Amorphous metal oxide films

Patent metadata

Field	Value
Publication number	US-10668500-B2
Application number	US-201515510590-A
Country	US
Kind code	B2
Filing date	Sep 10, 2015
Priority date	Sep 11, 2014
Publication date	Jun 2, 2020
Grant date	Jun 2, 2020

Abstract

A method for preparing an amorphous metal oxide film is provided. The method comprises providing an aqueous composition comprising a metal fluorine compound; and contacting a substrate with the aqueous composition at a temperature of less than about 100° C. to obtain said amorphous metal oxide film on the substrate. An amorphous metal oxide film, and use of the amorphous metal oxide film in various applications are also provided.

First claim

The invention claimed is:

1. A method for preparing an amorphous metal oxide film which is superhydrophilic as-grown without requiring activation by UV excitation, the method comprising:
a) providing an aqueous composition comprising a metal fluorine compound; and
b) contacting a substrate with the aqueous composition at a temperature of less than about 100° C. and for a suitable time period to form metal oxide islands on the substrate, wherein the metal oxide islands are spaced apart from each other to form spacings between the metal oxide islands, and the spacings between the metal oxide islands form mesopores in the amorphous metal oxide film.

2. The method according to claim 1 , wherein the metal oxide film is a fluorine-doped metal oxide film and/or a fluorine-doped metal oxide hydroxide film.

3. The method according to claim 1 , wherein the metal fluorine compound is MF 2 , ME 4 , or a metal fluorine complex having general formula A 2 MF 6 , wherein M is independently selected from the group consisting of Ti, Sn, and alloys thereof, and A is selected from the group consisting of an ammonium group, hydrogen, alkali metal, coordinated water, and combinations thereof.

4. The method according to claim 1 , wherein the metal fluorine compound is selected from the group consisting of SnF 2 , SnF 4 , (NH 4 ) 2 TiF 6 , (NH 4 ) 2 SnF 6 , TiF 4 , H 2 TiF 6 , H 2 SnF 6 , and combinations thereof.

5. The method according to claim 1 , wherein concentration of metal fluorine compound in the aqueous composition is in the range of about 0.01 M to about 0.1 M.

6. The method according to claim 1 , wherein the metal fluorine compound comprises SnF 2 .

7. The method according to claim 6 , wherein the aqueous composition further comprises an alkaline solution, and pH of the aqueous composition comprising the alkaline solution is in the range of about 5 to about 7.

8. The method according to claim 1 , wherein the aqueous composition further comprises a fluorine scavenger.

9. The method according to claim 8 , wherein the fluorine scavenger is selected from the group consisting of boric acid, alkali metal borate, ammonium borate, boron anhydride, boron monoxide, aluminum chloride, sodium hydroxide, aqueous ammonia, metallic aluminum, aluminum oxide, and combinations thereof.

10. The method according to claim 8 , wherein the fluorine scavenger comprises boric acid.

11. The method according to claim 8 , wherein concentration of fluorine scavenger in the aqueous composition is in the range of about 0.06 M to about 0.3 M.

12. The method according to claim 1 , wherein contacting the substrate with the aqueous composition is carried out at a temperature in the range of about 40° C. to about 60° C.

13. The method according to claim 1 , wherein the substrate comprises a silicon oxide layer.

14. The method according to claim 13 , wherein the substrate comprising the silicon oxide layer is obtained by contacting a substrate with an aqueous composition comprising (NH 4 ) 2 SiF 6 and boric acid at a temperature of less than 100° C.

15. The method according to claim 1 , wherein the amorphous metal oxide film is photocatalytically active.

16. The method according to claim 1 , wherein optical band-gap of the amorphous metal oxide film is greater than 3.2 eV.

17. An amorphous metal oxide film which is superhydrophilic as-grown without requiring activation by UV excitation prepared by a method comprising:
a) providing an aqueous composition comprising a metal fluorine compound; and
b) contacting a substrate with the aqueous composition at a temperature of less than about 100° C. and for a suitable time period to form metal oxide islands on the substrate, wherein the metal oxide islands are spaced apart from each other to form spacings between the metal oxide islands, and the spacings between the metal oxide islands form mesopores in the amorphous metal oxide film to obtain said amorphous metal oxide film on the substrate.

Assignees

• Agency Science Tech & Res

Inventors

• Goh Kia Liang Gregory
• Le Hong Quang
• Kushwaha Ajay Kumar

Classifications

• C03C17/256

  Coating containing TiO2 · CPC title

• B05D1/18

  performed by dipping · CPC title

• C03C17/25 Primary

  by deposition from the liquid phase · CPC title

• C03C2218/111

  by dipping, immersion · CPC title

• C03C23/0075

  Cleaning of glass (specially adapted to plate glass B08B11/00) · CPC title