System for transfer of nanomembrane elements with improved preservation of spatial integrity
US-2015375488-A1 · Dec 31, 2015 · US
US10682806B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10682806-B2 |
| Application number | US-201515512991-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 28, 2015 |
| Priority date | Sep 29, 2014 |
| Publication date | Jun 16, 2020 |
| Grant date | Jun 16, 2020 |
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A process for producing a surface covering with an embossed printed surface is described. A substrate (16) is continuously moved through a production line, and this substrate (16) is first provided, in a printing equipment (12), with a printed pattern and thereafter, in an embossing equipment (14), with an embossed pattern, which is registered with the printed pattern. The printing equipment (12) produces the printed pattern in-line with the production of the embossed pattern. During printing in the printing equipment (12), the printed pattern is stretched or compressed, dynamically responsive to indicators of misalignments between the printed pattern and the embossed pattern, so as to correct or prevent the misalignments. A production line for carrying out this process is also proposed.
Opening claim text (preview).
The invention claimed is: 1. A process for producing a surface covering with an embossed printed surface, wherein a substrate is continuously moved through a production line, and said substrate is first provided with a printed pattern and thereafter with an embossed pattern, which is to be registered with said printed pattern; wherein a printing equipment is used in said production line to produce said printed pattern in-line with the production of said embossed pattern by an embossing equipment, the substrate remaining continuous at least up to where the substrate passes the embossing equipment; wherein between the printing equipment and the embossing equipment a transparent wear layer is applied onto the printed pattern; wherein the embossed pattern is embossed into the transparent wear layer in the embossing equipment; and wherein misalignments between said printed pattern and said embossed pattern are corrected or prevented by stretching or compressing said printed pattern relative to the substrate on which is printed, during printing in said printing equipment, dynamically responsive to indicators of said misalignments between said printed pattern and said embossed pattern. 2. The process as claimed in claim 1 , wherein said printing equipment a digital printing equipment, and said printed pattern is stretched or compressed by controlling said digital printing equipment. 3. The process as claimed in claim 2 , wherein said printed pattern is stretched, respectively compressed, by up-scaling, respectively down-scaling, in real-time at least a part of a digitally recorded image of said pattern to be printed. 4. The process as claimed in claim 3 , wherein said up-scaling and/or down-scaling is a unidirectional scaling, the scaling direction corresponding to a longitudinal direction of said printed pattern on said moving substrate. 5. The process as claimed in claim 1 , wherein said printed pattern is stretched or compressed by reducing or increasing a velocity with which said substrate passes through said printing equipment. 6. The process as claimed in claim 4 , wherein an accumulation loop, which is arranged between said printing equipment and the embossing equipment, allows to control a velocity of said substrate in said printing equipment independently from the velocity of said substrate in said embossing equipment, while maintaining tension in said moving substrate substantially constant. 7. The process as claimed in claim 1 , wherein: a rotating embossing cylinder is used for providing said embossed pattern in the surface covering, the embossing cylinder having an angular position that changes as the embossing cylinder rotates; and an angular encoder is used for continuously measuring the angular position of said embossing cylinder; and said angular position signal is used as a real-time process parameter for continuously determining the position of said embossing pattern relative to said substrate while said substrate is moving. 8. The process as claimed in claim 1 , further comprising the steps of: comparing a dimension of said printed pattern, which is measured in real-time on said substrate as said substrate is moving, with a reference value said dimension should have to match with a corresponding dimension in said embossed pattern; and during printing, stretching or compressing said printed pattern to reduce the difference between said measured dimension and said reference value. 9. The process as claimed in claim 1 , further comprising the steps of: comparing in real-time a detected position of said printed pattern on said substrate and a computed position of the embossed pattern on said substrate; and temporarily stretching or compressing said printed pattern during printing, to reduce an offset between the detected position of said printed pattern and the computed position of the embossed pattern. 10. The process as claimed in claim 1 , further comprising the steps of: predicting, on the basis of measurements made on said substrate upstream of said embossing equipment, an offset between said embossed pattern and said printed pattern; and during printing, stretching or compressing said printed pattern to reduce said offset. 11. The process as claimed in claim 1 , wherein the embossing equipment is downstream of said printing equipment, the process further comprising the steps of: measuring, at at least one position between said printing equipment and the embossing equipment, passage times of reference marks printed on said substrate; or measuring at regular time intervals, at at least one position between said printing equipment and the embossing equipment, longitudinal offsets between detected positions of reference marks printed on said substrate and the computed positions of said reference marks at said regular time intervals; and using the passage times that were measured or the offsets that were measured to predict a misalignment between said printed pattern and said embossed pattern at said embossing equipment; and using the misalignment that is predicted to compute a required stretching or compression of said printed pattern. 12. The process as claimed in claim 11 , wherein: the passage times of the reference marks or the longitudinal offsets are measured at several positions along a path of movement of said substrate between said printing equipment and said embossing equipment; and the passage times or the longitudinal offsets are used to predict an evolution of the alignment of said printed pattern with said embossed pattern at said embossing equipment; and said predicted evolution of said alignment is used to compute a preventive stretching or compression of said printed pattern. 13. The process as claimed in claim 1 , wherein said printing equipment is an inkjet printer. 14. The process as claimed in claim 1 , wherein the surface covering is a heterogeneous resilient floor or wall covering.
Auxiliary operations or devices · CPC title
for layered or coated substantially flat surfaces · CPC title
of layered or coated substantially flat surfaces · CPC title
of preformed plates or sheets coated with a solution, a dispersion or a melt of thermoplastic material · CPC title
Embossing · CPC title
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