Photosensitive resin composition and cured film prepared therefrom

Patent metadata

Field	Value
Publication number	US-10656520-B2
Application number	US-201615775441-A
Country	US
Kind code	B2
Filing date	Sep 30, 2016
Priority date	Nov 25, 2015
Publication date	May 19, 2020
Grant date	May 19, 2020

Abstract

Disclosed herein are a photosensitive resin composition and a cured film prepared therefrom. By comprising a copolymer (A) and a photopolymerizable compound (B) in specific amounts, a photosensitive resin composition may form a cured film having pattern developability with high resolution and good elasticity recovery rate. The composition may be effectively used for the formation of a cured film, particularly a spacer of a display device such as a liquid crystal display and an organic electroluminescence device.

First claim

The invention claimed is:

1. A photosensitive resin composition, comprising:
(A) a copolymer;
(B) a photopolymerizable compound comprising a first photopolymerizable compound (B1) containing hexa- or less functional groups and a second photopolymerizable compound (B2) containing hepta- or more functional groups; and
(C) a photopolymerization initiator,
wherein a weight ratio of the copolymer (A) and the first and second photopolymerizable compounds (B1 and B2) satisfies the following Equation 1, and a weight ratio of the first photopolymerizable compound (B1) and the second photopolymerizable compound (B2) satisfies the following Equation 2:
2.1≤( B 1+ B 2)/( A )≤2.5  [Equation 1]

0.2≤ B 2/ B 1≤0.5  [Equation 2]

wherein the first photopolymerizable compound (B1) is at least one selected from the group consisting of ethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, glycerin tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, dipentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate and dipentaerythritol hexa(meth)acrylate.

2. The photosensitive resin composition of claim 1 , wherein the value of (B1+B2)/(A) is from 2.2 to 2.4 in Equation 1.

3. The photosensitive resin composition of claim 1 , wherein the copolymer (A) comprises (A1) a structural unit derived from an ethylenically unsaturated carboxylic acid, an ethylenically unsaturated carboxylic anhydride, or a mixture thereof; and (A2) a structural unit derived from an ethylenically unsaturated compound containing an aromatic ring.

4. The photosensitive resin composition of claim 1 , further comprising an epoxy compound.

5. A cured film prepared from using the photosensitive resin composition of claim 1 .

6. The cured film of claim 5 , wherein the cured film has (1) a top/bottom pattern critical dimension of 50 to 70%, and (2) an elasticity recovery rate of 70% or more in a load-unload test using an elasticity measuring device.

Assignees

• Rohm & Haas Elect Materials Korea Ltd

Inventors

• Jeon Hyung-Tak
• Park Seok-Bong
• Choi Gyung-Sik

Classifications

• C08L2312/06

  by radiation · CPC title

• C08F265/10

  on to polymers of amides or imides · CPC title

• C09D151/003

  grafted on to macromolecular compounds obtained by reactions only involving unsaturated carbon-to-carbon bonds (C09D151/04, C09D151/06 take precedence) · CPC title

• C08F220/06

  Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof · CPC title

• C08F212/08

  Styrene · CPC title