Optical elements and method for fabricating the same

US10675657B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10675657-B2
Application numberUS-201816031277-A
CountryUS
Kind codeB2
Filing dateJul 10, 2018
Priority dateJul 10, 2018
Publication dateJun 9, 2020
Grant dateJun 9, 2020

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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A method for fabricating an optical element is provided. The fabrication method includes the following steps. A substrate is provided. A plurality of metal grids are formed on the substrate. A first organic layer is formed on the substrate between the plurality of metal grids. A second organic layer is formed on the first organic layer and the plurality of metal grids. The second organic layer and the first organic layer are etched to leave the plurality of metal grids and a plurality of patterned second organic layers on the plurality of metal grids. An optical element fabricated by the method is also provided.

First claim

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What is claimed is: 1. A method for fabricating an optical element, comprising: providing a substrate; forming a plurality of metal grids having sidewalls on the substrate; forming a first organic layer on the substrate between the plurality of metal grids; forming a second organic layer on the first organic layer and the plurality of metal grids; etching the second organic layer and the first organic layer to leave the plurality of metal grids and a plurality of patterned second organic layers on the plurality of metal grids; and forming color filters on the substrate between the plurality of metal grids and between the plurality of patterned second organic layers. 2. The method for fabricating an optical element as claimed in claim 1 , wherein the second organic layer is etched by a first etching process. 3. The method for fabricating an optical element as claimed in claim 2 , wherein the first etching process uses haloalkyl gas as an etching gas. 4. The method for fabricating an optical element as claimed in claim 2 , wherein the first organic layer is etched by a second etching process. 5. The method for fabricating an optical element as claimed in claim 4 , wherein the second etching process uses oxygen, carbon dioxide or nitrogen as an etching gas. 6. The method for fabricating an optical element as claimed in claim 4 , wherein a part of the first organic layer is left on the sidewalls of the plurality of metal grids after the second etching process. 7. The method for fabricating an optical element as claimed in claim 6 , wherein the first organic layer left on the sidewalls of the plurality of metal grids is removed by soaking in solvent or a third etching process. 8. The method for fabricating an optical element as claimed in claim 7 , wherein the third etching process uses oxygen, carbon dioxide or nitrogen as an etching gas. 9. The method for fabricating an optical element as claimed in claim 1 , wherein the second organic layer and the first organic layer are etched by a fourth etching process using haloalkyl gas as an etching gas to leave a part of the first organic layer between the plurality of metal grids. 10. The method for fabricating an optical element as claimed in claim 9 , wherein the first organic layer between the plurality of metal grids is removed by soaking in solvent. 11. The method for fabricating an optical element as claimed in claim 1 , further comprising patterning the first organic layer before the second organic layer is formed. 12. The method for fabricating an optical element as claimed in claim 1 , wherein the first organic layer has a refractive index which is in a range from about 1.4 to about 1.55. 13. The method for fabricating an optical element as claimed in claim 1 , wherein the second organic layer has a refractive index which is in a range from about 1.2 to about 1.45.

Assignees

Inventors

Classifications

  • No curing step for any layer · CPC title

  • to metal, e.g. car bodies (involving a chemical reaction between the metal and the coating C23) · CPC title

  • Electricity · mapped topic

  • Electricity · mapped topic

  • in the form of arrays · CPC title

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What does patent US10675657B2 cover?
A method for fabricating an optical element is provided. The fabrication method includes the following steps. A substrate is provided. A plurality of metal grids are formed on the substrate. A first organic layer is formed on the substrate between the plurality of metal grids. A second organic layer is formed on the first organic layer and the plurality of metal grids. The second organic layer …
Who is the assignee on this patent?
Visera Technologies Co Ltd
What technology area does this patent fall under?
Primary CPC classification B05D5/06. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jun 09 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).