Method for synthesizing polyaryletherketones

US10689475B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10689475-B2
Application numberUS-201916255992-A
CountryUS
Kind codeB2
Filing dateJan 24, 2019
Priority dateJul 20, 2012
Publication dateJun 23, 2020
Grant dateJun 23, 2020

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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The invention relates to polyaryl ether ketones with low contents of residual materials, whether they are residual monomers or solvents of the synthetic process.

First claim

Opening claim text (preview).

The invention claimed is: 1. A polyaryl ether ketone with a residual solvent content of less than 100 ppm and a residual aromatic ether content of less than 1%, wherein the residual solvent has a water solubility of less than 0.05% at 25° C., wherein the polyaryl ether ketone is free from any residual alcohol. 2. The polyaryl ether ketone of claim 1 , wherein the residual aromatic ether has a molar mass less than 500 g·mol −1 . 3. The polyaryl ether ketone of claim 1 , wherein the polyaryl ether ketone has a thermal stability inducing less than 2% of variation in the viscosity measured according to standard ISO 307. 4. The polyaryl ether ketone of claim 1 , wherein the polyaryl ether ketone is a polyether ketone ketone (PEKK). 5. The polyaryl ether ketone of claim 4 , wherein the residual aromatic ether is 1,4-bis(4-phenoxybenzoyl)benzene. 6. The polyaryl ether ketone of claim 2 , wherein the residual solvent is ortho-dichlorobenzene. 7. A polyaryl ether ketone obtained by a process which comprises the following consecutive steps: a) placing one or more aromatic acid chlorides and one or more aromatic ethers in contact with a Lewis acid in a solvent which has a water solubility of less than 0.05% at 25° C. at a temperature of between −5 and +25° C., with stirring; b) carrying out a polymerization of the aromatic acid chlorides and aromatic ethers and completing the polymerization at a temperature of between 50 and 120° C. to provide a reaction mixture which includes a polyaryl ether ketone; c) placing the reaction mixture in contact with water in the absence of alcohol with stirring in the optional presence of acid to extract the Lewis acid, forming a mixture of polyaryl ether ketone and liquid effluents; d) separating the polyaryl ether ketone from the liquid effluents; e) performing azeotropic distillation on the polyaryl ether ketone so as to eliminate residual solvent; f) washing the polyaryl ether ketone; and g) drying the polyaryl ether ketone at a temperature above Tg+20° C.; wherein the polyaryl ether ketone has a residual solvent content of less than 100 ppm and a residual aromatic ether content of less than 1%. 8. The polyaryl ether ketone of claim 7 , wherein the polyaryl ether ketone has a thermal stability inducing less than 2% of variation in the viscosity measured according to standard ISO 307. 9. The polyaryl ether ketone of claim 7 , wherein the polyaryl ether ketone is a polyether ketone ketone (PEKK). 10. The polyaryl ether ketone of claim 9 , wherein the residual aromatic ether is 1,4-bis(4-phenoxybenzoyl)benzene. 11. The polyaryl ether ketone of claim 7 , wherein the residual solvent is ortho-dichlorobenzene. 12. The polyaryl ether ketone of claim 7 , wherein the polyaryl ether ketone is free from any residual alcohol.

Assignees

Inventors

Classifications

  • C08G61/127Primary

    derived from carbon dioxide, carbonyl halide, carboxylic acids or their derivatives · CPC title

  • Polyetherketones · CPC title

  • Use of condensation polymers of aldehydes or ketones {or derivatives thereof}, as reinforcement · CPC title

  • Use of condensation polymers of aldehydes or ketones {or derivatives thereof}, as moulding material · CPC title

  • Friedel-Crafts-type · CPC title

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What does patent US10689475B2 cover?
The invention relates to polyaryl ether ketones with low contents of residual materials, whether they are residual monomers or solvents of the synthetic process.
Who is the assignee on this patent?
Arkema France
What technology area does this patent fall under?
Primary CPC classification C08G61/127. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jun 23 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).