evaporation apparatus therefor, e.g. evaporation of liquids for gas phase reactions · CPC title

• B32B15/20

  comprising aluminium or copper {(B32B15/016 and B32B15/017 take precedence)} · CPC title

• Y10T428/31504

  Composite [nonstructural laminate] · CPC title