Laser surface treatment and spectroscopic analysis system

Patent metadata

Field	Value
Publication number	US-10677741-B2
Application number	US-201816050319-A
Country	US
Kind code	B2
Filing date	Jul 31, 2018
Priority date	Jul 31, 2017
Publication date	Jun 9, 2020
Grant date	Jun 9, 2020

Abstract

Systems, methods, and devices of the various embodiments may enable simultaneous preparation of a substrate for adhesive bonding and detection of minute contaminants on the substrate. Various embodiments may enable detection of contaminants on a surface of a substrate while the surface of the substrate is being prepared for adhesive bonding by laser ablation. Various embodiments may provide an integrated laser treatment and measurement system.

First claim

What is claimed is:

1. A system for use during manufacturing of a substrate in accordance with a laser treatment and measurement plan, the system comprising:
a laser;
a spectrometer, comprising an optical detector and a spectrograph; and
a processor connected to the laser and spectrometer, wherein the processor is configured to perform a laser treatment and measurement plan to:
(1) control the laser to ablate a surface of a substrate with a beam to form a topographical pattern at the surface in preparation for further manufacturing of the substrate, wherein ablation of the surface generates a plasma plume;
(2) control the spectrometer to output to the processor a plurality of signal values from emitted light from the plasma plume;
(3) identify one or more surface contaminants of the substrate based on the plurality of signal values and determining a level of at least one identified contaminant;
(4) decide, based on said level of at least one identified contaminant, whether or not the laser treatment and measurement plan is to be modified; and
(5) modify the laser treatment and measurement plan being performed by the processor if a decision is made at (4) to modify the laser treatment and measurement plan and repeat at least (1) and (2) in accordance with the modified laser treatment and measurement plan.

2. The system of claim 1 , wherein the topographical pattern is a linear array of overlapping lines.

3. The system of claim 1 , wherein the further manufacturing of the substrate is coating, painting, or adhesive bonding.

4. The system of claim 1 , wherein controlling the spectrometer to output the plurality of signal values from the emitted light from the plasma plume comprises opening a data acquisition window after a delay period from the laser ablating the surface of the substrate.

5. The system of claim 1 , wherein the beam comprises a plurality of repeating pulses.

6. The system of claim 1 , further comprising a housing supporting the laser, the spectrometer, and the processor, the housing configured to traverse across the surface of the substrate.

7. The system of claim 6 , further comprising, a gantry or a robotic arm moveably supporting the housing.

8. The system of claim 7 , further comprising a shield coupled to the housing and configured to separate a user of the system from the beam.

9. The system of claim 1 , wherein the substrate is one or more of a polymer, a ceramic, a metal, a metal alloy, and a fiber reinforced composite.

10. The system of claim 9 , wherein the substrate is a carbon fiber reinforced polymer.

11. The system of claim 1 , wherein the optical detector further comprises an electron-multiplier intensified charge-coupled device camera coupled to the spectrograph.

12. A method for integrated laser treatment and spectroscopic analysis during manufacturing of a substrate in accordance with a laser treatment and measurement plan, the method comprising:
providing the substrate;
(1) ablating a surface of the substrate with a beam from a laser in accordance with the laser treatment and measurement plan to form a topographical pattern at the surface in preparation for further manufacturing of the substrate, Wherein ablation of the surface generates a plasma plume;
(2) performing laser induced breakdown spectroscopy on the plasma plume to identify one or more surface contaminants of the substrate and determining a level of at least one identified contaminant;
(3) deciding, based on said level of at least one identified contaminant, whether or not to modify the laser treatment and measurement plan;
(4) modifying the laser treatment and measurement plan if a decision is made that the laser treatment and measurement plan is to be modified; and
(5) if the laser treatment and measurement plan is modified at step (4), repeating at least steps (1) and (2) in accordance with the modified laser treatment and measurement plan.

13. The method of claim 12 , Wherein the further manufacturing of the substrate is coating, painting, or adhesive bonding.

14. The method of claim 12 , wherein the beam comprises a plurality of repeating pulses.

15. The method of claim 14 , wherein the ablation is performed under ambient environmental conditions.

16. The method of claim 12 , wherein the substrate is one or more of a polymer, a ceramic, a metal, a metal alloy, and a fiber reinforced composite.

17. The method of claim 16 , wherein the substrate is a carbon fiber reinforced polymer.

Assignees

• Nasa

Inventors

• Connell John W
• Palmieri Frank L
• Yost William T
• Hopkins John W
• Ledesma Rodolfo I

Classifications

• B23K26/127

  in an enclosure · CPC title

• B08B7/0042

  by laser · CPC title

• G01N21/718

  Laser microanalysis, i.e. with formation of sample plasma · CPC title

• H05H1/0037

  by spectrometry · CPC title

• B23K26/0884

  in at least three axial directions, e.g. manipulators, robots · CPC title